The search for novel, superhard materials

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films - Tập 17 Số 5 - Trang 2401-2420 - 1999
S. Vepřek1
1Institute for Chemistry of Inorganic Materials, Technical University Munich, Lichtenbergstrasse 4, D-85747 Garching b. Munich, Germany

Tóm tắt

The recent development in the field of superhard materials with Vickers hardness of ⩾40 GPa is reviewed. Two basic approaches are outlined including the intrinsic superhard materials, such as diamond, cubic boron nitride, C3N4, carbonitrides, etc. and extrinsic, nanostructured materials for which superhardness is achieved by an appropriate design of their microstructure. The theoretically predicted high hardness of C3N4 has not been experimentally documented so far. Ceramics made of cubic boron nitride prepared at high pressure and temperature find many applications whereas thin films prepared by activated deposition from the gas phase are still in the stage of fundamental development. The greatest progress has been achieved in the field of nanostructured materials including superlattices and nanocomposites where superhardness of ⩾50 GPa was reported for several systems. More recently, nc-TiN/SiNx nanocomposites with hardness of 105 GPa were prepared, reaching the hardness of diamond. The principles of design for these materials are summarized and some unresolved questions outlined.

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Tài liệu tham khảo

1995, Surf. Coat. Technol., 76–77, 712

1970, Phys. Rev. B, 2, 547

1996, Surf. Coat. Technol., 86–87, 394

1996, Mater. Chem. Phys., 43, 1, 10.1016/0254-0584(95)01607-V

1985, Phys. Rev. B, 32, 7988, 10.1103/PhysRevB.32.7988

1989, Science, 245, 841, 10.1126/science.245.4920.841

1994, Solid State Commun., 92, 45, 10.1016/0038-1098(94)90857-5

1996, Mater. Sci. Eng., A, 209, 1, 10.1016/0921-5093(95)10120-9

1995, J. Vac. Sci. Technol. A, 13, 2914, 10.1116/1.579613

1996, Appl. Phys. Lett., 68, 634, 10.1063/1.116492

1996, Mod. Phys. Lett. B, 10, 615, 10.1142/S0217984996000675

1996, J. Phys.: Condens. Mater., 8, 685

1997, Philos. Mag. Lett., 75, 155, 10.1080/095008397179714

1997, Diamond Relat. Mater., 6, 1799, 10.1016/S0925-9635(97)00142-8

1996, J. Tribol., 118, 543, 10.1115/1.2831572

1996, J. Vac. Sci. Technol. A, 14, 2935, 10.1116/1.580247

1997, IEEE Trans. Magn., 33, 938, 10.1109/20.560135

1998, IEEE Trans. Magn., 34, 1720, 10.1109/20.706683

1998, IEEE Trans. Magn., 34, 1735, 10.1109/20.706688

1998, Appl. Phys. Lett., 73, 915, 10.1063/1.122036

1998, J. Vac. Sci. Technol. A, 16, 2093, 10.1116/1.581315

1998, J. Appl. Phys., 84, 2133, 10.1063/1.368274

1998, Nucl. Instrum. Methods Phys. Res. B, 136–138, 236

1998, Thin Solid Films, 323, 72, 10.1016/S0040-6090(97)01050-X

1998, Solid State Commun., 107, 75, 10.1016/S0038-1098(98)00152-5

1998, Thin Solid Films, 317, 380, 10.1016/S0040-6090(97)00628-7

1998, Nucl. Instrum. Methods Phys. Res. B, 135, 224, 10.1016/S0168-583X(97)00595-8

1998, Diamond Relat. Mater., 7, 899, 10.1016/S0925-9635(97)00328-2

1998, Thin Solid Films, 325, 123, 10.1016/S0040-6090(98)00509-4

1998, J. Vac. Sci. Technol. A, 16, 1956, 10.1116/1.581203

1998, Jpn. J. Appl. Phys., Part 2, 37, L746, 10.1143/JJAP.37.L746

1998, Appl. Phys. Lett., 72, 3449, 10.1063/1.121662

1998, Jpn. J. Appl. Phys., Part 2, 37, L675, 10.1143/JJAP.37.L675

1998, Thin Solid Films, 317, 384, 10.1016/S0040-6090(97)01056-0

1998, Thin Solid Films, 317, 359, 10.1016/S0040-6090(97)00552-X

1998, J. Non-Cryst. Solids, 227–230, 650

1998, Thin Solid Films, 322, 245, 10.1016/S0040-6090(97)00940-1

1998, Thin Solid Films, 323, 217, 10.1016/S0040-6090(97)01036-5

1998, Mater. Chem. Phys., 54, 325, 10.1016/S0254-0584(98)00105-9

1998, Nucl. Instrum. Methods Phys. Res. B, 136–138, 231

1998, J. Vac. Sci. Technol. B, 16, 1219, 10.1116/1.589987

1994, J. Vac. Sci. Technol. A, 12, 3192, 10.1116/1.579237

1995, Int. J. Mod. Phys. B, 9, 3527, 10.1142/S0217979295001385

1995, Diamond Relat. Mater., 4, 1093, 10.1016/0925-9635(95)00288-X

1998, J. Appl. Phys., 83, 1975, 10.1063/1.366924

1998, Phys. Rev. B, 58, 2207, 10.1103/PhysRevB.58.2207

1997, Russ. Chem. Rev., 66, 901, 10.1070/RC1997v066n11ABEH000378

1998, Sci. China, Ser. A, 41, 405, 10.1007/BF02879032

1995, Diamond Films Technol., 5, 261

1990, J. Am. Ceram. Soc., 73, 1973, 10.1111/j.1151-2916.1990.tb05254.x

1995, Phys. Rev. Lett., 75, 1336, 10.1103/PhysRevLett.75.1336

1996, Phys. Rev. Lett., 76, 2205

1996, J. Vac. Sci. Technol. A, 14, 56, 10.1116/1.579880

1996, J. Vac. Sci. Technol. A, 14, 2695

1998, Appl. Phys. Lett., 72, 2532, 10.1063/1.121410

1999, Phys. Rev. B, 59, 5162, 10.1103/PhysRevB.59.5162

1986, J. Mater. Res., 1, 601, 10.1557/JMR.1986.0601

1993, Härteri Technische. Mitteilungen, 48, 3

1989, Metalloberfläche, 2, 41

1993, Surf. Coat. Technol., 61, 201, 10.1016/0257-8972(93)90226-E

1992, J. Mater. Res., 7, 613, 10.1557/JMR.1992.0613

1992, J. Mater. Res., 7, 1564, 10.1557/JMR.1992.1564

1998, Mater. Sci. Eng., A, 253, 151, 10.1016/S0921-5093(98)00724-2

1995, Materialprüfung, 37, 9

1998, Thin Solid Films, 317, 449, 10.1016/S0040-6090(97)00665-2

1997, Electrochem. Soc. Proc., 97-25, 317

1998, Surf. Coat. Technol., 108/109, 138, 10.1016/S0257-8972(98)00618-5

1998, Tribol. Int., 31, 5, 10.1016/S0301-679X(98)00004-8

1987, J. Mater. Sci., 22, 1501, 10.1007/BF01233154

1989, Mater. Sci. Technol., 5, 865, 10.1179/mst.1989.5.9.865

1981, J. Am. Ceram. Soc., 64, 533, 10.1111/j.1151-2916.1981.tb10320.x

1981, J. Am. Ceram. Soc., 64, 539, 10.1111/j.1151-2916.1981.tb10321.x

1994, Phys. Status Solidi A, 142, 389, 10.1002/pssa.2211420212

1995, J. Mater. Sci., 30, 5394, 10.1007/BF00351549

1995, Mat. -wiss. u. Werkstofftech, 26, 477, 10.1002/mawe.19950260904

1996, Mat. -wiss. u. Werkstofftech., 27, 487, 10.1002/mawe.19960271008

1979, Sov. Phys. Dokl., 24, 83

1961, Chem. Eng., 68, 177

1991, Mater. Sci. Eng., B, 10, 149, 10.1016/0921-5107(91)90121-B

1997, Phys. Rev. B, 55, 6203, 10.1103/PhysRevB.55.6203

1998, MRS Bull., 23, 22

1968, J. Appl. Phys., 39, 2915, 10.1063/1.1656693

1973, J. Appl. Phys., 44, 1428, 10.1063/1.1662389

1976, J. Appl. Phys., 47, 4746, 10.1063/1.322531

1969, Sov. Phys. Crystallogr., 14, 449

1970, Russ. Chem. Rev., 39, 783, 10.1070/RC1970v039n09ABEH002022

1975, Sci. Am., 233, 102

1953, Exp. Tech. Phys. (Berlin), 1, 49

1956, Z. Phys. Chem. (Leipzig), 205, 349

1971, J. Appl. Phys., 42, 2953, 10.1063/1.1660654

1973, J. Vac. Sci. Technol., 10, 104, 10.1116/1.1317915

1976, Appl. Phys. Lett., 29, 118, 10.1063/1.88963

1978, Sov. Phys. Tech. Phys., 23, 222

1991, Diamond Relat. Mater., 1, 1, 10.1016/0925-9635(91)90005-U

1998, MRS Bull., 23, 32

1981, Indian J. Pure Appl. Phys., 19, 803

1998, MRS Bull., 23, 16

1996, Diamond Relat. Mater., 5, 501, 10.1016/0925-9635(96)80068-9

1995, Diamond Relat. Mater., 4, 288, 10.1016/0925-9635(94)05244-1

1998, J. Vac. Sci. Technol. A, 16, 3287, 10.1116/1.581535

1976, Thin Solid Films, 38, L17, 10.1016/0040-6090(76)90214-5

1977, Thin Solid Films, 40, L31, 10.1016/0040-6090(77)90097-9

1978, Vacuum, 28, 449, 10.1016/S0042-207X(78)80020-7

1979, Thin Solid Films, 58, 117, 10.1016/0040-6090(79)90220-7

1980, Thin Solid Films, 70, L9, 10.1016/0040-6090(80)90429-0

1980, Appl. Phys. Lett., 36, 291, 10.1063/1.91465

1979, Thin Solid Films, 58, 101, 10.1016/0040-6090(79)90217-7

1981, J. Vac. Sci. Technol., 18, 179, 10.1116/1.570719

1983, J. Appl. Phys., 54, 4590, 10.1063/1.332613

1983, Appl. Phys. Lett., 42, 636, 10.1063/1.94056

1994, Pure Appl. Chem., 66, 1789, 10.1351/pac199466091789

1994, Diamond Relat. Mater., 3, 361, 10.1016/0925-9635(94)90186-4

1996, Surf. Coat. Technol., 82, 199, 10.1016/0257-8972(95)02734-3

1998, Thin Solid Films, 326, 1, 10.1016/S0040-6090(98)00497-0

1998, Carbon, 36, 765, 10.1016/S0008-6223(98)00003-7

1981, MRS Bull., 16, 1385, 10.1016/0025-5408(81)90057-X

1984, Thin Solid Films, 117, 311, 10.1016/0040-6090(84)90361-4

1990, Mater. Sci. Forum, 54/55, 295

1995, J. Mater. Res., 10, 320, 10.1557/JMR.1995.0320

1990, J. Am. Ceram. Soc., 73, 2498, 10.1111/j.1151-2916.1990.tb07618.x

1996, Z. Metallkd., 87, 170

1997, Adv. Mater. Chem. Vap. Deposition, 3, 257, 10.1002/cvde.19970030503

1999, Thin Solid Films, 331, 154

1999, Adv. Mater., Chem. Vap. Deposition, 5, 61, 10.1002/(SICI)1521-3862(199903)5:2<61::AID-CVDE61>3.0.CO;2-Z

1977, Vesti. Adak. Nauk BSSR, Ser. Fiz.-Mat. Nauk, 2, 111

1977, Chem. Abstr., 87, 59009j

1977, Pis'ma Zh. Tekh. Fiz., 3, 186

1977, Chem. Abstr., 86, 175831z

1992, Plasma Chem. Plasma Process., 12, 219, 10.1007/BF01447023

1997, Surf. Coat. Technol., 97, 45, 10.1016/S0257-8972(97)00159-X

1992, Adv. Mater., 4, 759, 10.1002/adma.19920041114

1976, J. Less-Common Met., 47, 43, 10.1016/0022-5088(76)90072-2

1994, Japan. Inst. Metals Mater. Trans., 35, 85

1997, Int. J. Refract. Met. Hard Mater., 15, 13, 10.1016/S0263-4368(96)00046-7

1998, Diamond Relat. Mater., 7, 1519, 10.1016/S0925-9635(98)00228-3

1990, Surf. Coat. Technol., 43/44, 107, 10.1016/0257-8972(90)90065-K

1992, J. Hard Mater., 3, 29

1987, Phys. Rev. B, 36, 3344, 10.1103/PhysRevB.36.3344

1995, Surf. Coat. Technol., 74/75, 273, 10.1016/0257-8972(95)08235-2

1997, Surf. Coat. Technol., 97, 335, 10.1016/S0257-8972(97)00196-5

1990, Int. J. Refract. Met. Hard Mater., 9, 92

1988, Appl. Phys. Lett., 53, 2495, 10.1063/1.100528

1995, Mater. Res. Soc. Symp. Proc., 356, 767

1986, J. Vac. Sci. Technol. A, 4, 2661, 10.1116/1.573700

1996, Nature (London), 383, 401, 10.1038/383401a0

1994, J. Mater. Sci. Lett., 13, 1688, 10.1007/BF00451741

1993, Phys. Rev. B, 48, 13344, 10.1103/PhysRevB.48.13344

1998, Phys. Rev. B, 57, 4979

1951, Proc. Phys. Soc. London, Sect., B64, 747

1953, J. Iron Steel Inst., London, 174, 25

1986, J. Mater. Sci., 21, 1837, 10.1007/BF00547918

1998, Acta Mater., 46, 5611, 10.1016/S1359-6454(98)00231-6

1998, Usp. Fiz. Nauk, 41, 49, 10.1070/PU1998v041n01ABEH000329

1998, Scr. Mater., 39, 341, 10.1016/S1359-6462(98)00173-0

1985, Metall. Trans. A, 16, 2167, 10.1007/BF02670417

1970, Metall. Trans. A, 1, 1121, 10.1007/BF02900224

1995, Mater. Res. Soc. Symp. Proc., 362, 219

1995, Nanostruct. Mater., 6, 205, 10.1016/0965-9773(95)00044-5

1997, Philos. Mag. B, 76, 559, 10.1080/01418639708241122

1998, Nature (London), 391, 532, 10.1038/35254

1998, Nature (London), 391, 561, 10.1038/35328

1995, Nanostruct. Mater., 5, 441, 10.1016/0965-9773(95)00257-F

1989, Scr. Metall., 23, 1679, 10.1016/0036-9748(89)90342-6

1989, Scr. Metall., 23, 2013, 10.1016/0036-9748(89)90223-8

1990, Scr. Metall. Mater., 24, 1599, 10.1016/0956-716X(90)90439-N

1990, Scr. Metall. Mater., 24, 2319, 10.1016/0956-716X(90)90086-V

1990, Scr. Metall. Mater., 24, 145, 10.1016/0956-716X(90)90582-2

1991, J. Mater. Res., 6, 1012, 10.1557/JMR.1991.1012

1992, Scr. Metall. Mater., 26, 1879, 10.1016/0956-716X(92)90052-G

1992, Scr. Metall. Mater., 27, 855, 10.1016/0956-716X(92)90405-4

1992, Scr. Metall. Mater., 27, 1185, 10.1016/0956-716X(92)90596-7

1997, Mater. Sci. Eng., A, 234, 77

1997, Acta Mater., 45, 4019, 10.1016/S1359-6454(97)00092-X

1997, Scr. Mater., 37, 809, 10.1016/S1359-6462(97)00157-7

1998, Acta Mater., 46, 4195, 10.1016/S1359-6454(98)00114-1

1998, J. Vac. Sci. Technol. A, 16, 3301, 10.1116/1.581537

1972, Acta Metall., 20, 887, 10.1016/0001-6160(72)90082-X

1979, Mater. Sci. Eng., 39, 211, 10.1016/0025-5416(79)90060-0

1974, Metall. Trans. A, 5, 2339, 10.1007/BF02644014

1980, J. Am. Ceram. Soc., 63, 680, 10.1111/j.1151-2916.1980.tb09860.x

1976, Metall. Trans. A, 7, 1225, 10.1007/BF02656607

1982, Metall. Trans. A, 13, 703, 10.1007/BF02642384

1998, Tribol. Int., 31, 87, 10.1016/S0301-679X(98)00011-5

1978, J. Appl. Phys., 49, 5479, 10.1063/1.324518

1978, Phys. Rev. Lett., 41, 1814, 10.1103/PhysRevLett.41.1814

1975, Acta Metall., 23, 193, 10.1016/0001-6160(75)90183-2

1980, Thin Solid Films, 72, 261, 10.1016/0040-6090(80)90007-3

1990, J. Electrochem. Soc., 137, 440, 10.1149/1.2086459

1987, J. Appl. Phys., 62, 481, 10.1063/1.339770

1992, J. Mater. Res., 7, 901, 10.1557/JMR.1992.0901

1992, J. Vac. Sci. Technol. A, 10, 1604, 10.1116/1.578030

1996, Surf. Coat. Technol., 86/87, 351, 10.1016/S0257-8972(96)03026-5

1992, J. Appl. Phys., 72, 4466, 10.1063/1.352177

1990, Appl. Phys. Lett., 57, 2654, 10.1063/1.104189

1994, J. Mater. Res., 9, 1456, 10.1557/JMR.1994.1456

1990, Thin Solid Films, 193–194, 818

1992, Appl. Phys. Lett., 61, 654, 10.1063/1.107812

1994, J. Vac. Sci. Technol. A, 12, 1595, 10.1116/1.579361

1996, Surf. Coat. Technol., 86/87, 170, 10.1016/S0257-8972(96)02977-5

1996, Science, 273, 889, 10.1126/science.273.5277.889

1997, J. Vac. Sci. Technol. A, 15, 946, 10.1116/1.580784

1995, Appl. Phys. Lett., 67, 203, 10.1063/1.114667

1996, Appl. Phys. Lett., 68, 1211, 10.1063/1.115972

1996, Surf. Rev. Lett., 3, 1597, 10.1142/S0218625X96002588

1997, Surf. Coat. Technol., 94/95, 174, 10.1016/S0257-8972(97)00421-0

1998, J. Vac. Sci. Technol. A, 16, 1880, 10.1116/1.581122

1995, Nanostruct. Mater., 5, 349, 10.1016/0965-9773(95)00250-I

1991, Scr. Metall. Mater., 25, 1465, 10.1016/0956-716X(91)90434-3

1995, J. Appl. Phys., 77, 4403, 10.1063/1.359467

1996, Appl. Phys. Lett., 68, 2198, 10.1063/1.116011

1997, Thin Solid Films, 302, 147, 10.1016/S0040-6090(97)00023-0

1998, Phys. World, 11, 45

1998, J. Appl. Phys., 84, 776, 10.1063/1.368137

1995, Sumimoto Electr. Ind., 146, 91

1996, Surf. Coat. Technol., 86/87, 225, 10.1016/S0257-8972(96)03033-2

1991, Thin Solid Films, 205, 153, 10.1016/0040-6090(91)90297-B

1993, Appl. Phys. Lett., 63, 36, 10.1063/1.109742

1993, J. Appl. Phys., 73, 8580, 10.1063/1.353388

1995, Surf. Coat. Technol., 74–75, 833

1995, Surf. Coat. Technol., 76–77, 328

1985, J. Vac. Sci. Technol. A, 3, 2345, 10.1116/1.572879

1988, Surf. Coat. Technol., 36, 707, 10.1016/0257-8972(88)90011-4

1995, Appl. Phys. Lett., 66, 2540, 10.1063/1.113160

1996, Thin Solid Films, 268, 64

1996, J. Vac. Sci. Technol. A, 14, 46, 10.1116/1.579878

1996, Electrochemical Soc. Proc., 96-5, 619

1997, Mater. Res. Soc. Symp. Proc., 457, 407

1998, J. Vac. Sci. Technol. B, 16, 19, 10.1116/1.589778

1996, Mater. Res. Soc. Symp. Proc., 400, 261

1997, Thin Solid Films, 297, 145, 10.1016/S0040-6090(96)09480-1

1993, Nanostruct. Mater., 2, 267, 10.1016/0965-9773(93)90153-3

1998, Mech. Mater., 30, 111, 10.1016/S0167-6636(98)00027-1

1994, J. Mater. Res., 9, 2362, 10.1557/JMR.1994.2362

1982, J. Mater. Sci., 17, 1320, 10.1007/BF00752241

1982, J. Mater. Sci., 17, 3336, 10.1007/BF01203503

1983, J. Mater. Sci., 18, 2401, 10.1007/BF00541845

1995, J. Phys. IV, 2, C5

1996, Surf. Coat. Technol., 86/87, 231, 10.1016/S0257-8972(96)02950-7

1992, Plasma Chem. Plasma Process., 12, 287, 10.1007/BF01447027

1998, Surf. Coat. Technol., 108/109, 241, 10.1016/S0257-8972(98)00560-X

1987, J. Electrochem. Soc., 136, 2398

1988, Plasma Chem. Plasma Process., 8, 445, 10.1007/BF01016059

1988, Thin Solid Films, 165, 139, 10.1016/0040-6090(88)90685-2

1989, J. Vac. Sci. Technol. A, 7, 31, 10.1116/1.575763

1996, Plasma Chem. Plasma Process., 16, 341, 10.1007/BF01447150

1971, J. Cryst. Growth, 9, 266, 10.1016/0022-0248(71)90240-5

1986, J. Vac. Sci. Technol. A, 4, 2695, 10.1116/1.573708

1991, Surf. Coat. Technol., 48, 175, 10.1016/0257-8972(91)90142-J

1992, J. Vac. Sci. Technol. A, 10, 1749, 10.1116/1.577742

1992, Werkst. Korros., 43, 511, 10.1002/maco.19920431102

1990, Surf. Coat. Technol., 41, 351, 10.1016/0257-8972(90)90146-4

1992, Surf. Coat. Technol., 54/55, 255, 10.1016/0257-8972(92)90171-6

1994, Surf. Coat. Technol., 68/69, 556, 10.1016/0257-8972(94)90217-8

1994, Surf. Coat. Technol., 68/69, 194, 10.1016/0257-8972(94)90159-7

1995, Surf. Coat. Technol., 74/75, 491, 10.1016/0257-8972(95)08252-2

1997, Surf. Coat. Technol., 94/95, 297, 10.1016/S0257-8972(97)00440-4

1997, Diamond Films Technol., 7, 165

1998, Vacuum, 50, 313, 10.1016/S0042-207X(98)00059-1

1989, Thin Solid Films, 174, 51, 10.1016/0040-6090(89)90868-7

1991, Thin Solid Films, 205, 171, 10.1016/0040-6090(91)90299-D

1997, J. Solid State Chem., 133, 249, 10.1006/jssc.1997.7450

1997, J. Mater. Sci., 32, 4463, 10.1023/A:1018604830327

1973, Z. Metallkd., 64, 484

1974, Z. Metallkd., 65, 297

1995, Appl. Surf. Sci., 86, 329, 10.1016/0169-4332(94)00399-8

1996, J. Mater. Res., 11, 2841, 10.1557/JMR.1996.0359

1997, J. Mater. Res., 12, 119, 10.1557/JMR.1997.0019

1998, Nanostruct. Mater., 10, 865, 10.1016/S0965-9773(98)00122-6

1996, Surf. Coat. Technol., 86/87, 231, 10.1016/S0257-8972(96)02950-7

1991, Mater. Sci. Eng., A, 140, 609, 10.1016/0921-5093(91)90485-6

1998, J. Mater. Sci., 33, 319, 10.1023/A:1004307426887

1998, Diamond Relat. Mater., 7, 463, 10.1016/S0925-9635(97)00214-8

1996, Science, 271, 933, 10.1126/science.271.5251.933

1997, Science, 277, 1791, 10.1126/science.277.5333.1791

1998, Chem. Soc. Rev., 27, 1, 10.1039/a827001z

1998, MRS Bull., 23, 33

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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Tập 17 Số 5

2401-2420

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