Plasma Characteristics of Internal Inductively Coupled Plasma Source with Ferrite Module
Tóm tắt
Electrical and plasma properties of a U-shaped internal inductively coupled plasma (ICP) source with/without a Ni-Zn ferrite module installed above the ICP antenna were investigated. By installing the ferrite module on the antenna, the increase of plasma density and the decrease of plasma potential could be observed. The increase of plasma density was related to the efficient inductive coupling to the plasma by concentrating the induced magnetic field between the antenna and the substrate. At 800 W of ICP power and 20mTorr Ar, a high density plasma on the order of 4.5′1011/cm3 could be obtained.
Tài liệu tham khảo
Kortshagan U, Gibson ND, Lawler JE (1996) J Phys D Appl Phys 29:1224
Sakawa Y, Yano K, Shoji T (2004) J Vac Sci Technol A 22:L7
Sierros K, Cairns D, Abell J, Kukureka S (2010) Thin Solid Films 518:2623
Lee S, Kim H, Choo DJ, Jang J (2010) Org Electron 11:1268
Kessels WMM, Nadir K, Sanden M (2006) J. Appl. Phys. 99:076110
Kim KN, Lim JH, Lim WS, Yeom GY (2010) IEEE Trans Plasma Sci 38:133
Lim JH, Gwon GH, Hong SP, Kim KN, Yeom GY (2010) J Phys D Appl Phys 43:95202
Godyak VA, Piajak RB, Alexandrovich BM (2002) Plasma Source Sci Technol 11:525
Godyak VA, Piajak RB, Alexandrovich BM (1994) Plasma Source Sci Technol 3:169
Frank CM, Grulke O, Klinger T (2002) Rev Sci Instrum 73:3768
Lim JH, Kim KN, Park JK, Yeom GY (2008) Phys Plasmas 15:083501
Lee K, Lee Y, Jo S, Chung CW, Godyak VA (2008) Plasma Source Sci Technol 17:15014
Lim JH, Kim KN, Gweon GH, Yeom GY (2009) J Phys D Appl Phys 42:15204
Godyak VA (2006) IEEE Trans Plasma Sci 34:755