Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SCOPUS (1970,1982-2023)SCIE-ISI
0734-2101
1520-8559
Mỹ
Cơ quản chủ quản: A V S AMER INST PHYSICS , AVS Science and Technology Society
Lĩnh vực:
Surfaces and InterfacesCondensed Matter PhysicsSurfaces, Coatings and Films
Các bài báo tiêu biểu
Microstructural evolution during film growthAtomic-scale control and manipulation of the microstructure of polycrystalline thin films during kinetically limited low-temperature deposition, crucial for a broad range of industrial applications, has been a leading goal of materials science during the past decades. Here, we review the present understanding of film growth processes—nucleation, coalescence, competitive grain growth, and r... ... hiện toàn bộ
Tập 21 Số 5 - Trang S117-S128 - 2003
Structural analysis of Si(111)-7×7 by UHV-transmission electron diffraction and microscopyStructural analysis of the surface reconstructions investigated by ultrahigh vacuum (UHV) transmission electron microscopy (TEM) and diffraction (TED) is shown. By TED intensity analysis a new structural model of Si(111)-7×7 is derived. The model basically consists of 12 adatoms arranged locally in the 2×2 structure, nine dimers on the sides of the triangular subunits of the 7×7 unit cell ... ... hiện toàn bộ
Tập 3 Số 3 - Trang 1502-1506 - 1985
The search for novel, superhard materialsThe recent development in the field of superhard materials with Vickers hardness of ⩾40 GPa is reviewed. Two basic approaches are outlined including the intrinsic superhard materials, such as diamond, cubic boron nitride, C3N4, carbonitrides, etc. and extrinsic, nanostructured materials for which superhardness is achieved by an appropriate design of their microstructure. The theoretically ... ... hiện toàn bộ
Tập 17 Số 5 - Trang 2401-2420 - 1999
Sculptured thin films and glancing angle deposition: Growth mechanics and applicationsSculptured thin films with three dimensional microstructure controlled on the 10 nm scale were fabricated with an evaporation technique. Glancing angle deposition (GLAD) and substrate motion were employed to “sculpt” columnar thin film microstructure into desired forms ranging from zigzag shaped to helical to four-sided “square” helical. Computer control of substrate motion was used to acc... ... hiện toàn bộ
Tập 15 Số 3 - Trang 1460-1465 - 1997
Titanium aluminum nitride films: A new alternative to TiN coatings
Tập 4 Số 6 - Trang 2717-2725 - 1986
Revised structure zone model for thin film physical structureThin films prepared under conditions of low adatom mobility are characterized by a highly anisotropic physical structure with a wide range of systematically varying column and void sizes. The structure zone models, previously developed to classify the larger sized physical structures, are revised to account for the evolutionary growth stages of structure development as well as the separate... ... hiện toàn bộ
Tập 2 Số 2 - Trang 500-503 - 1984
Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor depositionWe have studied the local atomic structure of silicon suboxide (SiOx, x<2) thin films using infrared (IR) spectroscopy. The films were prepared by plasma enhanced chemical vapor deposition (PECVD) of silane (SiH4) and nitrous oxide (N2O) mixtures, which were then diluted with He. The IR spectra were found to vary significantly with the degree of He dilution. Films grown with no He s... ... hiện toàn bộ
Tập 4 Số 3 - Trang 689-694 - 1986
Nature of the use of adventitious carbon as a binding energy standardIt has become common practice to employ, as a binding energy reference for x-ray photoelectron spectroscopy studies on nonconductive materials, the C(1s) spectra of the ubiquitous (adventitious) carbon that seems to exhibit an instantaneous presence on all air exposed materials. Despite this commonality, surface scientists, including many practitioners, have expressed substantial concerns ... ... hiện toàn bộ
Tập 13 Số 3 - Trang 1239-1246 - 1995