Spatial distribution of electrically active defects in dual-layer (SiO2∕HfO2) gate dielectric n-type metal oxide semiconductor field effect transistors

Nguyen, T.1, Savio, A.1, Militaru, L.1, Plossu, C.1
1Institut des Nanotechnologies de Lyon (INL), Université de Lyon, UMR5270, CNRS, INSA de Lyon, Villeurbanne F-69621, France

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