Variable-angle spectroscopic ellipsometry for deep UV characterization of dielectric coatings

Thin Solid Films - Tập 261 - Trang 37-43 - 1995
A. Zuber1, N. Kaiser1, J.L. Stehlé2
1Fraunhofer Einrichtung für Angewandte Optik und Feinmechanik Jena, Schillerstr, 1, D-07745 Jena, Germany
2SOPRA S.A., 26 nue Pierre Joigneaux, F-92270 Bois-Colombes, France

Tài liệu tham khảo

Kolbe, 1990, Laser induced damage threshold of dielectrics coatings at 193 nm and correlations to optical constants and process parameters, NIST Spec. Publ., 801, 404 Kaiser, 1992, Structure of thin fluoride films deposited on amorphous substrates, Thin Solid Films, 217, 7, 10.1016/0040-6090(92)90599-7 Kaiser, 1993, Evaluation of thin MgF2 films by spcctroscopic ellipsometry, Thin Solid Films, 232, 16, 10.1016/0040-6090(93)90754-D Kaiser, 1994, Very high damage threshold Al2O3SiO2 dielectric coatings for excimer laser, 2114, 325 Zukic, 1990, Vacuum ultraviolet thin films. 1:Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films, Appl. Opt., 29, 4284, 10.1364/AO.29.004284 Azzam, 1977 Dobrowolski, 1983, Determination of optical constants of thin film coating materials based on the inverse systhesis, Appl. Opt., 22, 3191, 10.1364/AO.22.003191 Palik, 1985 Palik, 1991 Driscoll, 1978