Simulations of ultrathin, ultrashort double-gated MOSFETs with the density gradient transport model

E. Lyumkis1, R. Mickevicius1, O. Penzin1, B. Polsky1, K. El Sayed1, A. Wettstein2, W. Fichtner3
1Integrated Systems Engineering, Inc., San Jose, CA, USA
2Integrated Systems Engineering, Zurich, Switzerland
3ETH, Zurich, Switzerland

Tóm tắt

We report the results of numerical simulation of nanoscale SOI structures under highly non-equilibrium conditions with the Density Gradient model. The simulations have been carried out with the general purpose device simulator DESSIS. We show that 2D quantum mechanical effects are important for the structures under investigation. We demonstrate that our implementation of the DG model is robust and enables efficient simulation far from equilibrium, for both the drift-diffusion and hydrodynamic transport model.

Từ khóa

#MOSFETs #Quantum mechanics #Modeling #Differential equations #Robustness #Systems engineering and theory #Boundary conditions #Nanostructures #FETs #Mutual coupling

Tài liệu tham khảo

ancona, 2000, IEEE Trans Electron Devices 47, 2310 wettstein, 2002, VLSI Design lyumkis, 0, Proc SOI 01 ren, 2001, IEDM Tech Dig, 107 rhew, 2002, Journal of Computational Electronics 2001, DESSIS 7 0 reference manual ISE Integrated Systems Engineering AG Zürich 10.1103/PhysRevB.35.7959