Plasma stream homogeneity in metal plasma immersion ion implantation and deposition
Tóm tắt
The homogeneity of metal plasma immersion ion implantation and deposition (MePIIID) was investigated for flat substrates and the materials systems Al, AlN, Ti, TiN, TiO/sub 2/, and ZnO. An influence of pulse voltage, cathode material and backfill on the lateral homogeneity was observed, so that the plasma stream emanating from the arc as well as the plasma sheath evolving around the substrates contribute to the radial homogeneity in MePIIID.
Từ khóa
#Plasma immersion ion implantation #Plasma sheaths #Plasma density #Plasma materials processing #Voltage #Plasma sources #Plasma accelerators #Cathodes #Acceleration #Zinc oxideTài liệu tham khảo
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