Threshold behavior of the formation of nanometer islands in a Ge/Si(100) system in the presence of Sb

G. É. Cirlin1, V. G. Dubrovskiı̆2, A. A. Tonkikh1, N. V. Sibirev1, V. M. Ustinov2, P. Werner3
1Institute for Analytical Instrumentation, Russian Academy of Sciences, St. Petersburg, Russia
2Ioffe Physicotechnical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021, Russia
3Max-Planck-Institut für Mikrostrukturphysik, Halle, Germany

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