Resist film uniformity in the microlithography processIEEE Transactions on Semiconductor Manufacturing - Tập 15 Số 3 - Trang 323-330 - 2002
Weng Khuen Ho, Lay Lay Lee, A. Tay, C. Schaper
With the trends toward smaller feature size, one of the challenge is to control
the resist thickness and uniformity to a tight tolerance in order to minimize
thin film interference effects on the critical dimensions. In this paper, we
propose a new approach to improve resist thickness control and uniformity
through the soft-bake process. Using an array of thickness sensors, a multizones
bakeplate ... hiện toàn bộ
#Resists #Sliding mode control #Thickness control #Sensor arrays #Temperature sensors #Size control #Transistors #Interference #Temperature distribution #Temperature control