Reflection extended x‐ray absorption fine‐structure measurements on Ni/C and NixSiy/C multilayered reflection coatings

Hedser van Brug1, M.J. van der Wiel1, Ronald van der Pol2, J. Verhoeven2, G. van der Laan3, J. B. Goedkoop4
1Association Euratom FOM, FOM‐Institute for Plasma Physics ′Rijnhuizen′, Edisonbaan 14,3439 MN Nieuwegein, The Netherlands
2FOM Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands
3Department of Physical Chemistry of the Material Science Center, Nijenborg 16, 9747 AG Groningen, The Netherlands
4Laboratory for Molecular Spectroscopy, Research Institute of Materials, University of Nijmegen, Toernooiveld, 6525 ED Nijmegen, The Netherlands

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