Impact of technology scaling and process variations on RF CMOS devices

Microelectronics Journal - Tập 37 - Trang 275-282 - 2006
Hassan Hassan1, Mohab Anis1, Mohamed Elmasry1
1Electrical and Computer Engineering Department, University of Waterloo, Waterloo, ON, Canada N2L 3G1

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Microelectronics Journal

Tập 37

275-282

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