Dislocation configurations in strained single-heterostructure layers
COMMAD 2000 Proceedings. Conference on Optoelectronic and Microelectronic Materials and Devices - Trang 471-474
Tóm tắt
Detailed force-balance considerations can lead to a description of the dislocation configuration within a strained layer. Dislocation configurations are of interest because critical thicknesses of epitaxially grown layers depend on the evolution of the configuration of threading dislocations. Moreover, it promises to shed light on investigations of critical thickness criteria for Multiple Quantum Well (MQW) structures. This paper reports a theoretical study of dislocation configurations in structures by examining the forces acting on a dislocation segment and developing governing equations to describe the equilibrium structure as a function of layer strain and thickness.
Từ khóa
#Iron #Capacitive sensors #III-V semiconductor materials #Stress #Geometry #Atmosphere #Surface tension #Surface treatment #Shape #EquationsTài liệu tham khảo
10.1063/1.346458
10.1103/PhysRev.116.1113
hirth, 1992, Theory of Dislocations
10.1063/1.102140
matthews, 1974, J Cryst Growth, 27, 118
10.1116/1.568741
