A Continuum Model of DC and RF Discharges

IEEE Transactions on Plasma Science - Tập 14 Số 2 - Trang 78-91 - 1986
David B. Graves1,2, Klavs F. Jensen3
1Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN, USA
2Department of Chemical Engineering, University of California, Berkeley, CA USA
3Department of Chemical Engineering and Materials, University of Minnesota, Minneapolis, MN, USA

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Tài liệu tham khảo

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IEEE Transactions on Plasma Science

Tập 14 Số 2

78-91

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