Unipolar arcs in high frequency field
Tóm tắt
In the present paper we describe experimental investigations of the unipolar arcs in the plasma device designed for thin film deposition. Unipolar arcs were generated in a vacuum arc in which the high-frequency power is injected into the plasma. For the arc characteristic measurements, the coaxial floating arc probe of special design was used and the arc tracks on the polished metal were studied. The arcing rate in the high frequency plasma discharge was found to have an abrupt cutoff with a frequency approaching 10/sup 7/ Hz. The similar dependency was received for the spattered mass.
Từ khóa
#Frequency #Plasma measurements #Electrodes #Probes #Plasma simulation #Plasma properties #Cathodes #Current measurement #Plasma devices #Power generationTài liệu tham khảo
10.1109/27.45515
10.1109/27.108400
10.1109/27.964451
boxman, 1995, Handbook of Vacuum Arc Science and Technology
vasiliev, 0, J Nucl Mat, 162?164, 787
vojtsenya, 1981, On plasma boundary potential resulting in impurity influx to plasma in present-day fusion devices, Review paper KFTI AS UrSSR, 81?24, 68
10.1016/0022-3115(76)90043-X
10.1088/0029-5515/19/10/014
aksenov, 1978, Transport of the plasma fluxes in curved plasmaoptic system, Sov J Plasma Phys, 4, 425
10.1109/27.476479
tokamaks, 1997, 447
2000, The plasma boundary of magnetic fusion devices P C Stangeby
10.1016/0022-3115(80)90184-1
10.1063/1.1662710
voloshko, 1999, Usage of HF plasma for surface treatment, Aerospace engineering and technique Trans, 10, 320
10.1016/0022-3115(80)90299-8
mccracken, 1979, Plasma-surface interactions in tokamaks - Nucl Fus, 19, 889
lieberman, 1994, Principles of Plasma Discharges and Processing
10.1109/27.249617
10.1063/1.1149963