Surface and Interface Analysis
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Low‐energy implantation and sputtering of TiO2 by nitrogen and argon and the electrochemical reoxidation
Surface and Interface Analysis - Tập 17 Số 10 - Trang 726-736 - 1991
AbstractIn this paper we report the investigation of the implantation and
radiation damage during sputter profiles of 30 nm TiO2 layers on Ti with 3 keV
N2+. The profiles are analysed by normal and angle‐resolved XPS measurements.
Supplementary electrochemical reoxidants are performed, handling the sample
without any contact to air during the whole process. Additional information is
obtained by co...
Analytical TEM study on the dispersion of Au nanoparticles in Au/TiO2 catalyst prepared under various temperatures
Surface and Interface Analysis - Tập 31 Số 2 - Trang 73-78 - 2001
AbstractTransmission electron microscopy (TEM) observations were made for
Au/TiO2 catalysts prepared by calcination in air at different temperatures from
room temperature to 873 K in order to study the growth process of Au particles
over the surface of TiO2. Many Au clusters with diameters of ∼1 nm were observed
on the TiO2 surface when Au(OH)3/TiO2 precursor prepared by the deposition
precipitati...
Quantitative depth profiling in surface analysis: A review
Surface and Interface Analysis - Tập 2 Số 4 - Trang 148-160 - 1980
AbstractAfter a brief survey of the various non‐destructive and destructive
methods used for obtaining in‐depth composition profiles, the generally
applicable method of ion sputtering in combination with a surface analysis
technique is discussed in more detail. The quantitative evaluation of sputtering
profiles requires the conversion of a measured signal intensity versus
sputtering time into a tr...
Empirical atomic sensitivity factors for quantitative analysis by electron spectroscopy for chemical analysis
Surface and Interface Analysis - Tập 3 Số 5 - Trang 211-225 - 1981
AbstractQuantitative information from electron spectroscopy for chemical
analysis requires the use of suitable atomic sensitivity factors. An empirical
set has been developed, based upon data from 135 compounds of 62 elements. Data
upon which the factors are based are intensity ratios of spectral lines with F1s
as a primary standard, value unity, and K2p3/2 as a secondary standard. The data
were o...
Antibacterial metal implant with a TiO2‐conferred photocatalytic bactericidal effect against Staphylococcus aureus
Surface and Interface Analysis - Tập 41 Số 1 - Trang 17-22 - 2009
AbstractPhotocatalysis with anatase Titanium dioxide (TiO2) under ultraviolet A
(UVA) has a well recognized bactericidal effect. There have been a few reports,
however, on the effects of photocatalysis on bio‐implant‐related infections. The
purpose of present study was to evaluate the photocatalytic bactericidal effects
of anatase TiO2 on Staphylococcus aureus (S. aureus) associated with surgical
...
Investigation of multiplet splitting of Fe 2p XPS spectra and bonding in iron compounds
Surface and Interface Analysis - Tập 36 Số 12 - Trang 1564-1574 - 2004
AbstractFerrous (Fe2+) and ferric (Fe3+) compounds were investigated by XPS to
determine the usefulness of calculated multiplet peaks to fit high‐resolution
iron 2p3/2 spectra from high‐spin compounds. The multiplets were found to fit
most spectra well, particularly when contributions attributed to surface peaks
and shake‐up satellites were included. This information was useful for fitting
of the ...
Characterization of CuInSe2 thin films by XPS
Surface and Interface Analysis - Tập 15 Số 7 - Trang 422-426 - 1990
AbstractThe surface composition of CuInSe2 thin films, made by co‐evaporation of
the elements, has been shown to be strongly dependent on the bulk composition of
the films. This is explained by the presence of a secondary phase, most likely
Cu2Se, on the surface of Cu‐rich films. The fast variation of the surface
concentration is also found for films that, according to the equilibrium
pseudobinary...
X‐ray photoelectron spectroscopic chemical state quantification of mixed nickel metal, oxide and hydroxide systems
Surface and Interface Analysis - Tập 41 Số 4 - Trang 324-332 - 2009
AbstractQuantitative chemical state X‐ray photoelectron spectroscopic analysis
of mixed nickel metal, oxide, hydroxide and oxyhydroxide systems is challenging
due to the complexity of the Ni 2p peak shapes resulting from multiplet
splitting, shake‐up and plasmon loss structures. Quantification of mixed nickel
chemical states and the qualitative determination of low concentrations of
Ni(III) specie...
The effect of the H:C ratio on the sputtering of molecular solids by fullerenes
Surface and Interface Analysis - Tập 43 Số 1-2 - Trang 116-119 - 2011
AbstractThe understanding of the process by which molecular solids are sputtered
by keV clusters such as C60 is of great importance if cluster SIMS is to be
routinely used to depth profile a wide range of molecular materials. Computer
simulations of the impact of a C60 cluster on a molecular solid show that an
impact crater is produced. At the edges of the crater, a reaction zone is
created which ...
Strategies for modeling diverse chemical reactions in molecular dynamics simulations of cluster bombardment
Surface and Interface Analysis - Tập 43 Số 1-2 - Trang 126-128 - 2011
AbstractReaction energies for the degradation reactions of poly(methyl
methacrylate) (PMMA) and for the cycloaddition of two ethylene molecules to form
cyclobutane were calculated using the atomistic reactive empirical bond order
potential ReaxFF,1 and the reaction energies were then compared to reaction
energies from literature sources. The PMMA degradation reaction energies were
from 7 to 25 kca...
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