Review of Structure of Bare and Adsorbate-Covered GaN(0001) Surfaces

R. M. Feenstra1, John E. Northrup2, Jörg Neugebauer3
1Department of Physics, Carnegie Mellon University, USA
2Palo Alto Research Center, USA
3Fritz-Haber-Institut der MPG, Germany

Tóm tắt

A review of surface structures of bare and adsorbate-covered GaN (0001) and (000) surfaces is presented, including results for In, Mg, Si, and H adsorbates. Emphasis is given to direct determination of surface structure employing experimental techniques such as scanning tunneling microscopy, electron diffraction, and Auger electron spectroscopy, and utilizing first principles computations of the total energy of various structural models. Different surface stoichiometries are studied experimentally by varying the surface preparation conditions (e.g. Ga-rich compared to N-rich), and the stoichiometry is included in the theory by performing calculations for various chemical potentials of the constituent atoms. Based on the work reviewed here, surface reconstructions for plasma-assisted molecular beam epitaxy growth of GaN (0001) and (000) surfaces are fairly well understood, but reconstructions for reactive molecular beam epitaxy or for metal-organic vapor phase epitaxy (both involving H, at moderate and high temperatures, respectively) are less well understood at present.

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Tài liệu tham khảo

10.1103/PhysRevB.54.14652

10.1016/S0022-0248(99)00570-9

10.1103/PhysRevLett.88.066103

10.1116/1.588189

10.1063/1.117722

10.1063/1.1325190

Chen, 1999, MRS Internet J. Nitride Semicond. Res, 4S1, G9

10.1016/S0039-6028(97)00563-3

10.1016/S0169-4332(00)00401-3

10.1016/S0038-1098(98)00119-7

10.1103/PhysRevLett.79.3934

10.1103/PhysRevB.56.R4325

Wenning, 2000, J. Vac. Sci. Technol. B, 18, 1467, 10.1116/1.591405

10.1063/1.108845

10.1557/S1092578300000831

10.1149/1.2055104

10.1103/PhysRevB.38.7649

10.1016/0022-0248(95)01067-X

10.1063/1.365575

10.1016/S0921-4526(99)00422-6

10.1063/1.1452785

10.1557/S1092578300000843

10.1063/1.123691

10.1063/1.358463

10.1063/1.124562

10.1016/0039-6028(93)90991-R

10.1063/1.122539

10.1063/1.119793

10.1016/0009-2614(95)01123-Q

10.1103/PhysRevLett.85.2352

10.1103/PhysRevLett.52.1911

10.1007/BF02659687

10.1103/PhysRevLett.84.4015

10.1103/PhysRevLett.52.1693

10.1063/1.120731

10.1103/PhysRevB.55.13878

10.1063/1.475255

10.1557/S1092578300000235

10.1103/PhysRevLett.83.741

10.1063/1.1305830

10.1103/PhysRevB.64.195406

10.1103/PhysRevB.57.15360

10.1116/1.1305288

10.1103/PhysRevB.59.9771

10.1016/S0039-6028(00)00250-8

10.1103/PhysRevLett.84.4014

10.1103/PhysRevB.56.R12725

10.1109/5.90133

10.1016/S0039-6028(99)00973-5

Doppalapudi, 2002, Handbook of Thin Film Materials

10.1007/s11664-001-0010-6

[40] Brandt O. , private communication

10.1103/PhysRevLett.82.3074

Murphy, 1999, MRS Internet J. Nitride Semicond. Res, 4S1, G8.4

10.1143/JJAP.35.L289

10.1103/PhysRevLett.85.1902

10.1116/1.590156

10.1103/PhysRevB.60.R8473

10.1063/1.370574

10.1016/S0039-6028(97)00259-8

10.1007/s003390051272

10.1016/S0022-0248(99)00299-7

10.1103/PhysRevLett.80.3097

10.1116/1.1383074

[4] Nakamura S. , 281, 956 (1998).

10.1006/spmi.1996.0060

10.1063/1.117693

10.1103/PhysRevB.61.9932

10.1016/S0039-6028(01)00827-5

10.1063/1.371971

10.1116/1.1306296

10.1063/1.352999

Pavlovska, 2001, Surf. Rev. Lett, 8, 337, 10.1142/S0218625X01001154

Ramachandran, 2000, ,, MRS Internet J. Nitride Semicond. Res., 5S1, W3

10.1557/S1092578300001393

10.1063/1.121909

10.1063/1.118433

10.1063/1.117830

10.1143/JJAP.38.L230

10.1016/S0039-6028(98)00903-0

10.1063/1.1318731

10.1063/1.124520

Sumiya, 1999, MRS Internet J. Nitride Semicond. Res, 4S1, G6.23

10.1016/S0039-6028(00)00820-7

10.1063/1.372000

10.1063/1.120874