The effects of NO passivation on the radiation response of SiO2/4H-SiC MOS capacitors
Tài liệu tham khảo
Baliga, 2001, The future of power semiconductor device technology, Proc. IEEE, 89, 822, 10.1109/5.931471
Baliga, 1998, High voltage silicon carbide devices, Proc. MRS Symp., 512, 77, 10.1557/PROC-512-77
Chung, 2000, Effect of nitric oxide annealing on the interface trap densities near the band edges in the 4H polytype of silicon carbide, Appl. Phys. Lett., 76, 1713, 10.1063/1.126167
Chung, 2001, Improved inversion channel mobility for 4H-SiC MOSFETs following high temperature anneals in nitric oxide, IEEE Electron. Dev. Lett., 22, 176, 10.1109/55.915604
Sheridan DC, Chuang GY, Clark S, Cressler JD. Effects of high-dose gamma irradiation on high voltage 4H-SiC schottky diodes and the SiC/SiO2 interface. IEEE Trans Nucl Sci 2001;48:2229–32
Shanfield, 1992, A new MOS radiation-induced charge: negative fixed interface charge, IEEE Trans. Nucl. Sci., 39, 303, 10.1109/23.277501
Schroder, 1998
Brady, 1990, A study of the effects of processing on the response of implanted buried oxides to total dose irradiation, IEEE Trans. Nucl. Sci., 37, 1995, 10.1109/23.101220