Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride

Applied Optics - Tập 51 Số 28 - Trang 6789 - 2012
Jan Kischkat1, Sven Peters2, Bernd Gruska2, M. P. Semtsiv1, M. Chashnikova1, M. Klinkmüller1, Oliana Fedosenko1, S. Machulik1, A. Aleksandrova1, G. Monastyrskyi1, Yuri V. Flores1, W. T. Masselink1
1Humboldt-Universität zu Berlin, Newtonstrasse 15, 12489, Berlin, Germany
2Sentech Instruments GmbH, Schwarzschildstrasse 2, 12489 Berlin, Germany

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