Schottky behaviour of Pd//spl beta/-SiC junctions

S. Basu1, S. Roy1, R. Laha1, C. Jacob2, S. Nishino2
1Materials Science Centre, Indian Institute of Technology, Kharagpur, India
2Department of Electronics and Information Science, Kyoto Institute of Technology, Kyoto, Japan

Tóm tắt

Pd//spl beta/-SiC Schottky junctions using both epilayer and bulk SiC were fabricated and characterised by current-voltage (I-V) measurements. The effect of operating temperature on IN characteristics was studied. The ideality factor improved considerably at higher temperature. Annealing of Pd//spl beta/-SiC Schottky junctions at 400/spl deg/C improved the junction characteristics, which deteriorated at 800/spl deg/C due to degradation of Al/SiC ohmic contacts. These junctions are suitable for gas sensor applications at elevated temperatures.

Từ khóa

#Silicon carbide #Substrates #Temperature sensors #Ohmic contacts #Schottky barriers #Materials science and technology #Gas detectors #Semiconductor films #Annealing #Semiconductor materials

Tài liệu tham khảo

10.1063/1.107191 madelung, 0, Semiconductors Group IV Elements and III-V Compounds, 47 10.1063/1.95502 10.1116/1.580600 10.1063/1.104747 10.1016/0925-4005(94)01579-7 10.1016/S0921-5107(96)01990-3