AbstractThis paper presents a new approach for material removal on silicon at
atomic and close-to-atomic scale assisted by photons. The corresponding
mechanisms are also investigated. The proposed approach consists of two
sequential steps: surface modification and photon irradiation. The back bonds of
silicon atoms are first weakened by the chemisorption of chlorine and then
broken by photon energ... hiện toàn bộ
Wenzhong Han, Paven Thomas Mathew, Srikanth Kolagatla, Brian J. Rodriguez, Fengzhou Fang
AbstractAtomic force microscopy (AFM)-based electrochemical etching of a highly
oriented pyrolytic graphite (HOPG) surface is studied toward the
single-atomic-layer lithography of intricate patterns. Electrochemical etching
is performed in the water meniscus formed between the AFM tip apex and HOPG
surface due to a capillary effect under controlled high relative humidity
(~ 75%) at otherwise ambie... hiện toàn bộ