Nonlinear Optical Characterization of GaN Layers Grown by MOCVD on Sapphire

Springer Science and Business Media LLC - Tập 5 - Trang 768-774 - 2020
Ivan M. Tiginyanu1, Igor V. Kravetsky1, Dimitris Pavlidis1,2, Andreas Eisenbach1,2, Ralf Hildebrandt1,3, Gerd Marowsky1,3, Hans L. Hartnagel1,4
1Laboratory of Low-Dimensional Semiconductor Structures, Institute of Applied Physics, Technical University of Moldova, Chisinau, Moldova
2Solid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, USA
3Laser-Laboratorium Göttingen, Göttingen, Germany
4Institut für Hochfrequenztechnik, Technische Universität Darmstadt, Darmstadt, Germany

Tóm tắt

Optical second and third harmonic generation measurements were carried out on GaN layers grown by metalorganic chemical vapor deposition (MOCVD) on sapphire substrates. The measured d33 is 33 times the d11 of quartz. The angular dependence of second-harmonic intensity as well as the measured ratios d33/d15 = −2.02 and d33/d31 =−2.03 confirm the wurzite structure of the studied GaN layers with the optical c-axis oriented perpendicular to the sample surface. Fine oscillations were observed in the measured second and third harmonic angular dependencies. A simple model based on the interference of the fundamental beam in the sample was used to explain these oscillations.

Tài liệu tham khảo

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