Technology and characterisation of GaAsN/GaAs heterostructures for photodetector applications

Opto-Electronics Review - Tập 16 - Trang 1-7 - 2007
B. Ściana1, I. Zborowska-Lindert1, D. Pucicki1, B. Boratyński1, D. Radziewicz1, M. Tłaczała1, J. Serafińczuk1, P. Poloczek2, G. Sęk2, J. Misiewicz2
1Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Wrocław, Poland
2Institute of Physics, Wrocław University of Technology, Wrocław, Poland

Tóm tắt

The nitrogen-containing conventional AIIIBV semiconductor alloys, so-called diluted nitrides (AIIIBV-N), have been extensively studied recently. Unusual properties of these materials make them very promising for applications in lasers and very efficient multijunction solar cells. This work presents the technology and properties of undoped GaAs1-xNx/GaAs heterostructures used as active regions in the construction of metal-semiconductor-metal (MSM) photodetectors. The atmospheric pressure metal organic vapour phase epitaxy (APMOVPE) was applied for growing MSM test structures. Their structural and optical properties were examined using high resolution X-ray diffraction (HRXRD), photoluminescence (PL), and photoreflectance spectroscopy (PR). Chemical wet etching was applied for forming an active region and a multifinger Schottky metallization was used as MSM contacts. Dark and illuminated current-voltage characteristics were measured. Based on the obtained results, the main detector parameters as responsivity and spectral response were estimated

Tài liệu tham khảo

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