Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness

Thin Solid Films - Tập 581 - Trang 39-47 - 2015
Tetsuhide Shimizu1, Yoshikazu Teranishi2, Kazuo Morikawa2, Hidetoshi Komiya2, Tomotaro Watanabe2, Hiroshi Nagasaka2, Ming Yang1
1Division of Human Mechatronics Systems, Graduate School of System Design, Tokyo Metropolitan University, 6-6 Asahigaoka, Hino-shi, 191-0065 Tokyo, Japan
2Surface Finishing Technology Group, Tokyo Metropolitan Industrial Technology Research Institute, 2-4-10, Aomi, Kohtoh-ku, 135-0064 Tokyo, Japan

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Thin Solid Films

Tập 581

39-47

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