Simple method of depth profiling (stratifying) contamination layers, illustrated by studies on stainless steel

Surface and Interface Analysis - Tập 21 Số 6-7 - Trang 336-341 - 1994
M. P. Seah1, Ju Qiu2, Peter J. Cumpson1, J. E. Castle2
1Division of Materials Metrology, National Physical Laboratory, Teddington, Middlesex TW11 0LW, UK
2Department of Materials Science and Engineering, University of Surrey, Guildford, Surrey, GU2 5XH, UK

Tóm tắt

AbstractStainless‐steel artefacts are used as reference masses for the calibration of balances and instruments involving force. The surfaces of these masses react with the environment, leading to changes in the chemistry of the steel surface, accretion of surface contamination layers and a dynamic absorption of moisture in those contamination layers. In order to understand these layers, to stabilize or correct for the concomitant mass changes, it is important to define what chemical states are developing and their stratification at the surface. Four chemical states are identified in the oxygen XPS peak and four in the carbon peak. In the project a very large number of samples are studied and so a rapid, simple stratifying method has been developed requiring measurements at only two angles of emission. The method, which involves a simple ratio of the peak intensities either after separation of the states or by using the peak envelope, or just by ratioing the whole spectra at the two angles enables the stratification and other parameters to be readily determined for all eight peaks.

Từ khóa


Tài liệu tham khảo

M.Gläser Recommendation for a correction of a mass‐standard for the influence of humidity Document CCM/91–1 submitted to the1991meeting of the Consultative Committee for Mass.

10.1088/0026-1394/18/3/007

Kobayashi Y., 1984, Precision Measurement and Fundamental Constants II, 441

V. J.Kuzmin V. S.SniegovandA. P.Shchelkin Document CCM/88–10 submitted to the1988meeting of the Consultative Committee for Mass.

M. P.Seah J. H.Qiu P. J.CumpsonandJ. E.Castle Metrologia to be published.

10.1116/1.572910

10.1016/0368-2048(87)80019-1

10.1016/0368-2048(88)85002-3

10.1002/sia.740140804

10.1002/sia.740190134

10.1103/PhysRevB.5.4709

Briggs D., 1990, Practical Surface Analysis Vol I: Auger and X‐ray Photoelectron Spectroscopy, 437

NIST Standard Reference Database 20: X‐ray Photoelectron Spectroscopy

Seah M. P., 1990, Practical Surface Analysis Vol I: Auger and X‐ray Photoelectron Spectroscopy, 201

10.1002/sia.740010103

10.1002/sia.740030506

10.1002/sia.740020607

10.1002/sia.740200309