Hydrogenation of ZnS passivation for HgCdTe
COMMAD 2000 Proceedings. Conference on Optoelectronic and Microelectronic Materials and Devices - Trang 177-180
Tóm tắt
The physical and electrical effects of exposing ZnS passivation to a H/sub 2//CH/sub 4/ reactive ion etch (RIE) plasma are examined. Using secondary ion mass spectrometry (SIMS) and capacitance-voltage (CV) analysis, hydrogen is shown to penetrate through the ZnS and accumulate on the ZnS side of the ZnS/HgCdTe interface, causing a reduction in the positive fixed charge density, possibly due to binding at sulphur vacancy sites. CV results show a reduction in the average and spread of fixed interface charge (Q/sub f/), however the interface trap density (Qit) is unchanged. With a 2 hour 80/spl deg/C bake, SIMS profiles indicate a change in the ZnS/HgCdTe interface with movement of H, Cd, Hg and Te species.
Từ khóa
#Zinc compounds #Passivation #Etching #Plasma applications #Plasma density #Mass spectroscopy #Capacitance-voltage characteristics #Hydrogen #Mercury (metals) #TelluriumTài liệu tham khảo
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