Gate defects analysis in AlGaN/GaN devices by mean of accurate extraction of the Schottky Barrier Height, electrical modelling, T-CAD simulations and TEM imaging

Microelectronics Reliability - Tập 76 - Trang 344-349 - 2017
J.G. Tartarin1, O. Lazar1, D. Saugnon1, B. Lambert2, C. Moreau3, C. Bouexiere3, E. Romain-Latu4, K. Rousseau4, A. David5, J.L. Roux6
1LAAS-CNRS and Université de Toulouse, Université Paul Sabatier, 31031 Toulouse, France
2United Monolithic Semiconductors, Villebon-sur Yvette 91140, France
3DGA MI, Rennes 35998, France
4SERMA Technologies MINATEC BHT, Grenoble 38040, France
5Biophy Research, Fuveau 13710, France
6CNES, Quality Assurance Directorate Department, Toulouse 31400, France

Tài liệu tham khảo

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