Radiation-enhanced thermal oxidation of silicon
Tóm tắt
A technique of radiation-enhanced thermal oxidation of silicon is developed and implemented in process equipment. Test SiO2 films are grown under exposure to 511-keV gamma-ray photons. Their electrical and radiation performance are evaluated. Basic mechanisms of radiation-enhanced oxide growth are proposed.
Tài liệu tham khảo
Motyagin, A.I., Sukharev, A.A., and Yanenko, V.V., USSR Inventor’s Certificate no. 1 807 791, 1990.
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