Applied Surface Science

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H2O adsorption on Fe: Disorder and beam effects
Applied Surface Science - Tập 26 - Trang 150-160 - 1986
D.R. Baer, M.T. Thomas
Promoting strain relaxation of Si0.72Ge0.28 film on Si (100) substrate by inserting a low-temperature Ge islands layer in UHVCVD
Applied Surface Science - Tập 255 - Trang 2660-2664 - 2008
Zhiwen Zhou, Zhimeng Cai, Cheng Li, Hongkai Lai, Songyan Chen, Jinzhong Yu
Femtosecond laser Wavelength-Dependent formation of plasmonic gold nanostructures
Applied Surface Science - Tập 617 - Trang 156629 - 2023
Kernius Vilkevičius, Algirdas Selskis, Evaldas Stankevičius
Fabrication and characterization of amino-grafted graphene oxide modified ZnO with high photocatalytic activity
Applied Surface Science - Tập 458 - Trang 638-647 - 2018
Dongdong Zhang, Yiping Zhao, Li Chen
Determination of momentum accommodation coefficients and velocity distribution function for Noble gas-polymeric surface interactions using molecular dynamics simulation
Applied Surface Science - Tập 493 - Trang 766-778 - 2019
Sadegh Yousefi-Nasab, Jaber Safdari, Javad Karimi-Sabet, Ali Norouzi, Elham Amini
Film thickness effect in c-axis oxygen vacancy-passivated ZnO prepared via atomic layer deposition by using H2O2
Applied Surface Science - Tập 529 - Trang 147095 - 2020
Yue Wang, Kyung-Mun Kang, Minjae Kim, Hyung-Ho Park
Regulate the crystal and optoelectronic properties of Bi2WO6 nanosheet crystals by Sm3+ doping for superior visible-light-driven photocatalytic performance
Applied Surface Science - Tập 508 - Trang 145309 - 2020
Zhen Liu, Xingqiang Liu, Longfu Wei, Changlin Yu, Junhui Yi, Hongbing Ji
Compositional effect on water adsorption on metal halide perovskites
Applied Surface Science - Tập 538 - Trang 148058 - 2021
Qihua Li, Zehua Chen, Ionut Tranca, Silvia Gaastra-Nedea, David Smeulders, Shuxia Tao
Two-step anneals to avoid bridging during Co silicidation
Applied Surface Science - Tập 73 - Trang 162-166 - 1993
R.J. Schreutelkamp, P. Vandenabeele, B. Deweerdt, R. Verbeeck, K. Maex
Evolution and influence of GaN/AlN heterointerface during the thinning process of GaN film
Applied Surface Science - Tập 608 - Trang 155151 - 2023
Yuqi Zhou, Yuhua Huang, Jinming Li, Fulong Zhu
Tổng số: 28,147   
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