Microelectronic Engineering

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* Dữ liệu chỉ mang tính chất tham khảo

Sắp xếp:  
Study of the post-etch cleaning compatibility with dense and porous ULK materials – characterization of the process impact
Microelectronic Engineering - Tập 83 - Trang 2319-2323 - 2006
D. Rébiscoul, B. Puyrenier, L. Broussous, D. Louis, G. Passemard
Evidence for spatial distribution of traps in MOS systems after fowler nordheim stress
Microelectronic Engineering - Tập 48 - Trang 147-150 - 1999
M. Kerber, U. Schwalke, G. Innertsberger
Copper stress migration at narrow metal finger with wide lead
Microelectronic Engineering - Tập 84 - Trang 2697-2701 - 2007
Robin C.J. Wang, K.S. Chang-Liao, A.S. Oates, C.C. Lee, L.D. Chen, C.C. Chiu, Kenneth Wu
Interferential lithography of Bragg gratings on hybrid organic–inorganic sol–gel materials
Microelectronic Engineering - Tập 88 - Trang 1923-1926 - 2011
G. Della Giustina, G. Zacco, E. Zanchetta, M. Gugliemi, F. Romanato, G. Brusatin
Fabrication of microstructures on glass by imprinting in conventional furnace for lab-on-chip application
Microelectronic Engineering - Tập 95 - Trang 90-101 - 2012
Qiuling Chen, Qiuping Chen, Gabriele Maccioni, Adriano Sacco, Sergio Ferrero, Luciano Scaltrito
Shallow donor levels of Li-doped ZnSe single crystals
Microelectronic Engineering - Tập 43 - Trang 683-688 - 1998
Tetsuo Ikari, Kouji Maeda, Hirosumi Yokoyama, Atsuhiko Fukuyama, Kenji Yoshino
Near-field spectroscopy of single self-assembled InAs quantum dots: Observation of energy relaxation process
Microelectronic Engineering - Tập 47 - Trang 111-113 - 1999
Y. Toda, K. Suzuki, S. Shinomori, Y. Arakawa
A system-architecture viewpoint on smart networked devices
Microelectronic Engineering - Tập 54 - Trang 193-197 - 2000
Gilles Privat
Nanoimprint lithography for optic fluidics with phase gratings for environmental monitoring application
Microelectronic Engineering - Tập 87 - Trang 824-826 - 2010
Rong Yang, Bing-Rui Lu, Jing Xue, Zhen-Kui Shen, Zhen-Cheng Xu, Ejaz Huq, Xin-Ping Qu, Yifang Chen, Ran Liu
Analysis of three-dimensional proximity effect in electron-beam lithography
Microelectronic Engineering - Tập 83 - Trang 336-344 - 2006
S.-Y. Lee, Kasi Anbumony
Tổng số: 5,930   
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