Air-based sputtering deposition of TiNxOy films for solar selective absorber coatings applications
Tài liệu tham khảo
Santecchia, 2015, Wear resistance investigation of titanium nitride-based coatings, Ceram. Int., 41, 10349, 10.1016/j.ceramint.2015.04.152
Pelaez, 2012, A review on the visible light active titanium dioxide photocatalysts for environmental applications, Appl. Catal. B Environ., 125, 331, 10.1016/j.apcatb.2012.05.036
Vaz, 2013, 113
Vaz, 2004, Structural, optical and mechanical properties of coloured TiNxOy thin films, Thin Solid Films, 447-448, 449, 10.1016/S0040-6090(03)01123-4
Chan, 2012, Air-based deposition and processing windows of sputtered TiN, TiNxOy, and N-doped TiOx thin films, Surf. Coat. Technol., 210, 135, 10.1016/j.surfcoat.2012.09.004
Kim, 2009, Titanium oxynitride films for a bipolar plate of polymer electrolyte membrane fuel cell prepared by inductively coupled plasma assisted reactive sputtering, J. Power Sources, 193, 570, 10.1016/j.jpowsour.2009.03.076
Cuong, 2006, Structural and electrical properties of TiNxOy thin-film resistors for 30 dB applications of π-type attenuator, J. Electrochem. Soc., 153, G856, 10.1149/1.2219707
Martínez-Ferrero, 2007, Nanostructured titanium oxynitride porous thin films as efficient visible-active photocatalysts, Adv. Funct. Mater., 17, 3348, 10.1002/adfm.200700396
Demeter, 2017, Visible-light photocatalytic activity of TiOxNy thin films obtained by reactive multi-pulse high power impulse magnetron sputtering, Surf. Coat. Technol., 324, 614, 10.1016/j.surfcoat.2016.10.011
He, 2008, Structure, composition and evolution of dispersive optical constants of sputtered TiO2 thin films: effects of nitrogen doping, J. Phys. D. Appl. Phys., 41, 10.1088/0022-3727/41/4/045304
Nunes, 2003, Graded selective coatings based on chromium and titanium oxynitride, Thin Solid Films, 442, 173, 10.1016/S0040-6090(03)00967-2
Zhang, 2017, A review on thermal stability and high temperature induced ageing mechanisms of solar absorber coatings, Renew. Sust. Energ. Rev., 67, 1282, 10.1016/j.rser.2016.09.083
Tulchinsky, 2014, A novel non-selective coating material for solar thermal potential application formed by reaction between sol–gel titania and copper manganese spinel, Sol. Energy Mater. Sol. Cells, 120 (, 23, 10.1016/j.solmat.2013.08.004
Feng, 2015, The spectral selective absorbing characteristics and thermal stability of SS/TiAlN/TiAlSiN/Si3N4 tandem absorber prepared by magnetron sputtering, Sol. Energy, 111, 350, 10.1016/j.solener.2014.11.005
Rebouta, 2012, Characterization of TiAlSiN/TiAlSiON/SiO2 optical stack designed by modelling calculations for solar selective applications, Sol. Energy Mater. Sol. Cells, 105, 202, 10.1016/j.solmat.2012.06.011
Srinivasa Rao, 2015, A highly thermally stable Mn–Cu–Fe composite oxide based solar selective absorber layer with low thermal loss at high temperature, J. Alloys Compd., 644, 906, 10.1016/j.jallcom.2015.05.038
Eitle, 1992, Chemical composition of TiNxOy solar selective absorbers, Proc. SPIE, 1727, 25, 10.1117/12.130486
Lazarov, 1992, Effects of roughness on TiNxOy-Cu selective absorbers, Proc. SPIE, 1727, 34, 10.1117/12.130499
Chen, 2014, Control of optical properties of TiNxOy films and application for high performance solar selective absorbing coatings, Opt. Mater. Express, 4, 1833, 10.1364/OME.4.001833
Zhang, 2016, Design of a high performance selective solar absorber with the structure of SiO2-TiO2-TiNxOy-Cu, ECS J. Solid State Sci. Technol., 5, N43, 10.1149/2.0241607jss
Zhang, 2017, Modeling of a selective solar absorber thin film structure based on double TiNxOy layers for concentrated solar power applications, Sol. Energy, 142, 33, 10.1016/j.solener.2016.12.012
Chan, 2011, Air-based deposition of conductive nitride thin films by sputtering, J. Electrochem. Soc., 158, P75, 10.1149/1.3571037
Chan, 2008, Preparation of titanium oxynitride thin films by reactive sputtering using air/Ar mixtures, Surf. Coat. Technol., 203, 614, 10.1016/j.surfcoat.2008.04.094
Chan, 2009, X-ray photoelectron spectroscopy analyses of titanium oxynitride films prepared by magnetron sputtering using air/Ar mixtures, Thin Solid Films, 517, 5006, 10.1016/j.tsf.2009.03.100
Chan, 2010, Preparation of ZrNxOy films by magnetron sputtering using air as a reactive gas, Thin Solid Films, 518, 7300, 10.1016/j.tsf.2010.04.097
Chan, 2009, Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures, Thin Solid Films, 518, 1369, 10.1016/j.tsf.2009.09.062
Shirley, 1972, High-resolution X-ray photoemission spectrum of the valence bands of gold, Phys. Rev. B, 5, 4709, 10.1103/PhysRevB.5.4709
Zhao, 1997, Overall energy model for preferred growth of TiN films during filtered arc deposition, J. Phys. D. Appl. Phys., 30, 5, 10.1088/0022-3727/30/1/002
Vasile, 1990, The characterization of titanium nitride by X-ray photoelectron spectroscopy and Rutherford backscattering, J. Vac. Sci. Technol. A, 8, 99, 10.1116/1.576995
Braic, 2007, Preparation and characterization of titanium oxy-nitride thin films, Appl. Surf. Sci., 253, 8210, 10.1016/j.apsusc.2007.02.179
Jeyachandran, 2007, Properties of titanium nitride films prepared by direct current magnetron sputtering, Mater. Sci. Eng. A, 445-446, 223, 10.1016/j.msea.2006.09.021
Matsuoka, 2005, Effects of arrival rate and gas pressure on the chemical bonding and composition in titanium nitride films prepared on Si(100) substrates by ion beam and vapor deposition, J. Vac. Sci. Technol. A, 23, 137, 10.1116/1.1839895
Saha, 1992, Titanium nitride oxidation chemistry: an X-ray photoelectron spectroscopy study, J. Appl. Phys., 72, 3072, 10.1063/1.351465
Sanon, 1991, Band-gap narrowing and band structure in degenerate tin oxide (SnO2) films, Phys. Rev. B, 44, 5672, 10.1103/PhysRevB.44.5672
Rumble, 2017
Eisenhammer, 1998, High-temperature optical properties and stability of selective absorbers based on quasicrystalline AlCuFe, Sol. Energy Mater. Sol. Cells, 54, 379, 10.1016/S0927-0248(98)00089-0
Larson, 1996, 715
Ning, 2016, Effects of substrates, film thickness and temperature on thermal emittance of Mo/substrate deposited by magnetron sputtering, Vacuum, 128, 73, 10.1016/j.vacuum.2016.03.008
