Electronic structure, chemical bonding and elastic properties of the first thorium‐containing nitride perovskite TaThN3 Tập 1 Số 3 - Trang 89-91 - 2007
V. V. Bannikov, I. R. Shein, A. L. Ivanovskiĭ
AbstractThe full‐potential linearized augmented plane wave method with the
generalized gradient approximation for the exchange and correlation potential
(LAPW‐GGA) is used to understand the electronic and elastic properties of the
first thorium‐containing nitride perovskite TaThN3. Total and partial density of
states, charge distributions as well as the elastic constants, bulk modulus,
compressibi... hiện toàn bộ
Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition Tập 4 Số 1-2 - Trang 10-12 - 2010
G. Dingemans, R. Seguin, P. Engelhart, M. C. M. van de Sanden, W. M. M. Kessels
AbstractIn this Letter, we report that both thermal atomic layer deposition
(ALD) with H2O, and plasma ALD with an O2 plasma, can be used to deposit Al2O3
for a high level of surface passivation of crystalline silicon (c‐Si). For 3.5 Ω
cm n‐type c‐Si, plasma ALD Al2O3 resulted in ultralow surface recombination
velocities of Seff < 0.8 cm/s. Thermal ALD Al2O3 also showed an excellent
passivation le... hiện toàn bộ
Impact of surface recombination on efficiency of III‐nitride light‐emitting diodes Tập 10 Số 6 - Trang 480-484 - 2016
K. A. Bulashevich, S. Yu. Karpov
The paper considers surface recombination at the free active region surface as
the mechanism of carrier losses which has not yet been discussed with regard to
III‐nitride LEDs despite of its evident importance for AlGaInP‐based light
emitters. Using advanced thin‐film and triangular volumetric chip designs
reported in literature as prototypes, we have demonstrated by simulation a
noticeable impact... hiện toàn bộ
Nitride emitters go nonpolar Tập 1 Số 3 - 2007
Ulrich T. Schwarz, Michael Kneissl
AbstractThe Expert Opinion is written by distinguished scientists and presents
their personal view on important and relevant new results of research,
highlighting their significance and putting the work into perspective for a
broader audience. Please send comments to pss.rapid@wiley‐vch.de or to the
authors.The text by Ulrich T. Schwarz and Michael Kneissl refers to the Rapid
Research Letter by K.... hiện toàn bộ
Thermal activation and deactivation of grown‐in defects limiting the lifetime of float‐zone silicon Tập 10 Số 6 - Trang 443-447 - 2016
Nicholas E. Grant, В. П. Маркевич, Jack Mullins, А. R. Peaker, Fiacre Rougieux, Daniel Macdonald
By studying the minority carrier lifetime in recently manufactured commercially
available n‐ and p‐type float‐zone (FZ) silicon from five leading suppliers, we
observe a very large reduction in the bulk lifetime when FZ silicon is
heat‐treated in the range 450–700 °C. Photoluminescence imaging of these samples
at the wafer scale revealed concentric circular patterns, with higher
recombination occu... hiện toàn bộ
Bipolar resistive switching in amorphous titanium oxide thin film Tập 4 Số 1-2 - Trang 28-30 - 2010
Hu Young Jeong, Jeong Yong Lee, Min‐Ki Ryu, Sung‐Yool Choi
AbstractUsing isothermal and temperature‐dependent electrical measurements, we
investigated the resistive switching mechanism of amorphous titanium oxide thin
films deposited by plasma enhanced atomic layer deposition (PEALD) between two
aluminum electrodes. We found a bipolar resistive switching (BRS) behavior only
in the high temperature region (>140 K) and two activation energies (0.055 eV
and ... hiện toàn bộ
Intrinsic spin Hall effect in silicene: transition from spin Hall to normal insulator Tập 6 Số 8 - Trang 340-342 - 2012
A. Dyrdał, J. Barnaś
AbstractAn intrinsic contribution to the spin Hall effect in two‐dimensional
silicene is considered theoretically within the linear response theory and
Green's function formalism. When an external voltage normal to the silicene
plane is applied, the spin Hall conductivity is shown to reveal a transition
from the spin Hall insulator phase at low bias to the conventional insulator
phase at higher vo... hiện toàn bộ
Comparison of InGaN/GaN light emitting diodes grown on m ‐plane and a ‐plane bulk GaN substrates Tập 2 Số 2 - Trang 89-91 - 2008
Hisashi Yamada, Kenji Iso, Makoto Saitô, Hirohiko Hirasawa, Natalie Fellows, Hisashi Masui, Kenji Fujito, James S. Speck, Steven P. DenBaars, Shuji Nakamura
AbstractInGaN/GaN‐based light emitting diodes (LEDs) grown on m ‐plane, a ‐plane
and off‐axis between m ‐ and a ‐plane GaN bulk substrates were investigated. A
smooth surface was obtained when a ‐plane substrate was applied; however, large
amounts of defects were observed. Photoluminescence measurements of the LEDs
with a well thickness of 2.5 nm revealed that all the LEDs showed the peak
emission... hiện toàn bộ
Germanium - the superior dopant in n-type GaN Tập 9 Số 12 - Trang 716-721 - 2015
Christian Nenstiel, M. Bügler, Gordon Callsen, Felix Nippert, Thomas Kure, S. Fritze, A. Dadgar, H. De Witte, J. Bläsing, A. Krost, A. Hoffmann