Electrochemical wet etching in KOH:H20 solution and secondary/ion image passive voltage contrast as a complementary technique in failure analysis

Microelectronics Reliability - Tập 40 - Trang 1455-1459 - 2000
Oh Chong Khiam1, Bi Jian Hua1, Shailesh Redkar1
1Chartered Semiconductor Manufacturing Ltd Failure Analysis Laboratory 60 Woodlands Industrial Park D Street 2 Singapore 738406

Tài liệu tham khảo

Ohtani, 1997, Detection of Gate Oxide Defects Using Electrochemical Wet Etching in KOH:H20[ Beall, 1997, Voltage Contrast Techniques and Procedures, 153 Pearce, 1991
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Microelectronics Reliability

Tập 40

1455-1459

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