Nghiên cứu lý thuyết về chế tạo cấu trúc 2D dưới bước sóng thông qua kích thích plasmon bề mặt sử dụng cấu trúc Kretschmann được tăng cường kết hợp với sự quay mẫu

Springer Science and Business Media LLC - Tập 54 - Trang 1-10 - 2022
Tianxu Jia1, Yaqian Ren1, Xiangxian Wang1, Yunping Qi2, Xiaolei Wen3
1School of Science, Lanzhou University of Technology, Lanzhou, China
2College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou, China
3Center for Micro- and Nanoscale Research and Fabrication, University of Science and Technology of China, Hefei, China

Tóm tắt

Một phương pháp lý thuyết về lithography ở quy mô nano dựa trên cấu trúc Kretschmann được tăng cường và kích thích các plasmon bề mặt để chế tạo các cấu trúc 2D dưới bước sóng một cách định kỳ được đề xuất trong bài báo này. Phân bố trường quang, được gia tăng mạnh mẽ bằng cách sử dụng cấu trúc Kretschmann được tăng cường, có thể được xác định bằng phương pháp phần tử hữu hạn và các công thức liên quan để mô phỏng quá trình quay và phơi sáng của mẫu lithography. Do đó, nhiều cấu trúc dưới bước sóng khác nhau có thể được mô hình hóa thông qua các phương pháp quay khác nhau và thời gian phơi sáng, chẳng hạn như mạng chấm vuông, các cấu trúc gần như lục giác đóng gói, và các cấu trúc lưới tròn. Ngoài ra, nếu các vật liệu kim loại và dielectrics được xác định, các quang phổ phản xạ khác nhau có thể được chọn bằng cách kết hợp các độ dày khác nhau của kim loại và vật liệu dielectrics. Phương pháp đề xuất này có các ưu điểm như chi phí thấp, độ phân giải cao và hiệu suất cao, cung cấp một phương pháp chế tạo tiềm năng cho các cấu trúc 2D dưới bước sóng trong các ứng dụng thực tiễn.

Từ khóa

#Lithography quy mô nano #Plasmon bề mặt #Cấu trúc Kretschmann tăng cường #Cấu trúc 2D dưới bước sóng #Thiết kế quang phổ phản xạ

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