Defects and interfaces in epitaxial ZnO/α-Al2O3 and AlN/ZnO/α-Al2O3 heterostructures

Journal of Applied Physics - Tập 84 Số 5 - Trang 2597-2601 - 1998
J. Narayan1, K. Dovidenko1, A.V. Narlikar1, S. Oktyabrsky1
1Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina, 27695-7916

Tóm tắt

We have investigated the nature of epitaxy, defects (dislocations, stacking faults, and inversion domains), and heterointerfaces in zinc oxide films grown on (0001) sapphire and explored the possibility of using it as a buffer layer for growing group III nitrides. High quality epitaxial ZnO films were grown on sapphire using pulsed laser deposition in the temperature range 750–800 °C. The epitaxial relationship of the film with respect to (0001) sapphire was found to be (0001)ZnO∥(0001)sap, with in-plane orientation relationship of [011̄0]ZnO∥[1̄21̄0]sap. This in-plane orientation relationship corresponds to a 30° rotation of ZnO basal planes with respect to the sapphire substrate, which is similar to the epitaxial growth characteristics of AlN and GaN on sapphire. The threading dislocations in ZnO were found to have mostly 1/3〈112̄0〉 Burgers vectors. The planar defects (mostly I1 stacking faults) were found to lie in the basal plane with density of about 105 cm−1. We have grown epitaxial AlN films at temperatures around 770 °C using ZnO/sapphire heterostructure as a substrate and observed the formation of a thin reacted layer at the AlN/ZnO interface. The implications of low defect content in ZnO films compared to III–V nitrides and the role of ZnO films as a buffer layer for III–V nitrides are discussed.

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Tài liệu tham khảo

1997, Science, 276, 895, 10.1126/science.276.5314.895

1995, Mater. Res. Soc. Symp. Proc., 363, 219

1995, Appl. Phys. Lett., 67, 1674, 10.1063/1.115053

1996, Mater. Res. Soc. Symp. Proc., 397, 157

1996, J. Appl. Phys., 80, 787, 10.1063/1.362887

1995, J. Am. Ceram. Soc., 78, 931

1983, J. Vac. Sci. Technol. A, 1, 1806, 10.1116/1.572219

1994, Appl. Phys. Lett., 65, 2963, 10.1063/1.112478

1997, Appl. Phys. Lett., 70, 2735, 10.1063/1.119006

1996, J. Appl. Phys., 79, 2439, 10.1063/1.361172

1992, Appl. Phys. Lett., 61, 1290, 10.1063/1.107568

1994, J. Appl. Phys., 75, 860, 10.1063/1.356440

1996, Appl. Phys. Lett., 66, 1249

1998, Mater. Res. Soc. Symp. Proc., 482, 411

1991, J. Am. Ceram. Soc., 74, 1226, 10.1111/j.1151-2916.1991.tb04091.x

1973, Phys. Status Solidi B, 58, 277, 10.1002/pssb.2220580127

1997, Mater. Sci. Eng., B, 43, 161, 10.1016/S0921-5107(96)01855-7

1996, J. Electron. Mater., 25, 1545, 10.1007/BF02655397

1990, Ceram. Bull., 69, 1959

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Thông tin xuất bản

Journal of Applied Physics

Tập 84 Số 5

2597-2601

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