IEEE Transactions on Plasma Science

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Transport coefficients of helium and argon-helium plasmas
IEEE Transactions on Plasma Science - Tập 25 Số 5 - Trang 809-814 - 1997
Anthony B. Murphy
Semianalytical models of volt-ampere characteristics of diffuse low-current low-pressure discharges
IEEE Transactions on Plasma Science - Tập 31 Số 4 - Trang 717-723 - 2003
Marija Nikolić, A.R. Đorđević, Ilija Stefanović, S. B. Vrhovac, Zoran Petrović
Theoretical Investigation of Iterative Phase Retrieval Algorithm for Quasi-Optical Millimeter-Wave RF Beams
IEEE Transactions on Plasma Science - Tập 37 Số 3 - Trang 403-413 - 2009
Sudheer Jawla, J.-P. Hogge, S. Alberti
Considerations on the role of the Hall current in a laboratory-model thruster
IEEE Transactions on Plasma Science - Tập 30 Số 2 - Trang 687-697 - 2002
J.M. Haas, A.D. Gallimore
Hall current magnitude and spatial distribution are presented for the plasma discharge in the University of Michigan/Air Force Research Laboratory P5 5 kW laboratory-model Hall thruster. The data are calculated from direct, probe-based measurements of the electric field, static magnetic field, and charged particle number density. Thruster discharge voltage was fixed at 300 V and two current levels...... hiện toàn bộ
#Magnetic field measurement #Density measurement #Current measurement #Force measurement #Plasma density #Plasma measurements #Laboratories #Plasma confinement #Electrons #Power measurement
Ignition of Ethylene–Air and Methane–Air Flows by Low-Temperature Repetitively Pulsed Nanosecond Discharge Plasma
IEEE Transactions on Plasma Science - Tập 35 Số 6 - Trang 1628-1638 - 2007
Ainan Bao, Yurii Utkin, Saurabh Keshav, Guofeng Lou, Igor Adamovich
Nickel-chrome-iron alloy film deposited by pulsed arc deposition
IEEE Transactions on Plasma Science - Tập 30 Số 2 - Trang 725-727 - 2002
Changlong Cai, Jimei Wang, Yixin Yan, Lingxia Hang, Chang Zhu
In this paper, a technique for depositing nickel-chrome-iron alloy film using a pulsed arc deposition is introduced. The plating technique has been developed and the properties of the film deposited with the developed technique are measured. The results show that the difference of composition between the film and cathode material is less than /spl plusmn/3% and by adding an collimating electrode, ...... hiện toàn bộ
#Nickel alloys #Optical films #Cathodes #Anodes #Arc discharges #Electrodes #Substrates #Coatings #Plasmas #Ignition
Qualitative fuzzy logic model of plasma etching process
IEEE Transactions on Plasma Science - Tập 30 Số 2 - Trang 673-678 - 2002
Byungwhan Kim, Jang Hyun Park
Plasma etching is key to transferring fine patterns. Accurate prediction models are highly demanded to gain improved insights into plasma discharges, as well as optimization and control of plasma equipment. As an empirical approach, a fuzzy logic referred to as adaptive network fuzzy inference system (ANFIS) was used to construct a qualitative model for a magnetically enhanced reactive ion etching...... hiện toàn bộ
#Fuzzy logic #Plasma applications #Etching #Predictive models #Anisotropic magnetoresistance #Adaptive systems #Fuzzy neural networks #Fuzzy systems #Power system modeling #Magnetic anisotropy
High-Power Microwave Generation from a Large-Orbit Gyrotron in Vane and Hole-and-Slot Conducting Wall Geometries
IEEE Transactions on Plasma Science - Tập 13 Số 6 - Trang 444-453 - 1985
W. Lawson, W.W. Destler, C. D. Striffler
Moderately relativistic high-harmonic gyrotrons for millimeter/submillimeter wavelength band
IEEE Transactions on Plasma Science - Tập 27 Số 2 - Trang 456-461 - 1999
V. L. Bratman, A. É. Fedotov, Yu. K. Kalynov, В. Н. Мануилов, M. M. Ofitserov, С. В. Самсонов, А. V. Savilov
Design and Numerical Optimization of a Cusp-Gun-Based Electron Beam for Millimeter-Wave Gyro-Devices
IEEE Transactions on Plasma Science - Tập 37 Số 11 - Trang 2153-2157 - 2009
A. W. Cross, Wenlong He, A. D. R. Phelps, Fengping Li, K. Ronald, C. W. Robertson, C. G. Whyte, A. R. Young, Liang Zhang
Tổng số: 49   
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