Impact of NH/sub 3/ pre-treatment on the electrical and reliability characteristics of ultra thin hafnium silicate films prepared by re-oxidation method
60th DRC. Conference Digest Device Research Conference - Trang 195-196
Tóm tắt
The trade-offs between the benefits of NH/sub 3/ pre-treatment such as improved scalability, lower leakage and higher breakdown fields, and potential issues such as large hysteresis, degraded MOSFET characteristics and poorer reliability on Hf-silicate devices have been studied.
Từ khóa
#Capacitors #Hysteresis #MOS devices #MOSFETs #Degradation #Atomic layer deposition #Gate leakage #Annealing #Life estimation #Lifetime estimationTài liệu tham khảo
10.1063/1.371888
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