Photocurrent enhancement in thin‐film silicon solar cells by combination of anti‐reflective sub‐wavelength structures and light‐trapping textures

Progress in Photovoltaics: Research and Applications - Tập 23 Số 11 - Trang 1572-1580 - 2015
Hitoshi Sai1, Takuya Matsui1, Kimihiko Saito2, Michio Kondo1, Isao Yoshida3
1National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan
2Fukushima University, Fukushima, Japan
3Photovoltaic Power Generation Technology Research Association (PVTEC) Tsukuba Japan

Tóm tắt

AbstractDielectric films with anti‐reflective sub‐wavelength structures are applied to thin‐film silicon solar cells to improve the light incoupling at the front surface. It is verified that modification of the refractive index of the incident medium using dielectric films with sub‐wavelength structures is beneficial to reduce the average reflectivity of Si solar cells with an anti‐reflective coating based on optical interference. It is also shown that the sub‐wavelength structure must be combined with a proper light‐trapping texture to enhance the absorption within thin‐film silicon solar cells. The effectiveness of dielectric films with sub‐wavelength structures is demonstrated by an increase of the short‐circuit current density of a microcrystalline silicon cell from 29.1 to 30.4 mA/cm2 in a designated area of 1 cm2. The optical interplay between the dielectric films and the light‐trapping textures is also discussed. Copyright © 2015 John Wiley & Sons, Ltd.

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Progress in Photovoltaics: Research and Applications

Tập 23 Số 11

1572-1580

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