Formation of Periodic Microbump Arrays by Metal-Assisted Photodissolution of InP

Japanese Journal of Applied Physics - Tập 49 Số 4R - Trang 046505 - 2010
Hidetaka Asoh1, Takayuki Yokoyama1, Sachiko Ono1
1Department of Applied Chemistry, Faculty of Engineering, Kogakuin University, 2665-1 Nakano, Hachioji, Tokyo 192-0015, Japan

Tóm tắt

The metal-assisted chemical etching of an InP substrate combined with UV irradiation was investigated. Microbump arrays with ordered intervals were fabricated by the site-selective photodissolution of an InP substrate using patterned noble-metal films as catalysts. The etching rate of the InP substrate using noble-metal catalysts was drastically accelerated by UV irradiation. The etching speed of the present “metal-assisted photodissolution” increased in the order of Au < Pd < Pt, corresponding to the order of the magnitude of the work function of each metal used in this study.

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