Plasma Chemical and Electrical Modeling of a Dielectric Barrier Discharge in Kr–Cl2 Gas Mixtures
Tóm tắt
This paper reports the study of the Kr–Cl2 plasma chemistry in terms of the homogenous model of a dielectric barrier discharge and for two kinds of the applied voltage excitation shape. The effect of Cl2 concentration in the gas mixture, as well as gas pressure and power frequency on the discharge efficiency and the 222 nm photon generation, under typical experimental operating conditions, have been investigated and discussed. Calculations suggest that the overall conversion efficiency from electrical energy to ultraviolet emission in the lamp is in the range of 4.4–12 %, and it will be very affected at high chlorine percentage (>1 %) and high gas pressure (>200 Torr). A comparison between the sinusoidal and the burst excitation waveforms reveals that the burst excitation method provides an enhanced light source performance compared to the sinusoidal wave.
Tài liệu tham khảo
Eliasson B, Kogelschatz U (1988) Appl Phys B 46:299
Kogelschatz U, Eliasson B, Egli W (1997) J Phys IV 7:C4
Mildren RP, Carman RJ (2001) J Phys D Appl Phys 34:L1
Carman RJ, Mildren RP, Ward BK, Kane DM (2004) J Phys D Appl Phys 37:2399
Oda A, Sugawara H, Sakai Y, Akashi K (2000) J Phys D Appl Phys 33:1507
Bogdanov EA, Kudryavtsev AA, Arslanbekov RP, Kolobov VI (2004) J Phys D Appl Phys 37:2987
Kolts JH, Setser DW (1978) J Chem Phys 68:4848
Eliasson B, Kogelschatz U (1991) IEEE Trans Plasma Sci 19:309
Zhang JY, Boyd IW (1996) J Appl Phys 80:633
Boichenko AM, Skakun VS, Sosnin EA, Tarasenko VF, Yakovlenko SI (2000) Laser Phys 10:540
Vollkommer F, Hitzschke L (1998) Dielectric barrier discharge. In: Babucke G (ed) Proceedings of the 8th international symposium on the science and technology of light sources (LS-8) (Greifswald, Germany). (Greifswald: Inst. Low Temp. Plasma Phys.), pp 51–60
Zvereva GV, Gerasimov GN (2001) Opt Spektrosk 90:376 [(2001) Opt. Spectrosc. 90: 321]
Lomaev MI, Tarasenko VF, Shitts DV (2002) Tech Phys Lett 28:33
Boichenko M, Lomaev MI, Tarasenko VF (2008) Laser Phys 18:738
Yokotani A, Takezoe N, Kurosawa K, Igarashi T, Matsuno H (1996) Appl Phys Lett 69:1399
Braun AM, Maurette MT, Oliveros E (1991) Photochemical Technology. John Wiley, New York
Scheir RF, Fencl BF (1996) Heat Pip Air Cond J 68:109
Elliott DJ (1986) Microlithography: process technology for IC fabrication. McGraw-Hill, New York
Collier D, Pantley W (1998) Laser Focus World 34:63
Scheytt H, Esrom H, Prager L, Mehnert R, Von Sonntag C (1993) In: Penetrante BM, Schulthesis SE (eds) Non-thermal plasma techniques for pollution control: part B: electron beam and electrical discharge processing. Springer, Heidelberg, pp 91–102
Legrini O, Oliveros E, Braun AM (1993) Chem Rev 93:671
Sosnin EA, Oppenländer T, Tarasenko VF (2006) J Photochem Photobiol C 7:145
Guivan NN, Janca J, Brablec A, Stahel P, Slavicek P, Shimon LL (2005) J Phys D Appl Phys 38:3188
Xu X (2001) Thin Solid Films 390:237
Boeuf JP (2003) J Phys D Appl Phys 36:R53
Yu H, Xiu ZL, Ren CS, Zhang JL, Wang DZ, Wang YN, Ma TS (2005) IEEE Trans Plasma Sci 33:1405
Erofeev MV, Tarasenko VF (2006) J Phys D Appl Phys 39:3609
Avdeev SM, Boichenko AM, Sosnin EA, Tarasenko VF, Yakovlenko SI (2007) Laser Phys 17:1119
Zhang JY, Boyd IW (1998) J Appl Phys 84:1174
Falkenstein Z, Coogan JJ (1997) J Phys D Appl Phys 30:2704
Merbahi N, Sewraj N, Marchal F, Salamero Y, Millet P (2004) J Phys D Appl Phys 37:1664
Zhang JY, Boyd IW (2000) Appl Surf Sci 168:296
Beleznai Sz, Mihajlik G, Agod A, Maros I, Juhasz R, Némith Zs, Jakab L, Richter P (2006) J Phys D Appl Phys 39:3777
Oda A, Sakai Y, Akashi H, Sugawara H (1999) J Phys D Appl Phys 32:2726
Liu S, Neiger M (2003) J Phys D Appl Phys 36:3144
Carman RJ, Mildren RP (2003) J Phys D Appl Phys 36:19
Carman RJ, Mildren RP (2002) IEEE Trans Plasma Sci 30:154
Shiga T, Pitchford LC, Boeuf JP, Mikoshiba S (2003) J Phys D Appl Phys 36:512
Beleznai Sz, Mihajlik G, Maros I, Balázs L, Richter P (2010) J Phys D Appl Phys 43:015203
Bogdanov EA, Kudryavtsev AA, Arslanbekov RR (2006) Contrib Plasma Phys 46:807
Belasri A, Khodja K, Bendella S, Harrache Z (2010) J Phys D Appl Phys 43:445202
Zvereva GN (2003) Opt Spectrosc 94:191
Bussiahn R, Pipa AV, Kindel E (2010) Contrib Plasma Phys 50:182
Bollanti S, Clementi G, Di Lazzaro P, Flora F, Giordano G, Letardi T, Muzzi F, Shina G, Zheng ZE (1999) IEEE Trans Plasma Sci 27:211
Beleznai Sz, Mihajlik G, Maros I, Balázs L, Richter P (2008) J Phys D Appl Phys 41:115202
Belasri A, Harrache Z (2010) Phys Plasmas 17:123501
Belasri A, Harrache Z (2011) Plasma Chem Plasma Process 31:787
Oppenländer T (2003) Photochemical purification of water and air. Wiley-VCH, Weinheim
Zhuang X, Han Q, Zhang H, Feng X, Roth M, Rosier O, Zhu S, Zhang S (2010) J Phys D Appl Phys 43:205202
Erofeev MV, Schitz DV, Skakun VS, Sosnin EA, Tarasenko VF (2010) Phys Scr 82:045403
Boichenko AM, Yakovlenko SI (2004) Laser Phys 14:1
Panchenko AN, Tarasenko VF (2008) Quantum Electron 38:88
Lomaev MI, Tarasenko VF, Tkachev AN, Shitts DV, Yakovlenko SI (2004) Tech Phys 49:790
Tarasenko VF (2002) Pure Appl Chem 74:465
Boichenko AM, Skakun VS, Sosnin EA, Tarasenko VF, Yakovlenko SI (2000) Laser Phys 10:540
Feng X, Zhu S (2006) Phys Scr 74:322
Erofeev MV, Tarasenko VF (2008) Quantum Electron 38:401
Code Bolsig, the siglo series of discharge modeling software, 1996 by Kinema Software: http://www.siglo-kinema.com
Lück H, Loffhagen D, Bötticher W (1994) Appl Phys B 58:123
Avtaeva SV, Avdeev SM, Sosnin EA (2010) Plasma Phys Rep 36:719
Lamrous O, Gaouar A, Yousfi M (1996) J Appl Phys 79:6775
Zvereva GN (2010) Opt Spectrosc 108:4
Gerasimov GN, Zvereva GN (1997) J Opt Technol 64:15
Boichenko AM, Tarasenko VF, Yakovlenko SI (2000) Laser Phys 10:1159
Casper LC (2007) On the operation of a long-pulse KrCl excimer laser, PhD Thesis. University of Twente, The Netherlands
Zuev VS, Kanaev AV, Mikheev LD (1984) Sov J Quantum Electron 14:135
Efremov AM, Svettsov VI, Sitanov DV (2008) High Temp 46:11
Eckstrom DJ, Nakano HH, Lorents DC, Rothem T, Betts JA, Lainhart ME, Triebes KJ, Dakin DA (1988) J Appl Phys 64:1691
Avtaeva SV, Kulumbaev EB, Skornyakov AV (2008) One-dimensional drift-diffusion model of the Kr dielectric barrier discharge. In: 15th SHCE proceedings pinches, plasma focus and capillary discharge, Russia, pp 248–251
Castex C, le Calvé J, Haaks D, Jordan B, Zimmerer G (1980) Chem Phys Lett 70:106
Kannari F, Kimura WD, Ewing JJ (1990) J Appl Phys 68:2615
Xu X (2000) Dynamics of high and low pressure plasma remediation, PhD Thesis. University of Illinois at Urbana-Champaign
Boichenko AM, Skakum VS, Sosnin EA, Tarasenko VF (1996) Quantum Electron 26:336
Durrett MJ (1984) Excited state kinetics in High pressure gas mixtures of krypton and chlorine and in krypton and xenon, PhD Thesis. Rice University
Gear CW (1971) Numerical initial value problems in ordinary differential equations. Prentice-Hall, Englewood Cliffs, NJ