Effect of segregation on other physicochemical processes in implanted layers
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques - Tập 6 - Trang 782-783 - 2012
Tóm tắt
The kinetics of the reaction of implanted atoms with the substrate in the presence of a cluster of implanted atoms is considered. It is shown that the reaction rate changes significantly due to cluster formation.
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