Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition

Thin Solid Films - Tập 430 - Trang 135-140 - 2003
H.R. Moutinho1, C.-S. Jiang1, J. Perkins1, Y. Xu2, B.P. Nelson2, K.M. Jones2, M.J. Romero2, M.M. Al-Jassim3
1National Renewable Energy Laboratory, 1617, Cole Blvd., Golden, CO 80401, USA
2National Renewable Energy Laboratory, 1617 Cole Blvd., Golden, CO 80401, USA
3National Renewable Energy Laboratory, 1617 Cole Blvd Golden CO 80401 USA

Tài liệu tham khảo