Self-aligned GaAs p-channel enhancement mode MOS heterostructure field-effect transistor

IEEE Electron Device Letters - Tập 23 Số 9 - Trang 508-510 - 2002
M. Passlack1, J.K. Abrokwah2, R. Droopad3, Zhiyi Yu3, C. Overgaard3, Sang In Yi4, M. Hale4, J. Sexton4, A.C. Kummel4
1Motorola, Inc., Tempe, AZ, USA
2Semiconductor Products Sector, Motorola, Inc., Tempe, AZ, USA
3Physical Science Research Laboratories, Motorola, Inc., Tempe, AZ, USA
4Department of Chemistry, University of California, San Diego, CA, USA

Tóm tắt

Self-aligned GaAs enhancement mode MOS heterostructure field-effect transistors (MOS-HFET) have been successfully fabricated for the first time. The MOS devices employ a Ga2O3 gate oxide, an undoped Al/sub 0.75/Ga/sub 0.25/As spacer layer, and undoped In/sub 0.2/Ga/sub 0.8/As as channel layer. The p-channel devices with a gate length of 0.6 μm exhibit a maximum DC transconductance g/sub m/ of 51 mS/mm which is an improvement of more than two orders of magnitude over previously reported results. With the demonstration of a complete process flow and 66% of theoretical performance, GaAs MOS technology has moved into the realm of reality.

Từ khóa

#Gallium arsenide #HEMTs #MODFETs #MOSFETs #Epitaxial layers #MOS devices #Transconductance #Indium #Semiconductor device modeling #Heterojunctions

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