
Physica Status Solidi (A) Applications and Materials Science
SCIE-ISI SCOPUS (1983,1987,2005-2023)
1862-6300
1862-6319
Đức
Cơ quản chủ quản: Wiley-VCH Verlag , WILEY-V C H VERLAG GMBH
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Rechargeable all‐solid‐state lithium Li‐ion batteries (AS‐LIBs) are attractive power sources for electrochemical applications; due to their potentiality in improving safety and stability over conventional batteries with liquid electrolytes. AS‐LIBs require a Li‐fast ion conductor (FIC) as the solid electrolyte. Finding a solid electrolyte with high ionic conductivity and compatibility with other battery components is a key factor in building high performance AS‐LIBs. There have been numerous studies, e.g., on lithium rich sulfide glasses as solid electrolytes. However, the limited current density remains a major obstacle in developing competitive batteries based on the known solid electrolytes. Here we prepare argyrodite‐type Li6PS5X (X = Cl, Br, I) using mechanical milling followed by annealing. XRD characterization reveals the formation and growth of Li6PS5X crystals in samples under varying annealing conditions. For Li6PS5Cl an ionic conductivity of the order of 10−4 S/cm is reached at room temperature, which is close to the Li mobility in conventional liquid electrolytes (LiPF6 in various carbonates) and well suitable for AS‐LIBs.
Tin monoxide (SnO) is a stable p‐type oxide semiconductor. This paper reports electrical properties, electronic structures, and thin‐film transistors (TFTs) of SnO. Epitaxial films were fabricated by pulsed laser deposition. The Hall mobility and the hole density of the epitaxial films were 2.4 cm2 V−1 s−1 and 2.5 × 1017, respectively. X‐ray photoelectron spectroscopy (PES) indicated that the closed‐shell 5s2 orbitals of Sn2+ ions heavily contribute to the hole conduction path in SnO. Top gate type TFTs (
Based upon
The development and properties of titanium dioxide (TiO2)‐based transparent conducting oxides (TCO), which exhibit properties comparable to those of In2–
Photograph showing TiO2‐based TCO on a transparent plastic film. Note that the film appears greenish due to interference in the film originating from its high refractive index. This high refractive index is one of the unique characteristics of TiO2‐based TCO.
Thin films of Cu2ZnSnS4 (CZTS), a potential candidate for absorber layer in thin film heterojunction solar cell, have been deposited by spray pyrolysis technique onto soda‐lime glass substrates held at a substrate temperature (
The aim of this paper is to summarise recent progress in the growth of small grain‐sized Chemical Vapor Deposition (CVD) diamond often called nanocrystalline diamond, i.e., diamond with grains typically smaller than 500 nm. Nanocrystalline (NCD) and Ultrananocrystalline diamond (UNCD) films are new materials offering interesting applications to nanobioelectronics and electrochemistry. However NCD and UNCD thin films comprise of entirely different structures which is highlighted here in this paper. We discuss in detail the main differences in Raman spectra, optical properties and electrical transport properties. Finally we present a simple model of the conductivity mechanism in nitrogenated UNCD (N‐UNCD) and boron doped NCD (B‐NCD) films, and show the possibility of achieving the superconductive transition in B‐NCD films. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
We have observed very large changes in the minority carrier lifetime when high purity float‐zone (FZ) silicon wafers are subject to heat‐treatments in the range of 200–1100 °C. Recombination centres were found to become activated upon annealing at 450–700 °C, causing significant reductions in the bulk lifetime, detrimental for high efficiency solar cells and stable high powered devices. Photoluminescence imaging of wafers annealed at 500 °C revealed concentric circular patterns, with lower lifetimes occurring in the centre, and higher lifetimes around the periphery. Deep level transient spectroscopy measurements on samples extracted from the centre of an
With optical/electronic devices of the next generation in mind, we provide a guideline for the growth of homoepitaxial diamond films that possess higher crystalline quality, higher chemical purity, and a higher carbon isotopic ratio. A custom‐built microwave plasma‐assisted chemical vapor deposition system was constructed to achieve these requirements. To improve both the purity and crystalline quality of homoepitaxial diamond films, an advanced growth condition was applied: higher oxygen concentration in the growth ambient. Under this growth condition for high‐quality diamond, a thick diamond film of ≥30 μm was deposited reproducibly while maintaining high purity and a flat surface. Then, combining this advanced growth condition for non‐doped diamond with a unique doping technique that provides parts‐per‐billion order doping, single‐color centers of either nitrogen‐vacancy or silicon‐vacancy centers that show excellent properties were formed. The new idea of using these color centers as a probe for detecting tiny amounts of impurities was presented. These advanced growth and characterization techniques are expected to open up new fields of diamond research that require extremely low‐impurity concentration, for use in power devices and quantum information devices.