Hydrogenation of ZnS passivation for HgCdTe

J.K. White1, R. Pal2, C.A. Musca3, J.M. Dell3, L. Faraone3, P. Burke4
1Department of Electrical and Electrical Engineering, University of Western Australia, Australia
2Solid State Physics Laboratory, New Delhi, India
3Department of Electrical & Electronic Engineering, University of Western Australia, Australia
4Australian Nuclear Science슠and슠Technology Organisation, Australia

Tóm tắt

The physical and electrical effects of exposing ZnS passivation to a H/sub 2//CH/sub 4/ reactive ion etch (RIE) plasma are examined. Using secondary ion mass spectrometry (SIMS) and capacitance-voltage (CV) analysis, hydrogen is shown to penetrate through the ZnS and accumulate on the ZnS side of the ZnS/HgCdTe interface, causing a reduction in the positive fixed charge density, possibly due to binding at sulphur vacancy sites. CV results show a reduction in the average and spread of fixed interface charge (Q/sub f/), however the interface trap density (Qit) is unchanged. With a 2 hour 80/spl deg/C bake, SIMS profiles indicate a change in the ZnS/HgCdTe interface with movement of H, Cd, Hg and Te species.

Từ khóa

#Zinc compounds #Passivation #Etching #Plasma applications #Plasma density #Mass spectroscopy #Capacitance-voltage characteristics #Hydrogen #Mercury (metals) #Tellurium

Tài liệu tham khảo

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