Resist film uniformity in the microlithography processIEEE Transactions on Semiconductor Manufacturing - Tập 15 Số 3 - Trang 323-330 - 2002
Weng Khuen Ho, Lay Lay Lee, A. Tay, C. Schaper
With the trends toward smaller feature size, one of the challenge is to control the resist thickness and uniformity to a tight tolerance in order to minimize thin film interference effects on the critical dimensions. In this paper, we propose a new approach to improve resist thickness control and uniformity through the soft-bake process. Using an array of thickness sensors, a multizones bakeplate ...... hiện toàn bộ
#Resists #Sliding mode control #Thickness control #Sensor arrays #Temperature sensors #Size control #Transistors #Interference #Temperature distribution #Temperature control