Surface and Interface Analysis

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Low‐energy implantation and sputtering of TiO2 by nitrogen and argon and the electrochemical reoxidation
Surface and Interface Analysis - Tập 17 Số 10 - Trang 726-736 - 1991
M. Wolff, J.W. Schultze, Hans‐Henning Strehblow
AbstractIn this paper we report the investigation of the implantation and radiation damage during sputter profiles of 30 nm TiO2 layers on Ti with 3 keV N2+. The profiles are analysed by normal and angle‐resolved XPS measurements. Supplementary electrochemical reoxidants are performed, handling the samp...... hiện toàn bộ
Analytical TEM study on the dispersion of Au nanoparticles in Au/TiO2 catalyst prepared under various temperatures
Surface and Interface Analysis - Tập 31 Số 2 - Trang 73-78 - 2001
Tomoki Akita, Ping Lü, Satoshi Ichikawa, Koji Tanaka, Masatake Haruta
AbstractTransmission electron microscopy (TEM) observations were made for Au/TiO2 catalysts prepared by calcination in air at different temperatures from room temperature to 873 K in order to study the growth process of Au particles over the surface of TiO2. Many Au clusters with diameters of ∼1 nm were observed on the TiO<...... hiện toàn bộ
Quantitative depth profiling in surface analysis: A review
Surface and Interface Analysis - Tập 2 Số 4 - Trang 148-160 - 1980
S. Hofmann
AbstractAfter a brief survey of the various non‐destructive and destructive methods used for obtaining in‐depth composition profiles, the generally applicable method of ion sputtering in combination with a surface analysis technique is discussed in more detail. The quantitative evaluation of sputtering profiles requires the conversion of a measured signal intensity...... hiện toàn bộ
Empirical atomic sensitivity factors for quantitative analysis by electron spectroscopy for chemical analysis
Surface and Interface Analysis - Tập 3 Số 5 - Trang 211-225 - 1981
C. D. Wagner, Lawrence E. Davis, M. Zeller, J. Ashley Taylor, R. Raymond, Laird H. Gale
AbstractQuantitative information from electron spectroscopy for chemical analysis requires the use of suitable atomic sensitivity factors. An empirical set has been developed, based upon data from 135 compounds of 62 elements. Data upon which the factors are based are intensity ratios of spectral lines with F1s as a primary standard, value unity, and K2p3...... hiện toàn bộ
Antibacterial metal implant with a TiO2‐conferred photocatalytic bactericidal effect against Staphylococcus aureus
Surface and Interface Analysis - Tập 41 Số 1 - Trang 17-22 - 2009
Koutaro Shiraishi, Hironobu Koseki, Toshiyuki Tsurumoto, K. Baba, Mariko Naito, Koji Nakayama, Hiroyuki Shindo
AbstractPhotocatalysis with anatase Titanium dioxide (TiO2) under ultraviolet A (UVA) has a well recognized bactericidal effect. There have been a few reports, however, on the effects of photocatalysis on bio‐implant‐related infections. The purpose of present study was to evaluate the photocatalytic bactericidal effects of anatase TiO...... hiện toàn bộ
Investigation of multiplet splitting of Fe 2p XPS spectra and bonding in iron compounds
Surface and Interface Analysis - Tập 36 Số 12 - Trang 1564-1574 - 2004
Andrew P. Grosvenor, Brad Kobe, Mark C. Biesinger, N. S. McIntyre
AbstractFerrous (Fe2+) and ferric (Fe3+) compounds were investigated by XPS to determine the usefulness of calculated multiplet peaks to fit high‐resolution iron 2p3/2 spectra from high‐spin compounds. The multiplets were found to fit most spectra well, particularly when contributions attributed to surf...... hiện toàn bộ
Characterization of CuInSe2 thin films by XPS
Surface and Interface Analysis - Tập 15 Số 7 - Trang 422-426 - 1990
Esko Niemi, Lars Stolt
AbstractThe surface composition of CuInSe2 thin films, made by co‐evaporation of the elements, has been shown to be strongly dependent on the bulk composition of the films. This is explained by the presence of a secondary phase, most likely Cu2Se, on the surface of Cu‐rich films. The fast variation of the surface concentrat...... hiện toàn bộ
X‐ray photoelectron spectroscopic chemical state quantification of mixed nickel metal, oxide and hydroxide systems
Surface and Interface Analysis - Tập 41 Số 4 - Trang 324-332 - 2009
Mark C. Biesinger, Brad P. Payne, Woon‐Ming Lau, Andrea R. Gerson, Roger St. C. Smart
AbstractQuantitative chemical state X‐ray photoelectron spectroscopic analysis of mixed nickel metal, oxide, hydroxide and oxyhydroxide systems is challenging due to the complexity of the Ni 2p peak shapes resulting from multiplet splitting, shake‐up and plasmon loss structures. Quantification of mixed nickel chemical states and the qualitative determination of low...... hiện toàn bộ
The effect of the H:C ratio on the sputtering of molecular solids by fullerenes
Surface and Interface Analysis - Tập 43 Số 1-2 - Trang 116-119 - 2011
R.P. Webb, Barbara J. Garrison, John C. Vickerman
AbstractThe understanding of the process by which molecular solids are sputtered by keV clusters such as C60 is of great importance if cluster SIMS is to be routinely used to depth profile a wide range of molecular materials. Computer simulations of the impact of a C60 cluster on a molecular solid show that an impact crater...... hiện toàn bộ
Strategies for modeling diverse chemical reactions in molecular dynamics simulations of cluster bombardment
Surface and Interface Analysis - Tập 43 Số 1-2 - Trang 126-128 - 2011
Paul E. Kennedy, Barbara J. Garrison, Michael F Russo, Adri C. T. van Duin
AbstractReaction energies for the degradation reactions of poly(methyl methacrylate) (PMMA) and for the cycloaddition of two ethylene molecules to form cyclobutane were calculated using the atomistic reactive empirical bond order potential ReaxFF, hiện toàn bộ
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