Structural properties of GaAsN grown on (001) GaAs by metalorganic molecular beam epitaxy

Journal of Electronic Materials - Tập 30 - Trang 900-906 - 2001
Young-Woo Ok1, Chel-Jong Choi1, Tae-Yeon Seong1, K. Uesugi2, I. Suemune2
1Department of Materials Science and Engineering, Kwangju Institute of Science and Technology (K-JIST), Kwangju, Korea
2Research Institute for Electronic Science, Hokkaido University, Sapporo, Japan

Tóm tắt

Detailed transmission electron microscopy (TEM) and transmission electron diffraction (TED) examination has been made of metalorganic molecular beam epitaxial GaAsN layers grown on (001) GaAs substrates. TEM results show that lateral composition modulation occurs in the GaAs1−xNx layer (x 6.75%). It is shown that increasing N composition and Se (dopant) concentration leads to poor crystallinity. It is also shown that the addition of Se increases N composition. Atomic force microscopy (AFM) results show that the surfaces of the samples experience a morphological change from faceting to islanding, as the N composition and Se concentration increase. Based on the TEM and AFM results, a simple model is given to explain the formation of the lateral composition modulation.

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