TiO2 Photocatalysis: A Historical Overview and Future Prospects Tập 44 Số 12R - Trang 8269 - 2005
Kazuhito Hashimoto, Hiroshi Irie, Akira Fujishima
Photocatalysis has recently become a common word and various products using photocatalytic functions have been commercialized. Among many candidates for photocatalysts, TiO2 is almost the only material suitable for industrial use at present and also probably in the future. This is because TiO2 has the most efficient photoactivity, the highest s...... hiện toàn bộ InGaN-Based Multi-Quantum-Well-Structure Laser Diodes Tập 35 Số 1B - Trang L74 - 1996
Shuji Nakamura, Masayuki Senoh, Shin‐ichi Nagahama, Naruhito Iwasa, Takehiro Yamada, Toshio Matsushita, Hiroyuki Kiyoku, Yasunobu Sugimoto
InGaN multi-quantum-well (MQW) structure laser diodes (LDs) fabricated from III-V nitride materials were grown by metalorganic chemical vapor deposition on sapphire substrates. The mirror facet for a laser cavity was formed by etching of III-V nitride films without cleaving. As an active layer, the InGaN MQW structure was used. The InGaN MQW LDs produced 215 mW at a forward cu...... hiện toàn bộ High-Brightness InGaN Blue, Green and Yellow Light-Emitting Diodes with Quantum Well Structures Tập 34 Số 7A - Trang L797 - 1995
Shuji Nakamura, Masayuki Senoh, Naruhito Iwasa, Shin‐ichi Nagahama
High-brightness blue, green and yellow light-emitting diodes (LEDs) with quantum well structures based on III-V nitrides were grown by metalorganic chemical vapor deposition on sapphire substrates. The typical green LEDs had a peak wavelength of 525 nm and full width at half-maximum (FWHM) of 45 nm. The output power, the external quantum efficiency and the luminous intensity of green ...... hiện toàn bộ GaN Growth Using GaN Buffer Layer Tập 30 Số 10A - Trang L1705 - 1991
S. Nakamura
High-quality gallium nitride (GaN) film was obtained for the first time using a GaN buffer layer on a sapphire substrate. An optically flat and smooth surface was obtained over a two-inch sapphire substrate. Hall measurement was performed on GaN films grown with a GaN buffer layer as a function of the thickness of the GaN buffer layer. For the GaN film grown with a 200 Å-GaN buffer la...... hiện toàn bộ Quantum-Confined Stark Effect due to Piezoelectric Fields in GaInN Strained Quantum Wells Tập 36 Số 4A - Trang L382 - 1997
Tetsuya Takeuchi, Shigetoshi Sota, Maki Katsuragawa, Miho Komori, Hideo Takeuchi, Hiroshi Amano, Isamu Akasaki Isamu Akasaki
We have studied the influence of piezoelectric fields on luminescence properties of GaInN strained quantum wells. Our calculation suggests that an electric field of 1.08 MV/cm is induced by the piezoelectric effect in strained Ga0.87In0.13N grown on GaN. The photoluminescence peak energy of the Ga0.87In... hiện toàn bộ Thermal Annealing Effects on P-Type Mg-Doped GaN Films Tập 31 Số 2B - Trang L139 - 1992
Shuji Nakamura, Takashi Mukai, Masayuki Senoh, Naruhito Iwasa
Low-resistivity p-type GaN films were obtained by N2-ambient thermal annealing at temperatures above 700°C for the first time. Before thermal annealing, the resistivity of Mg-doped GaN films was approximately 1×106 Ω·cm. After thermal annealing at temperatures above 700°C, the resistivity, hole carrier concentration and hole mobility became 2 ...... hiện toàn bộ