K.T. Chan1, C.Y. Chen1, A. Chin1, J.C. Hsieh2,1, J. Liu1, T.S. Duh1, W.J. Lin1,3
1Department of Electronics Engineering, National Chiao Tung University, Hsinchu, Taiwan
2United Microelectronics Corporation Limited, Hsinchu, Taiwan
3Institute of Nuclear Energy Research, Taoyuan, Taiwan
Tóm tắt
We report a very simple process to fabricate high performance filters on Si at 40 GHz using H/sup +/ implantation. The filter has only -3.4 dB loss at peak transmission of 40 GHz with a broad 9 GHz bandwidth, which are the best filter results on Si at mm-wave frequency. In sharp contrast, the filter on 1.5 /spl mu/m SiO/sub 2/ isolated Si has much worse transmission and reflection loss and failed for circuit application.