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International Conference on Simulation of Semiconductor Processes and Devices

 

 

 

 

Cơ quản chủ quản:  N/A

Các bài báo tiêu biểu

Perspectives in microscopic carrier transport
- Trang 1-4
T. Ando
#Microscopy #Quantum dots #Wires #Electron emission #Physics #Hall effect #Lattices #Energy states #Ballistic transport #Immune system
Integrated atomistic process and device simulation of decananometre MOSFETs
- Trang 87-90
A. Asenov, M. Jaraiz, S. Roy, G. Roy, F. Adamu-Lema, A.R. Brown, V. Moroz, R. Gafiteanu
#MOSFETs #Silicon #Fluctuations #Atomic measurements #Stochastic processes #Analytical models #Atomic layer deposition #Semiconductor process modeling #Kinetic theory #Monte Carlo methods
Modeling of ultra shallow junctions and hybrid source/drain profiles annealed by soak and spike RTA
- Trang 151-154
C.C. Wang, C.S. Chang, P. Griffin, C.H. Diaz
#Hybrid junctions #Annealing #Implants #Semiconductor process modeling #Calibration #Doping profiles #CMOS technology #Silicon #Research and development #Pulp manufacturing
System level model of damping effects for highly perforated torsional microstructures
- Trang 111-114
G. Schrag, R. Sattler, G. Wachutka
#Damping #Microstructure #Computational modeling #Navier-Stokes equations #Computational geometry #Merging #Solid modeling #Computer networks #Distributed computing #Analytical models
A new gate current model accounting for a non-Maxwellian electron energy distribution function
- Trang 235-238
A. Gehring, T. Grasser, H. Kosina, S. Selberherr
#Distribution functions #Shape #Tunneling #Monte Carlo methods #MOSFET circuits #Secondary generated hot electron injection #Tail #Lattices #Temperature distribution #Microelectronics
Surface mobility in silicon at large operating temperature
- Trang 15-20
S. Reggiani, A. Valdinoci, L. Colalongo, M. Rudan, G. Baccarani, A. Stricker, F. Illien, N. Felber, W. Fichtner, S. Mettler, S. Lindenkreuz, L. Zullino
#Silicon #Testing #Temperature distribution #Electric breakdown #MOSFET circuits #Temperature control #Manufacturing #Microelectronics #Impurities #Lattices
On the optimal shape and location of silicided source and drain contacts
- Trang 39-42
P. Oldiges, C. Murthy, Xinlin Wang, S. Fung, R. Purtell
#Shape #Contact resistance #Silicides #Schottky barriers #Semiconductor process modeling #Doping profiles #Ohmic contacts #Research and development #Microelectronics #Analytical models
Simulations of ultrathin, ultrashort double-gated MOSFETs with the density gradient transport model
- Trang 271-274
E. Lyumkis, R. Mickevicius, O. Penzin, B. Polsky, K. El Sayed, A. Wettstein, W. Fichtner
#MOSFETs #Quantum mechanics #Modeling #Differential equations #Robustness #Systems engineering and theory #Boundary conditions #Nanostructures #FETs #Mutual coupling
Self-consistent single-particle simulation
- Trang 159-162
F.M. Bufler, C. Zechner, A. Schenk, W. Fichtner
#Modeling #Doping #Monte Carlo methods #MOSFET circuits #Hydrodynamics #Poisson equations #High definition video #Stability #Systems engineering and theory #Couplings