Reduction in Cross-Talk Errors in a Six-Degree-of-Freedom Surface Encoder
Tóm tắt
This paper presents the reduction in cross-talk errors in the angular outputs existing in the previously designed six-degree-of-freedom (DOF) surface encoder for nanopositioning and nanometrology. The six-DOF surface encoder is composed of a planar scale grating and an optical sensor head with a reference grating, a displacement assembly and an angle assembly. The diffracted beams from both the scale and the reference gratings are received by the displacement assembly for measurement of the primary XYZ translational motions. The angle assembly only receives the diffracted beams from the scale grating for measurement of the secondary θXθYθZ angular motions. In this paper, at first, the cross-talk errors in the angular measurement results of the previous surface encoder are identified to be caused by the diffracted beams from the reference grating leaking into the angle assembly due to the imperfection of the polarization components of the sensor head. An improved design of the sensor head is then carried out to reduce the cross-talk errors by changing the position of the angle assembly in the sensor head. The sensor head is further optimized by replacing the beam splitter located in front of the angle assembly from a cube type to a plate type. Experimental results have demonstrated that the cross-talk errors were reduced from 3.2 arc-seconds to 0.02 arc-second.
Tài liệu tham khảo
Zhang F, Wang C, Yin K, Dong XR, Song YX, Tian YX, Duan JA (2018) Quasi-periodic concave microlens array for liquid refractive index sensing fabricated by femtosecond laser assisted with chemical etching. Sci Rep 8:2419
Wagner C, Harned N (2010) EUV lithography: lithography gets extreme. Nat Photon 4:24–26
Tokel O, Turnalı A, Makey G, Elahi P, Çolakoğlu T, Ergeçen E, Yavuz Ö, Hübner R, Borra MZ, Pavlov I, Bek A, Turan R, Kesim DK, Tozburun S, Ilday S, Ilday FÖ (2017) In-chip microstructures and photonic devices fabricated by nonlinear laser lithography deep inside silicon. Nat Photon 11:639–645
Fang FZ, Zhang XD, Gao W, Guo YB, Byrne G, Hansen HN (2017) Nanomanufacturing—perspective and applications. CIRP Ann Manuf Technol 66(2):683–705
Fang FZ, Xu F (2018) Recent advances in micro/nano-cutting: effect of tool edge and material properties. Nanomanuf Metrol 1(1):4–31
Gao W (2010) Precision nanometrology—sensors and measuring systems for nanomanufacturing. Springer, London
Gao W, Kim SW, Bosse H, Haitjema H, Chen YL, Lu XD, Knapp W, Weckenmann A, Estler WT, Kunzmann H (2015) Measurement technologies for precision positioning. CIRP Ann-Manuf Techn 64:773–796
Liu X, Peng K, Chen Z, Pu H, Yu Z (2016) A new capacitive displacement sensor with nanometer accuracy and long range. IEEE Sens J 16(8):2306–2316
Chen Z, Pu H, Liu X, Peng D, Yu Z (2015) A time-grating sensor for displacement measurement with long range and nanometer accuracy. IEEE Trans Instrum Meas 64(11):3105–3115
Tomita Y, Koyanagawa Y, Satoh F (1994) A surface motor-driven precision positioning system. Precis Eng 16(3):184–191
Shamoto E, Murase H, Moriwaki T (2000) Ultra-precision 6-axis table driven by means of walking drive. Ann CIRP 49(1):299–302
Kim WJ, Trumper DL (1998) High-precision magnetic levitation stage for photolithography. Precis Eng 22(2):66–77
Lan HB, Ding YC, Liu HZ, Lu BH (2007) Review of wafer stage for nanoimprint lithography. Microelectron Eng 84(4):684–688
Gao W, Dejima S, Yanai H, Katakura K, Kiyono S, Tomita Y (2004) A surface motordriven planar motion stage integrated with an XYZ surface encoder for precision positioning. Precis Eng 28(3):329–337
Klapetek P, Valtr M, Matula M (2011) A long-range scanning probe microscope for automotive reflector optical quality inspection. Meas Sci Technol 22:094011
Peng Y, Ito S, Shimizu Y, Azuma T, Niwa E (2014) A Cr–N thin film displacement sensor for precision positioning of a micro-stage. Sensor Actuat A-Phys 211:89–97
Fan KC, Fei YT, Yu XF, Chen YJ, Wang WL, Chen F, Liu YS (2006) Development of a low-cost micro-CMM for 3D micro/nano measurements. Meas Sci Technol 17(3):524–532
Fan KC, Li RJ, Xu P (2019) Design and verification of micro/nano-probes for coordinate measuring machines. Nanomanuf Metrol 2(1):1–15
Kim WJ, Verma S, Shakir H (2007) Design and precision construction of novel magnetic-levitation-based multi-axis nanoscale positioning systems. Precis Eng 31(4):337–350
Lan H, Ding Y, Liu H, Lu B (2007) Review of wafer stage for nanoimprinting. Microelectron Eng 84(4):684–688
Erkorkmaz K, Gorniak JM, Gordon DJ (2010) Precision machine tool X–Y stage utilizing a planar air bearing arrangement. Ann CIRP 59(1):425–428
Hocken R, Trumper D, Wang C (2001) Dynamics and control of the UNCC/MIT subatomic measuring machine. Ann CIRP 50(1):373–376
Arai Y, Dian SY, Gao W (2008) A novel control method using nonlinear observer for a XYθz planar actuator. Key Eng Mater 381–382:195–198
Manske E, Jaeger G, Hausotte T, Fussl R (2012) Recent developments and challenges of nanopositioning and nanomeasuring technology. Meas Sci Technol 23(7):074001
Shimizu Y, Peng Y, Kaneko J, Azuma T, Ito S, Gao W, Lu TF (2013) Design and construction of the motion mechanism of an XY micro-stage for precision positioning. Sensor Actuat A-Phys 201:395–406
Tano M, Gao W, Kiyono S, Tomita Y, Makino K, Morita H (2005) Precision positioning of a Sawyer motor-driven stage by a surface encoder. J Phys: Conf Ser 13:90–93
Li X, Gao W, Muto H, Shimizu Y, Ito S, Dian S (2013) A six-degree-of-freedom surface encoder for precision positioning of a planar motion stage. Precis Eng 37:771–781
Zhang Z, Menq CH (2007) Laser interferometric system for six-axis motion measurement. Rev Sci Instrum 78:083107
Gao W, Saito Y, Muto H, Arai Y, Shimizu Y (2011) A three-axis autocollimator for detection of angular error motions of a precision stage. Ann CIRP 60(1):515–518
Saito Y, Arai Y, Gao W (2009) Detection of three-axis angles by an optical sensor. Sensor Actuat A-Phys 150:175–183
Gao W, Araki T, Kiyono S, Okazaki Y, Yamanaka M (2003) Precision nano-fabrication and evaluation of a large area sinusoidal grid surface for a surface encoder. Precis Eng 37:771–781
Li X, Gao W, Shimizu Y, Ito S (2014) A two-axis Lloyd’s mirror interferometer for fabrication of two-dimensional diffraction gratings. CIRP Ann Manuf Techn 63:461–464
Chen X, Ren Z, Shimizu Y, Chen YL, Gao W (2017) Optimal polarization modulation for orthogonal two-axis Lloyd’s mirror interference lithography. Opt Exp 25(19):22237–22252
Gao W, Kimura A (2007) A three-axis displacement sensor with nanometric resolution. Ann CIRP 56(1):529–532
Shimizu Y, Ito T, Li X, Kim WJ, Gao W (2014) Design and testing of a four-probe optical sensor head for three-axis surface encoder with a mosaic scale grating. Meas Sci Technol 25:094002
Gao W, Kimura A (2010) A fast evaluation method for pitch deviation and out-of-flatness of a planar scale grating. CIRP Ann Manuf Techn 59:505–508
Hecht E (2016) Optics. Pearson, London