Physica Status Solidi (A) Applications and Materials Science

SCIE-ISI SCOPUS (1983,1987,2005-2023)

  1862-6300

  1862-6319

  Đức

Cơ quản chủ quản:  Wiley-VCH Verlag , WILEY-V C H VERLAG GMBH

Lĩnh vực:
Condensed Matter PhysicsElectrical and Electronic EngineeringMaterials ChemistrySurfaces, Coatings and FilmsSurfaces and InterfacesElectronic, Optical and Magnetic Materials

Các bài báo tiêu biểu

Studies of lithium argyrodite solid electrolytes for all‐solid‐state batteries
Tập 208 Số 8 - Trang 1804-1807 - 2011
R. Prasada Rao, Stefan Adams
Abstract

Rechargeable all‐solid‐state lithium Li‐ion batteries (AS‐LIBs) are attractive power sources for electrochemical applications; due to their potentiality in improving safety and stability over conventional batteries with liquid electrolytes. AS‐LIBs require a Li‐fast ion conductor (FIC) as the solid electrolyte. Finding a solid electrolyte with high ionic conductivity and compatibility with other battery components is a key factor in building high performance AS‐LIBs. There have been numerous studies, e.g., on lithium rich sulfide glasses as solid electrolytes. However, the limited current density remains a major obstacle in developing competitive batteries based on the known solid electrolytes. Here we prepare argyrodite‐type Li6PS5X (X = Cl, Br, I) using mechanical milling followed by annealing. XRD characterization reveals the formation and growth of Li6PS5X crystals in samples under varying annealing conditions. For Li6PS5Cl an ionic conductivity of the order of 10−4 S/cm is reached at room temperature, which is close to the Li mobility in conventional liquid electrolytes (LiPF6 in various carbonates) and well suitable for AS‐LIBs.

Tin monoxide as an s‐orbital‐based p‐type oxide semiconductor: Electronic structures and TFT application
Tập 206 Số 9 - Trang 2187-2191 - 2009
Yoichi Ogo, Hidenori Hiramatsu, Kenji Nomura, Hiroshi Yanagi, Toshio Kamiya, Mutsumi Kimura, Masahiro Hirano, Hideo Hosono
Abstract

Tin monoxide (SnO) is a stable p‐type oxide semiconductor. This paper reports electrical properties, electronic structures, and thin‐film transistors (TFTs) of SnO. Epitaxial films were fabricated by pulsed laser deposition. The Hall mobility and the hole density of the epitaxial films were 2.4 cm2 V−1 s−1 and 2.5 × 1017, respectively. X‐ray photoelectron spectroscopy (PES) indicated that the closed‐shell 5s2 orbitals of Sn2+ ions heavily contribute to the hole conduction path in SnO. Top gate type TFTs (W/L = 300/50 µm) employing 20 nm thick SnO channels exhibited field‐effect mobilities µsat = 0.7 cm2 V−1 s−1 and µlin = 1.3 cm2 V−1 s−1, which are larger by two orders of magnitude than those reported for p‐channel oxide TFTs to date. On/off current ratios were ∼102 and subthreshold voltage swings (S) ∼7 V/decade. The parameters required for TFT simulations were estimated by ultraviolet PES and first‐principles calculations. The TFT simulations indicated that subgap hole trap density in the SnO channel is >1019 cm−3, which limits the TFT mobilities and the S values.

Theory of ferromagnetic semiconductors
Tập 204 Số 1 - Trang 15-32 - 2007
Hiroshi Katayama‐Yoshida, Kazunori Satō, Tetsuya Fukushima, Masayuki Toyoda, Hidetoshi Kizaki, Van An Dinh, R. Zeller
Abstract

Based upon ab initio electronic structure calculations by the Korringa–Kohn–Rostoker coherent‐potential approximation (KKR‐CPA) method within the local‐density approximation (LDA), we propose a unified physical picture of magnetism and an accurate calculation method of Curie temperature (T C) in dilute magnetic semiconductors (DMSs) in II–VI and III–V compound semiconductors. We also propose the unified physical picture of magnetism in the DMS, where ferromagnetic Zener's double‐exchange mechanism (or Zener's p–d exchange mechanism) caused by the partially occupied impurity band and anti‐ferromagnetic super‐exchange mechanism (or ferromagnetic super‐exchange mechanism) is competing to determine the magnetic states in the DMS. We propose that the three‐dimensional 3D Dairiseki‐phase and one‐dimensional 1D Konbu‐phase caused by spinodal nano‐decomposition are responsible for high‐T C phase in the inhomogeneous system. We propose the new methodology to go beyond LDA to describe the highly correlated electron system by taking into account the self‐interaction correction (SIC) to the LDA. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

L10 FePtX-Y media for heat-assisted magnetic recording
Tập 210 Số 7 - Trang 1245-1260 - 2013
D. Weller, O. Mosendz, G.J. Parker, Simone Pisana, Tiffany S. Santos
Properties of TiO2‐based transparent conducting oxides
Tập 207 Số 7 - Trang 1529-1537 - 2010
Taro Hitosugi, Naoomi Yamada, Shoichiro Nakao, Yasushi Hirose, Tetsuya Hasegawa
Abstract

The development and properties of titanium dioxide (TiO2)‐based transparent conducting oxides (TCO), which exhibit properties comparable to those of In2–xSnxO3 (ITO), are reviewed in this article. An epitaxial thin film of anatase Ti0.94Nb0.06O2 exhibited a resistivity (ρ) of 2.3 × 10−4 Ω cm and internal transmittance of ∼95% in the visible light region. Furthermore, we prepared polycrystalline films with ρ of 6.4 × 10−4 Ω cm at room temperature on glass substrates by using sputtering. We focus on characteristics unique to TiO2‐based TCO, such as a high refractive index, high transmittance in infrared, and high stability in reducing atmospheres. Possible applications of TiO2‐based TCOs, as well as the mechanism of the transparent conducting properties found in this d‐electron‐based TCO, are discussed in this review.

magnified image

Photograph showing TiO2‐based TCO on a transparent plastic film. Note that the film appears greenish due to interference in the film originating from its high refractive index. This high refractive index is one of the unique characteristics of TiO2‐based TCO.

Effect of copper salt and thiourea concentrations on the formation of Cu2ZnSnS4 thin films by spray pyrolysis
Tập 207 Số 1 - Trang 149-156 - 2010
P. Uday Bhaskar, G. Suresh Babu, V. Sundara Raja
Abstract

Thin films of Cu2ZnSnS4 (CZTS), a potential candidate for absorber layer in thin film heterojunction solar cell, have been deposited by spray pyrolysis technique onto soda‐lime glass substrates held at a substrate temperature (Ts) of 643 K. The effect of copper salt and thiourea concentrations on the formation of Cu2ZnSnS4 thin films is investigated. CZTS films formed under optimized conditions are found to be polycrystalline in nature with kesterite structure. The lattice parameters are found to be a = 0.543 nm and c = 1.086 nm. The optical band gap of these films is found to be 1.43 eV. It is found to increase with decrease in copper salt concentration in the solution.

Growth and properties of nanocrystalline diamond films
Tập 203 Số 13 - Trang 3375-3386 - 2006
Oliver A. Williams, Miloš Nesládek
Abstract

The aim of this paper is to summarise recent progress in the growth of small grain‐sized Chemical Vapor Deposition (CVD) diamond often called nanocrystalline diamond, i.e., diamond with grains typically smaller than 500 nm. Nanocrystalline (NCD) and Ultrananocrystalline diamond (UNCD) films are new materials offering interesting applications to nanobioelectronics and electrochemistry. However NCD and UNCD thin films comprise of entirely different structures which is highlighted here in this paper. We discuss in detail the main differences in Raman spectra, optical properties and electrical transport properties. Finally we present a simple model of the conductivity mechanism in nitrogenated UNCD (N‐UNCD) and boron doped NCD (B‐NCD) films, and show the possibility of achieving the superconductive transition in B‐NCD films. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

Permanent annihilation of thermally activated defects which limit the lifetime of float‐zone silicon
Tập 213 Số 11 - Trang 2844-2849 - 2016
Nicholas E. Grant, В. П. Маркевич, Jack Mullins, А. R. Peaker, Fiacre Rougieux, Daniel Macdonald, John D. Murphy

We have observed very large changes in the minority carrier lifetime when high purity float‐zone (FZ) silicon wafers are subject to heat‐treatments in the range of 200–1100 °C. Recombination centres were found to become activated upon annealing at 450–700 °C, causing significant reductions in the bulk lifetime, detrimental for high efficiency solar cells and stable high powered devices. Photoluminescence imaging of wafers annealed at 500 °C revealed concentric circular patterns, with lower lifetimes occurring in the centre, and higher lifetimes around the periphery. Deep level transient spectroscopy measurements on samples extracted from the centre of an n‐type FZ silicon wafer annealed at 500 °C revealed a large variety of defects with activation energies ranging between 0.16–0.36 eV. Our measurements indicate that vacancy related defects are causing the severe degradation in lifetime when FZ wafers are annealed at 450–700 °C. Upon annealing FZ silicon at temperatures >800 °C, the lifetime is completely recovered, whereby the defect‐rich regions vanish and do not reappear (permanently annihilated). Our results indicate that, in general, as‐grown FZ silicon should not be assumed to be defect lean, nor can it be assumed that the bulk lifetime will remain stable during thermal processing, unless annealed at temperatures >1000 °C.

Homoepitaxial diamond film growth: High purity, high crystalline quality, isotopic enrichment, and single color center formation
Tập 212 Số 11 - Trang 2365-2384 - 2015
Tokuyuki Teraji, Takashi Yamamoto, Kenji Watanabe, Yasuo Koide, Junichi Isoya, Shinobu Onoda, Takeshi Ohshima, Lachlan J. Rogers, Fedor Jelezko, Philipp Neumann, Jörg Wrachtrup, Satoshi Koizumi

With optical/electronic devices of the next generation in mind, we provide a guideline for the growth of homoepitaxial diamond films that possess higher crystalline quality, higher chemical purity, and a higher carbon isotopic ratio. A custom‐built microwave plasma‐assisted chemical vapor deposition system was constructed to achieve these requirements. To improve both the purity and crystalline quality of homoepitaxial diamond films, an advanced growth condition was applied: higher oxygen concentration in the growth ambient. Under this growth condition for high‐quality diamond, a thick diamond film of ≥30 μm was deposited reproducibly while maintaining high purity and a flat surface. Then, combining this advanced growth condition for non‐doped diamond with a unique doping technique that provides parts‐per‐billion order doping, single‐color centers of either nitrogen‐vacancy or silicon‐vacancy centers that show excellent properties were formed. The new idea of using these color centers as a probe for detecting tiny amounts of impurities was presented. These advanced growth and characterization techniques are expected to open up new fields of diamond research that require extremely low‐impurity concentration, for use in power devices and quantum information devices.

Controlled dewetting as fabrication and patterning strategy for metal nanostructures
Tập 212 Số 8 - Trang 1662-1684 - 2015
F. Ruffino, Maria Grazia Grimaldi