A comprehensive review of ZnO materials and devices

Journal of Applied Physics - Tập 98 Số 4 - 2005
Ü. Özgür1, Ya. I. Alivov1, C. Liu1, Ali Teke1, M. A. Reshchikov1, S. Doğan1, V. Avrutin1, S.-J. Cho1, H. Morkoç̌1
1Virginia Commonwealth University Department of Electrical Engineering and Physics Department, , Richmond, Virginia 23284-3072

Tóm tắt

The semiconductor ZnO has gained substantial interest in the research community in part because of its large exciton binding energy (60meV) which could lead to lasing action based on exciton recombination even above room temperature. Even though research focusing on ZnO goes back many decades, the renewed interest is fueled by availability of high-quality substrates and reports of p-type conduction and ferromagnetic behavior when doped with transitions metals, both of which remain controversial. It is this renewed interest in ZnO which forms the basis of this review. As mentioned already, ZnO is not new to the semiconductor field, with studies of its lattice parameter dating back to 1935 by Bunn [Proc. Phys. Soc. London 47, 836 (1935)], studies of its vibrational properties with Raman scattering in 1966 by Damen et al. [Phys. Rev. 142, 570 (1966)], detailed optical studies in 1954 by Mollwo [Z. Angew. Phys. 6, 257 (1954)], and its growth by chemical-vapor transport in 1970 by Galli and Coker [Appl. Phys. Lett. 16, 439 (1970)]. In terms of devices, Au Schottky barriers in 1965 by Mead [Phys. Lett. 18, 218 (1965)], demonstration of light-emitting diodes (1967) by Drapak [Semiconductors 2, 624 (1968)], in which Cu2O was used as the p-type material, metal-insulator-semiconductor structures (1974) by Minami et al. [Jpn. J. Appl. Phys. 13, 1475 (1974)], ZnO∕ZnSe n-p junctions (1975) by Tsurkan et al. [Semiconductors 6, 1183 (1975)], and Al∕Au Ohmic contacts by Brillson [J. Vac. Sci. Technol. 15, 1378 (1978)] were attained. The main obstacle to the development of ZnO has been the lack of reproducible and low-resistivity p-type ZnO, as recently discussed by Look and Claflin [Phys. Status Solidi B 241, 624 (2004)]. While ZnO already has many industrial applications owing to its piezoelectric properties and band gap in the near ultraviolet, its applications to optoelectronic devices has not yet materialized due chiefly to the lack of p-type epitaxial layers. Very high quality what used to be called whiskers and platelets, the nomenclature for which gave way to nanostructures of late, have been prepared early on and used to deduce much of the principal properties of this material, particularly in terms of optical processes. The suggestion of attainment of p-type conductivity in the last few years has rekindled the long-time, albeit dormant, fervor of exploiting this material for optoelectronic applications. The attraction can simply be attributed to the large exciton binding energy of 60meV of ZnO potentially paving the way for efficient room-temperature exciton-based emitters, and sharp transitions facilitating very low threshold semiconductor lasers. The field is also fueled by theoretical predictions and perhaps experimental confirmation of ferromagnetism at room temperature for potential spintronics applications. This review gives an in-depth discussion of the mechanical, chemical, electrical, and optical properties of ZnO in addition to the technological issues such as growth, defects, p-type doping, band-gap engineering, devices, and nanostructures.

Từ khóa


Tài liệu tham khảo

1935, Proc. Phys. Soc. London, 47, 835, 10.1088/0959-5309/47/5/307

1935, Det Norske Videnskabers Skrifter, 1

1950, J. Appl. Phys., 21, 1283, 10.1063/1.1699591

1952, Research (London), 292

1957, Naturwiss., 12, 348

1954, J. Am. Ceram. Soc., 37, 534, 10.1111/j.1151-2916.1954.tb13985.x

1961, J. Chem. Phys., 35, 1268, 10.1063/1.1732035

1968, Acta Crystallogr., Sect. A: Cryst. Phys., Diffr., Theor. Gen. Crystallogr., A24, 403

1970, J. Appl. Phys., 41, 5063, 10.1063/1.1658600

1969, Phys. Rev., 185, 1099, 10.1103/PhysRev.185.1099

1960, J. Phys. Chem. Solids, 15, 86, 10.1016/0022-3697(60)90104-9

1965, Phys. Rev., 143, 512, 10.1103/PhysRev.143.512

1959, J. Phys. Chem. Solids, 11, 190, 10.1016/0022-3697(59)90213-6

1966, Phys. Rev., 152, 736, 10.1103/PhysRev.152.736

1967, Phys. Rev., 154, 785, 10.1103/PhysRev.154.785

1954, Z. Angew. Phys., 6, 257

1965, J. Appl. Phys., 36, 1674, 10.1063/1.1703106

1968, Phys. Rev. Lett., 20, 59, 10.1103/PhysRevLett.20.59

1961, J. Appl. Phys., 32, 2287, 10.1063/1.1777061

1973, Phys. Rev. B, 7, 3810, 10.1103/PhysRevB.7.3810

1970, Solid State Commun., 8, 1559, 10.1016/0038-1098(70)90608-3

1965, Phys. Rev. Lett., 15, 22, 10.1103/PhysRevLett.15.22

1952, J. Res. Natl. Bur. Stand., 49, 249, 10.6028/jres.049.025

1968, J. Appl. Phys., 39, 3049, 10.1063/1.1656731

1959, Solid State Phys., 8, 191, 10.1016/S0081-1947(08)60481-6

1966, Phys. Rev., 142, 570, 10.1103/PhysRev.142.570

1969, Phys. Rev., 181, 1351, 10.1103/PhysRev.181.1351

1973, Phys. Rev. B, 7, 3788, 10.1103/PhysRevB.7.3788

1977, Phys. Rev. B, 16, 3753, 10.1103/PhysRevB.16.3753

1968, J. Chem. Phys., 48, 2615, 10.1063/1.1669491

1967, J. Chem. Phys., 47, 1009, 10.1063/1.1711980

1969, Phys. Rev., 186, 942, 10.1103/PhysRev.186.942

1970, Appl. Phys. Lett., 16, 439, 10.1063/1.1653058

1971, J. Cryst. Growth, 11, 105, 10.1016/0022-0248(71)90172-2

1974, J. Cryst. Growth, 22, 117, 10.1016/S0022-0248(01)00852-1

1970, J. Electrochem. Soc., 117, 562, 10.1149/1.2407572

2001, Mater. Sci. Eng., B, 80, 381

2004, J. Cryst. Growth, 260, 166, 10.1016/j.jcrysgro.2003.08.019

1999, J. Cryst. Growth, 207, 30, 10.1016/S0022-0248(99)00363-2

1999, Appl. Phys. Lett., 75, 811, 10.1063/1.124521

2003, J. Appl. Phys., 94, 2895, 10.1063/1.1597944

2003, Phys. Rev. B, 67, 094115, 10.1103/PhysRevB.67.094115

2004, Appl. Phys. Lett., 84, 2268, 10.1063/1.1690469

2004, J. Mater. Sci., 15, 373

1998, J. Appl. Phys., 83, 983, 10.1063/1.366786

2000, Science, 287, 1019, 10.1126/science.287.5455.1019

2004, J. Phys.: Condens. Matter, 16, R209, 10.1088/0953-8984/16/7/R03

2004, Semicond. Sci. Technol., 19, R59, 10.1088/0268-1242/19/10/R01

2004, Phys. Status Solidi B, 241, 624, 10.1002/pssb.200304271

2004, Phys. Status Solidi A, 201, 2203, 10.1002/pssa.200404803

2004, Superlattices Microstruct., 34, 3

2005, Prog. Mater. Sci., 50, 293, 10.1016/j.pmatsci.2004.04.001

2004, Mater. Today, 7, 34

1992, J. Appl. Spectrosc., 52, 367

1993, Phys. Rev. B, 48, 7903, 10.1103/PhysRevB.48.7903

2000, Phys. Rev. B, 62, 1660, 10.1103/PhysRevB.62.1660

1977, CRC Handbook of Chemistry and Physics, 58th ed.

1989, Acta Crystallogr., Sect. C: Cryst. Struct. Commun., C45, 1867, 10.1107/S0108270189004269

1962, Science, 137, 993, 10.1126/science.137.3534.993.b

1995, J. Synchrotron Radiat., 2, 233, 10.1107/S0909049595009447

1998, Phys. Rev. B, 58, 8949, 10.1103/PhysRevB.58.8949

1970, Phys. Earth Planet. Inter., 3, 201, 10.1016/0031-9201(70)90056-7

1998, Phys. Rev. B, 58, 14102, 10.1103/PhysRevB.58.14102

1996, Phys. Rev. B, 53, 11425, 10.1103/PhysRevB.53.11425

1998, J. Appl. Phys., 83, 8065, 10.1063/1.367901

1993, Phys. Rev. B, 47, 3401, 10.1103/PhysRevB.47.3401

1997, Mol. Phys., 90, 75, 10.1080/002689797172886

1986, Elements, Oxides, and Silicates: High-Pressure Phases with Implications for the Earth’s Interior

2002, Phys. Rev. B, 66, 174106, 10.1103/PhysRevB.66.174106

1993, J. Electron Microsc., 47, 7903

2000, Appl. Phys. Lett., 76, 550, 10.1063/1.125851

2003, Appl. Phys. Lett., 82, 562, 10.1063/1.1536253

1960, Acta Crystallogr., 13, 814, 10.1107/S0365110X60001941

1983, Adv. Phys., 32, 1, 10.1080/00018738300101521

1969, Phys. Rev., 184, 733, 10.1103/PhysRev.184.733

1970, Phys. Rev. B, 4885

1971, Phys. Rev. Lett., 27, 97, 10.1103/PhysRevLett.27.97

1972, Phys. Rev. B, 6, 3056, 10.1103/PhysRevB.6.3056

1974, Phys. Rev. B, 9, 600, 10.1103/PhysRevB.9.600

1972, Phys. Rev. B, 5, 2296, 10.1103/PhysRevB.5.2296

1973, Phys. Status Solidi B, 58, 561, 10.1002/pssb.2220580216

1977, Solid State Commun., 22, 351, 10.1016/0038-1098(77)91064-X

1981, Phys. Rev. B, 24, 7275, 10.1103/PhysRevB.24.7275

1981, Phys. Rev. B, 24, 6899, 10.1103/PhysRevB.24.6899

1993, Phys. Rev. B, 47, 6971, 10.1103/PhysRevB.47.6971

1995, Phys. Rev. B, 52, R16977, 10.1103/PhysRevB.52.R16977

1994, Phys. Rev. B, 49, 17092, 10.1103/PhysRevB.49.17092

1995, Phys. Rev. B, 52, R14316, 10.1103/PhysRevB.52.R14316

1997, Surf. Sci., 373, 409, 10.1016/S0039-6028(96)01181-8

1977, Phys. Rev. B, 15, 4865, 10.1103/PhysRevB.15.4865

1978, Phys. Rev. B, 18, 4225, 10.1103/PhysRevB.18.4225

1987, Surf. Sci., 192, 309, 10.1016/0167-2584(87)90799-7

1982, Phys. Rev. B, 26, 3144, 10.1103/PhysRevB.26.3144

1985, Solid State Commun., 54, 701, 10.1016/0038-1098(85)90591-5

2003, Phys. Rev. B, 68, 125417, 10.1103/PhysRevB.68.125417

1988, Phys. Rev. B, 37, 8958, 10.1103/PhysRevB.37.8958

1991, Phys. Rev. B, 43, 2213, 10.1103/PhysRevB.43.2213

1993, Phys. Rev. B, 48, 4335, 10.1103/PhysRevB.48.4335

1994, Phys. Rev. B, 50, 10780, 10.1103/PhysRevB.50.10780

2000, Phys. Rev. B, 62, 8802, 10.1103/PhysRevB.62.8802

1991, Phys. Rev. B, 43, 14030, 10.1103/PhysRevB.43.14030

1931, Z. Phys., 70, 204, 10.1007/BF01339530

1996, J. Appl. Phys., 79, 3343, 10.1063/1.361236

1962, J. Appl. Phys., 35, 3309

1944, Proc. Natl. Acad. Sci. U.S.A., 30, 244, 10.1073/pnas.30.9.244

1994, Phys. Rev. B, 50, 10715, 10.1103/PhysRevB.50.10715

1975, Physical Properties of Crystals

1997, Phys. Rev. B, 56, R10024, 10.1103/PhysRevB.56.R10024

1999, Nitride Semiconductors and Devices

2001, Phys. Rev. B, 63, 224105, 10.1103/PhysRevB.65.224105

2002, Phys. Rev. B, 65, 092101, 10.1103/PhysRevB.65.092101

1967, J. Appl. Phys., 38, 2985, 10.1063/1.1710037

2002, Appl. Phys. Lett., 80, 956, 10.1063/1.1448175

2000, Appl. Phys. Lett., 77, 3373, 10.1063/1.1328047

1973, Bonds and Bands in Semiconductors

2001, Phonons in Nanostructures

1983, Phys. Status Solidi B, 119, 227, 10.1002/pssb.2221190126

2000, J. Appl. Phys., 88, 498, 10.1063/1.373685

2003, J. Appl. Phys., 93, 126, 10.1063/1.1526935

2000, J. Appl. Phys., 87, 2445, 10.1063/1.372199

Homan, 1984, High Pressure in Science and Technology, 277

2001, Phys. Rev. Lett., 86, 91, 10.1103/PhysRevLett.86.91

2000, Phys. Rev. B, 62, 16612, 10.1103/PhysRevB.62.16612

2002, Appl. Phys. Lett., 80, 1909, 10.1063/1.1461903

2003, Appl. Phys. Lett., 83, 1974, 10.1063/1.1609251

2000, Phys. Rev. Lett., 85, 1012, 10.1103/PhysRevLett.85.1012

2002, Appl. Phys. Lett., 81, 3807, 10.1063/1.1520703

2002, Phys. Rev. B, 66, 165205, 10.1103/PhysRevB.66.165205

2003, Physica B, 340–342, 195

2002, Phys. Rev. B, 66, 165205, 10.1103/PhysRevB.66.165205

2002, Appl. Phys. Lett., 81, 3807, 10.1063/1.1520703

2003, Physica B, 340–342, 221

2003, Phys. Rev. Lett., 90, 197402, 10.1103/PhysRevLett.90.197402

1993, Appl. Phys. Lett., 63, 2756, 10.1063/1.110325

1969, Phys. Status Solidi, 33, 257, 10.1002/pssb.19690330124

1995, Thin Solid Films, 260, 58, 10.1016/0040-6090(94)06459-8

2003, Physica B, 337, 292, 10.1016/S0921-4526(03)00418-6

1988, Thermal Conduction in Semiconductors

1986, Introduction to Solid State Physics, 6th ed., 150

2000, J. Appl. Phys., 88, 3295, 10.1063/1.1289072

2002, J. Appl. Phys., 91, 890, 10.1063/1.1426234

2002, J. Am. Ceram. Soc., 85, 1249, 10.1111/j.1151-2916.2002.tb00253.x

1997, J. Mater. Chem., 7, 85, 10.1039/a602506d

1996, J. Appl. Phys., 79, 1816, 10.1063/1.360976

2002, J. Appl. Phys., 92, 1391, 10.1063/1.1489091

1998, J. Mater. Chem., 8, 409, 10.1039/a706213c

2003, Mater. Sci. Eng., B, 104, 45, 10.1016/S0921-5107(03)00280-0

1986, J. Appl. Phys., 60, 607, 10.1063/1.337455

1991, J. Appl. Phys., 86, 6864, 10.1063/1.371764

1999, Phys. Rev. Lett., 82, 2552, 10.1103/PhysRevLett.82.2552

1998, Solid State Commun., 105, 399, 10.1016/S0038-1098(97)10145-4

2000, Mater. Res. Bull., 25, 15

2003, Appl. Phys. Lett., 82, 3901, 10.1063/1.1578694

2003, Jpn. J. Appl. Phys., Part 1, 42, 2241, 10.1143/JJAP.42.2241

2000, Phys. Status Solidi A, 180, 287, 10.1002/1521-396X(200007)180:1<287::AID-PSSA287>3.0.CO;2-7

2002, Jpn. J. Appl. Phys., Part 2, 41, L1203, 10.1143/JJAP.41.L1203

2004, J. Cryst. Growth, 265, 34, 10.1016/j.jcrysgro.2004.01.035

2003, J. Appl. Phys., 93, 7673, 10.1063/1.1558612

1980, J. Appl. Phys., 51, 3113, 10.1063/1.328100

1980, J. Appl. Phys., 51, 2464, 10.1063/1.328019

1994, Appl. Phys. Lett., 65, 2556, 10.1063/1.112634

1998, J. Appl. Phys., 83, 7844, 10.1063/1.367959

1980, Appl. Phys. Lett., 36, 318, 10.1063/1.91477

1981, J. Cryst. Growth, 54, 185, 10.1016/0022-0248(81)90459-0

1995, Appl. Phys. Lett., 16, 439, 10.1063/1.1653058

2000, J. Appl. Phys., 87, 3573, 10.1063/1.372383

2000, J. Vac. Sci. Technol. A, 18, 2864, 10.1116/1.1318192

1999, J. Cryst. Growth, 201–202, 627

1998, J. Appl. Phys., 84, 3912, 10.1063/1.368595

1998, Appl. Phys. Lett., 73, 348, 10.1063/1.121830

2000, J. Electron. Mater., 29, 69, 10.1007/s11664-000-0097-1

1983, Jpn. J. Appl. Phys., Part 1, 22, 794, 10.1143/JJAP.22.794

1999, Jpn. J. Appl. Phys., Part 2, 38, L454, 10.1143/JJAP.38.L454

1997, Appl. Phys. Lett., 70, 2230, 10.1063/1.118824

1998, Appl. Phys. Lett., 72, 3270, 10.1063/1.121620

1998, J. Appl. Phys., 84, 2597, 10.1063/1.368440

2000, J. Cryst. Growth, 208, 389, 10.1016/S0022-0248(99)00510-2

1980, J. Vac. Sci. Technol., 17, 808, 10.1116/1.570565

1994, J. Cryst. Growth, 137, 319, 10.1016/0022-0248(94)90968-7

2003, J. Cryst. Growth, 254, 449, 10.1016/S0022-0248(03)01205-3

1999, Appl. Phys. Lett., 75, 2635, 10.1063/1.125102

2000, J. Cryst. Growth, 214/215, 72, 10.1016/S0022-0248(00)00065-8

2001, J. Cryst. Growth, 229, 98, 10.1016/S0022-0248(01)01126-5

1999, J. Cryst. Growth, 203, 186, 10.1016/S0022-0248(99)00076-7

1990, J. Cryst. Growth, 102, 137, 10.1016/0022-0248(90)90894-Q

1999, III-Vs Review, 28

1999, MRS Internet J. Nitride Semicond. Res., 4S1, G3

1992, J. Electron. Mater., 21, 157, 10.1007/BF02655831

1995, Thin Solid Films, 266, 106, 10.1016/0040-6090(95)06657-8

1996, J. Electron. Mater., 25, 855, 10.1007/BF02666649

1997, J. Cryst. Growth, 181, 165, 10.1016/S0022-0248(97)00286-8

2000, Appl. Phys. Lett., 76, 559, 10.1063/1.125817

2000, J. Cryst. Growth, 200, 532

2000, Jpn. J. Appl. Phys., Part 2, 39, L534, 10.1143/JJAP.39.L534

1998, Jpn. J. Appl. Phys., Part 1, 37, 5220, 10.1143/JJAP.37.5220

2000, J. Cryst. Growth, 209, 522, 10.1016/S0022-0248(99)00610-7

2003, Jpn. J. Appl. Phys., Part 2, 42, L1002, 10.1143/JJAP.42.L1002

1974, Surf. Sci., 41, 403, 10.1016/S0039-6028(98)00601-3

1977, Phys. Thin Films, 9, 1

2002, Appl. Surf. Sci., 195, 126, 10.1016/S0169-4332(02)00547-0

2001, Mater. Chem. Phys., 72, 269, 10.1016/S0254-0584(01)00450-3

2003, Appl. Phys. Lett., 82, 2625, 10.1063/1.1568543

2003, J. Cryst. Growth, 254, 86, 10.1016/S0022-0248(03)01144-8

2002, Mater. Lett., 55, 67, 10.1016/S0167-577X(01)00621-8

2003, Mater. Lett., 57, 4655, 10.1016/S0167-577X(03)00379-3

1995, Physica C, 254, 167, 10.1016/0921-4534(95)00538-2

1981, Jpn. J. Appl. Phys., Part 1, 519

1999, J. Vac. Sci. Technol. A, 17, 3003, 10.1116/1.581973

1982, J. Vac. Sci. Technol., 20, 162, 10.1116/1.571350

1992, J. Appl. Phys., 71, 4333, 10.1063/1.350815

2000, J. Appl. Phys., 88, 2443, 10.1063/1.1288162

2002, Jpn. J. Appl. Phys., Part 1, 41, 5614, 10.1143/JJAP.41.5614

2002, J. Appl. Phys., 92, 154, 10.1063/1.1483371

2000, Mater. Sci. Eng., B, 75, 190, 10.1016/S0921-5107(00)00372-X

2003, Appl. Phys. Lett., 83, 63, 10.1063/1.1591064

2001, Physica B, 308–310, 1197

1998, Jpn. J. Appl. Phys., Part 1, 37, 2923, 10.1143/JJAP.37.2923

2002, J. Cryst. Growth, 237–239, 523

1998, Jpn. J. Appl. Phys., Part 1, 37, 781, 10.1143/JJAP.37.781

1997, Jpn. J. Appl. Phys., Part 2, 36, L933, 10.1143/JJAP.36.L933

2000, J. Cryst. Growth, 209, 532, 10.1016/S0022-0248(99)00614-4

1999, Jpn. J. Appl. Phys., Part 1, 38, 2606, 10.1143/JJAP.38.2606

2004, J. Cryst. Growth, 269, 356, 10.1016/j.jcrysgro.2004.04.120

2001, Jpn. J. Appl. Phys., Part 1, 40, 250, 10.1143/JJAP.40.250

2003, J. Appl. Phys., 93, 1961, 10.1063/1.1535256

2000, Appl. Phys. Lett., 77, 1801, 10.1063/1.1311603

2001, J. Cryst. Growth, 227–228, 911

2000, J. Cryst. Growth, 214/215, 92, 10.1016/S0022-0248(00)00073-7

2003, Jpn. J. Appl. Phys., Part 2, 42, L1050, 10.1143/JJAP.42.L1050

2002, Jpn. J. Appl. Phys., Part 2, 41, L1043, 10.1143/JJAP.41.L1043

2003, Jpn. J. Appl. Phys., Part 2, 42, L99, 10.1143/JJAP.42.L99

2001, J. Cryst. Growth, 227–228, 923

2003, J. Cryst. Growth, 251, 623, 10.1016/S0022-0248(02)02277-7

2000, J. Cryst. Growth, 214/215, 87, 10.1016/S0022-0248(00)00072-5

2001, J. Cryst. Growth, 227–228, 917

2002, Jpn. J. Appl. Phys., Part 2, 41, L1203, 10.1143/JJAP.41.L1203

1998, Appl. Phys. Lett., 72, 2466, 10.1063/1.121384

2003, Jpn. J. Appl. Phys., Part 1, 42, 2241, 10.1143/JJAP.42.2241

1998, Appl. Phys. Lett., 72, 824, 10.1063/1.120905

2002, Appl. Surf. Sci., 190, 491, 10.1016/S0169-4332(01)00924-2

1999, Surf. Sci., 443, L1043, 10.1016/S0039-6028(99)01024-9

2002, Phys. Rev. B, 65, 115331, 10.1103/PhysRevB.65.115331

2000, J. Cryst. Growth, 209, 816, 10.1016/S0022-0248(99)00726-5

2000, J. Cryst. Growth, 214/215, 81, 10.1016/S0022-0248(00)00070-1

2002, Thin Solid Films, 409, 153, 10.1016/S0040-6090(02)00119-0

2000, Appl. Surf. Sci., 159–160, 441

2000, J. Cryst. Growth, 209, 537, 10.1016/S0022-0248(99)00615-6

2003, Jpn. J. Appl. Phys., Part 1, 42, 67, 10.1143/JJAP.42.67

2003, Jpn. J. Appl. Phys., Part 1, 42, 7209, 10.1143/JJAP.42.7209

1999, J. Appl. Phys., 86, 1149, 10.1063/1.370857

2005, Nat. Mater., 4, 42, 10.1038/nmat1284

2004, J. Appl. Phys., 96, 3228, 10.1063/1.1772891

2003, Appl. Phys. Lett., 82, 3490, 10.1063/1.1578183

1983, J. Vac. Sci. Technol. A, 1, 1806, 10.1116/1.572219

1983, Surf. Sci., 133, 101, 10.1016/0039-6028(83)90486-7

1999, Appl. Phys. Lett., 75, 3947, 10.1063/1.125503

2001, J. Appl. Phys., 90, 5661, 10.1063/1.1415544

2002, Thin Solid Films, 422, 176, 10.1016/S0040-6090(02)00965-3

1994, Appl. Phys. Lett., 65, 2963, 10.1063/1.112478

1987, Izv. Akad. Nauk SSSR, Neorg. Mater., 11, 1928

1979, Solid State Phys., 12, 1431

1999, J. Cryst. Growth, 198–199, 1222

2002, Semiconductors, 36, 1052

1999, J. Tech. Phys., 69, 138

2002, Thin Solid Films, 409, 116, 10.1016/S0040-6090(02)00113-X

2002, Chem. Mater., 14, 3622, 10.1021/cm0203520

1980, J. Electrochem. Soc., 127, 1843, 10.1149/1.2130012

1983, Appl. Phys. Lett., 43, 1108, 10.1063/1.94243

1999, J. Appl. Phys., 85, 2595, 10.1063/1.369577

2002, Phys. Status Solidi B, 229, 921, 10.1002/1521-3951(200201)229:2<921::AID-PSSB921>3.0.CO;2-N

2004, Phys. Status Solidi B, 241, 676, 10.1002/pssb.200304209

2002, Phys. Status Solidi B, 229, 841, 10.1002/1521-3951(200201)229:2<841::AID-PSSB841>3.0.CO;2-J

2002, Phys. Status Solidi A, 192, 166, 10.1002/1521-396X(200207)192:1<166::AID-PSSA166>3.0.CO;2-G

2002, Phys. Status Solidi A, 192, 189, 10.1002/1521-396X(200207)192:1<189::AID-PSSA189>3.0.CO;2-X

2003, J. Cryst. Growth, 248, 14, 10.1016/S0022-0248(02)01879-1

1988, Cryst. Res. Technol., 23, 635, 10.1002/crat.2170230511

1998, Semicond. Sci. Technol., 13, 788, 10.1088/0268-1242/13/7/022

2002, Phys. Status Solidi B, 229, 903, 10.1002/1521-3951(200201)229:2<903::AID-PSSB903>3.0.CO;2-N

2003, J. Cryst. Growth, 248, 20, 10.1016/S0022-0248(02)01866-3

2001, J. Electron. Mater., 30, 659, 10.1007/BF02665851

2002, J. Cryst. Growth, 237, 553

2003, J. Cryst. Growth, 248, 25, 10.1016/S0022-0248(02)01843-2

2004, J. Cryst. Growth, 267, 140, 10.1016/j.jcrysgro.2004.03.028

2002, Phys. Status Solidi B, 229, 915, 10.1002/1521-3951(200201)229:2<915::AID-PSSB915>3.0.CO;2-B

1999, J. Appl. Phys., 85, 2595, 10.1063/1.369577

2001, J. Mater. Res., 16, 1358, 10.1557/JMR.2001.0190

2001, Appl. Phys. Lett., 79, 2022, 10.1063/1.1405811

2003, Jpn. J. Appl. Phys., Part 1, 42, 2291, 10.1143/JJAP.42.2291

2003, Jpn. J. Appl. Phys., Part 2, 42, L264, 10.1143/JJAP.42.L264

2003, J. Cryst. Growth, 255, 303, 10.1016/S0022-0248(03)01244-2

2004, J. Appl. Phys., 95, 6268, 10.1063/1.1713040

2003, J. Cryst. Growth, 257, 255, 10.1016/S0022-0248(03)01469-6

2004, J. Electron. Mater., 33, 826, 10.1007/s11664-004-0249-9

2004, J. Cryst. Growth, 265, 390, 10.1016/j.jcrysgro.2004.02.096

2003, J. Cryst. Growth, 248, 25, 10.1016/S0022-0248(02)01843-2

2003, IEEE Trans. Nanotechnol., 2, 50, 10.1109/TNANO.2003.809120

2004, J. Electron. Mater., 33, 654, 10.1007/s11664-004-0062-5

2002, Appl. Phys. Lett., 80, 4232, 10.1063/1.1482800

2004, J. Cryst. Growth, 268, 149, 10.1016/j.jcrysgro.2004.05.019

2004, Acta Mater., 52, 3949, 10.1016/j.actamat.2004.05.010

2004, J. Cryst. Growth, 263, 119, 10.1016/j.jcrysgro.2003.11.084

2004, Nanotechnology, 15, 1043, 10.1088/0957-4484/15/8/032

2004, J. Phys. Chem. B, 108, 15457, 10.1021/jp046559t

2004, Appl. Phys. Lett., 85, 5052, 10.1063/1.1821648

1995, Solid State Commun., 94, 251, 10.1016/0038-1098(95)00054-2

1999, Phys. Rev. B, 60, 2340, 10.1103/PhysRevB.60.2340

2002, Phys. Rev. B, 65, 075207, 10.1103/PhysRevB.65.075207

2001, Physica B, 308–310, 945

2001, Physica B, 308–310, 985

2002, Phys. Rev. B, 65, 075207, 10.1103/PhysRevB.65.075207

1959, Phys. Rev. Lett., 2, 157, 10.1103/PhysRevLett.2.157

2001, Appl. Phys. Lett., 79, 3794, 10.1063/1.1412435

1999, J. Appl. Phys., 85, 1884

2004, Phys. Rev. B, 70, 195207, 10.1103/PhysRevB.70.195207

2003, J. Appl. Phys., 93, 756, 10.1063/1.1527707

2002, Appl. Phys. Lett., 80, 2860, 10.1063/1.1471374

1999, J. Lumin., 82, 173, 10.1016/S0022-2313(99)00020-4

1978, Phys. Status Solidi B, 85, 271, 10.1002/pssb.2220850130

1999, J. Appl. Phys., 85, 7884, 10.1063/1.370601

2000, Appl. Phys. Lett., 77, 975, 10.1063/1.1289066

1998, Phys. Rev. B, 57, 12151, 10.1103/PhysRevB.57.12151

2002, J. Lumin., 99, 149, 10.1016/S0022-2313(02)00331-9

2003, J. Appl. Phys., 93, 3214, 10.1063/1.1545157

2003, Opt. Mater. (Amsterdam, Neth.), 23, 33, 10.1016/S0925-3467(03)00055-7

2001, Appl. Phys. Lett., 79, 3794, 10.1063/1.1412435

1960, J. Phys. Chem. Solids, 12, 276, 10.1016/0022-3697(60)90049-4

1967, J. Lumin., 12, 109, 10.1016/0022-2313(76)90070-3

1977, Phys. Rev. Lett., 39, 654, 10.1103/PhysRevLett.39.654

Rosler, 1999, Numerical Data and Functional Relationship in Science and Technology

1984, J. Phys. C, 17, 6435, 10.1088/0022-3719/17/35/014

1983, Phys. Rev. B, 28, 946, 10.1103/PhysRevB.28.946

1960, Phys. Rev. Lett., 4, 361, 10.1103/PhysRevLett.4.361

1967, Physica (Amsterdam), 34, 149, 10.1016/0031-8914(67)90062-6

2003, J. Appl. Phys., 94, 973, 10.1063/1.1586977

1998, J. Appl. Phys., 84, 3848, 10.1063/1.368564

2000, J. Appl. Phys., 88, 2152, 10.1063/1.1305546

1983, Phys. Rev. B, 28, 946, 10.1103/PhysRevB.28.946

2003, Appl. Phys. Lett., 82, 532, 10.1063/1.1540220

2002, Appl. Phys. Lett., 80, 1924, 10.1063/1.1461051

1979, Appl. Phys., 18, 123, 10.1007/BF00934406

1997, J. Phys. Chem. Solids, 58, 853, 10.1016/S0022-3697(96)00224-7

1997, Jpn. J. Appl. Phys., Part 1, 36, 6237, 10.1143/JJAP.36.6237

1998, Phys. Rev. B, 58, 3586, 10.1103/PhysRevB.58.3586

2000, Appl. Phys. Lett., 76, 979, 10.1063/1.125912

2003, Appl. Phys. Lett., 82, 2260, 10.1063/1.1565185

2003, Appl. Phys. Lett., 83, 63, 10.1063/1.1591064

1999, Phys. Rev. B, 60, 2340, 10.1103/PhysRevB.60.2340

1975, Phys. Status Solidi B, 71, 547, 10.1002/pssb.2220710216

2004, Appl. Phys. Lett., 84, 3223, 10.1063/1.1713034

2001, Appl. Phys. Lett., 78, 1469, 10.1063/1.1355665

1998, Appl. Phys. Lett., 73, 1038, 10.1063/1.122077

1998, J. Cryst. Growth, 184–185, 605

1999, Appl. Phys. Lett., 75, 469, 10.1063/1.124411

1998, J. Cryst. Growth, 184–185, 601

1998, Mater. Sci. Eng., B, 56, 239, 10.1016/S0921-5107(98)00248-7

1997, Solid State Commun., 103, 459, 10.1016/S0038-1098(97)00216-0

1998, Mater. Sci. Eng., B, 54, 24, 10.1016/S0921-5107(98)00120-2

1994, Nature (London), 368, 436, 10.1038/368436a0

1995, Phys. Rev. Lett., 75, 1739, 10.1103/PhysRevLett.75.1739

1998, Appl. Phys. Lett., 73, 3656, 10.1063/1.122853

1999, Phys. Rev. Lett., 82, 2278, 10.1103/PhysRevLett.82.2278

2001, J. Appl. Phys., 89, 2025, 10.1063/1.1342803

1996, Phys. Rev. E, 54, 4256, 10.1103/PhysRevE.54.4256

1958, Phys. Rev., 109, 1492, 10.1103/PhysRev.109.1492

1984, Zinc Oxides: Production and Optical Properties

1974, Moscow Energetical Institute Transactions (Trudy MEI), 78

1999, Appl. Phys. Lett., 75, 2761, 10.1063/1.125141

2002, J. Cryst. Growth, 240, 467, 10.1016/S0022-0248(02)00925-9

2003, J. Appl. Phys., 94, 354, 10.1063/1.1577819

2005, Thin Solid Films, 473, 241, 10.1016/j.tsf.2004.07.068

2000, Appl. Phys. Lett., 77, 2204, 10.1063/1.1315340

2000, Appl. Phys. Lett., 77, 4250, 10.1063/1.1333687

2003, Appl. Phys. Lett., 82, 2290, 10.1063/1.1566482

2003, Appl. Phys. Lett., 82, 532, 10.1063/1.1540220

2000, Phys. Rev. B, 61, 15019, 10.1103/PhysRevB.61.15019

2001, Physica B, 308–310, 899

1996, Appl. Phys. Lett., 69, 503, 10.1063/1.117767

1983, Phys. Rev. B, 28, 946, 10.1103/PhysRevB.28.946

2001, Phys. Rev. Lett., 86, 5723, 10.1103/PhysRevLett.86.5723

2001, Physica B, 308–310, 945

2002, Appl. Phys. Lett., 81, 1830, 10.1063/1.1504875

2003, Appl. Phys. Lett., 83, 287, 10.1063/1.1592621

2003, J. Electrochem. Soc., 150, G508, 10.1149/1.1594732

2002, Phys. Status Solidi B, 234, R7, 10.1002/1521-3951(200212)234:3<R7::AID-PSSB99997>3.0.CO;2-D

2002, Phys. Status Solidi B, 229, 881, 10.1002/1521-3951(200201)229:2<881::AID-PSSB881>3.0.CO;2-3

2003, Appl. Phys. Lett., 83, 87, 10.1063/1.1590423

1969, Phys. Rev. Lett., 23, 579, 10.1103/PhysRevLett.23.579

1963, Phys. Rev., 132, 1559, 10.1103/PhysRev.132.1559

1973, Solid State Commun., 13, 1283, 10.1016/0038-1098(73)90580-2

1991, Phys. Rev. B, 43, 9938, 10.1103/PhysRevB.43.9938

1978, Solid-State Electron., 21, 1597, 10.1016/0038-1101(78)90247-2

1998, J. Phys.: Condens. Matter, 10, 2007, 10.1088/0953-8984/10/9/007

1998, Phys. Rev. B, 57, 9690, 10.1103/PhysRevB.57.9690

1981, J. Phys. C, 14, 2847, 10.1088/0022-3719/14/20/021

1997, J. Phys.: Condens. Matter, 9, 5355

1981, J. Lumin., 26, 203, 10.1016/0022-2313(81)90182-4

1998, Solid State Commun., 106, 701, 10.1016/S0038-1098(98)00048-9

2001, J. Appl. Phys., 89, 6189, 10.1063/1.1356432

2002, Appl. Phys. Lett., 81, 622, 10.1063/1.1494125

2004, Semiconductors, 38, 34

2001, Physica B, 308–310, 908

2003, J. Cryst. Growth, 252, 275, 10.1016/S0022-0248(03)00898-4

2003, Appl. Phys. Lett., 82, 2290, 10.1063/1.1566482

1996, J. Cryst. Growth, 161, 190, 10.1016/0022-0248(95)00634-6

2003, J. Lumin., 102–103, 733

2001, Appl. Phys. Lett., 79, 943, 10.1063/1.1394173

1996, Appl. Phys. Lett., 68, 403, 10.1063/1.116699

1996, J. Appl. Phys., 79, 7983, 10.1063/1.362349

1997, J. Lumin., 75, 11, 10.1016/S0022-2313(96)00096-8

1998, J. Appl. Phys., 84, 2287, 10.1063/1.368295

2001, Phys. Status Solidi B, 226, R4, 10.1002/1521-3951(200107)226:1<R4::AID-PSSB99994>3.0.CO;2-F

2003, Physica B, 340–342, 201

2001, Phys. Rev. B, 64, 115205, 10.1103/PhysRevB.64.115205

1978, Solid State Commun., 25, 77, 10.1016/0038-1098(78)90361-7

1989, Phys. Rev. Lett., 62, 1800, 10.1103/PhysRevLett.62.1800

1994, Phys. Rev. Lett., 72, 534, 10.1103/PhysRevLett.72.534

2000, Phys. Rev. Lett., 84, 1232, 10.1103/PhysRevLett.84.1232

1985, Jpn. J. Appl. Phys., Part 2, 24, L781, 10.1143/JJAP.24.L781

1998, J. Appl. Phys., 83, 3192, 10.1063/1.367120

1993, Appl. Phys. Lett., 63, 1375, 10.1063/1.109681

2001, Phys. Rev. Lett., 86, 2601, 10.1103/PhysRevLett.86.2601

2004, Appl. Phys. Lett., 84, 2545, 10.1063/1.1695440

2002, J. Cryst. Growth, 237–239, 538

1997, Jpn. J. Appl. Phys., Part 2, 36, L1078, 10.1143/JJAP.36.L1078

1995, Thin Solid Films, 260, 19, 10.1016/0040-6090(94)09485-3

2003, Thin Solid Films, 427, 401, 10.1016/S0040-6090(02)01184-7

2003, J. Cryst. Growth, 259, 130, 10.1016/j.jcrysgro.2003.07.007

2001, Mater. Res. Soc. Symp. Proc., 666, F

2000, Appl. Phys. Lett., 77, 3761, 10.1063/1.1331089

1984, Jpn. J. Appl. Phys., Part 2, 23, L280, 10.1143/JJAP.23.L280

1994, Phys. Rev. B, 50, 5221, 10.1103/PhysRevB.50.5221

1993, Phys. Rev. B, 47, 9425, 10.1103/PhysRevB.47.9425

1968, J. Phys. Chem. Solids, 29, 1407, 10.1016/0022-3697(68)90193-5

1991, J. Vac. Sci. Technol. A, 9, 286, 10.1116/1.577502

1991, Jpn. J. Appl. Phys., Part 1, 30, 703, 10.1143/JJAP.30.703

1991, Jpn. J. Appl. Phys., Part 1, 30, 2021, 10.1143/JJAP.30.2021

2002, Phys. Rev. B, 66, 073202, 10.1103/PhysRevB.66.073202

1993, Phys. Rev. B, 47, 9425, 10.1103/PhysRevB.47.9425

1991, Phys. Rev. Lett., 66, 648, 10.1103/PhysRevLett.66.648

1995, Phys. Rev. Lett., 74, 1131, 10.1103/PhysRevLett.74.1131

1982, Phys. Scr., T, T1, 5, 10.1088/0031-8949/1982/T1/001

1979, J. Phys. C, 12, 4409, 10.1088/0022-3719/12/21/009

2004, Phys. Status Solidi A, 195, 171, 10.1002/pssa.200306274

1983, Phys. Rev. B, 28, 946, 10.1103/PhysRevB.28.946

1982, Appl. Phys. Lett., 40, 345, 10.1063/1.93093

1994, J. Appl. Phys., 76, 1363, 10.1063/1.358463

2001, Phys. Rev. B, 85120

1990, Appl. Phys. Lett., 57, 2127, 10.1063/1.103919

2000, Appl. Phys. Lett., 76, 1695, 10.1063/1.126139

1997, Appl. Phys. Lett., 70, 1143, 10.1063/1.118481

2000, J. Cryst. Growth, 209, 526, 10.1016/S0022-0248(99)00613-2

2002, Jpn. J. Appl. Phys., Part 2, 41, L1281, 10.1143/JJAP.41.L1281

1997, Jpn. J. Appl. Phys., Part 2, 36, L1453, 10.1143/JJAP.36.L1453

2003, J. Cryst. Growth, 253, 258, 10.1016/S0022-0248(03)01007-8

2003, J. Cryst. Growth, 255, 293, 10.1016/S0022-0248(03)01241-7

2003, Mater. Lett., 57, 3311, 10.1016/S0167-577X(03)00054-5

1996, Thin Solid Films, 281–282, 445

2002, J. Cryst. Growth, 237–239, 544

2001, Phys. Rev. Lett., 86, 5723, 10.1103/PhysRevLett.86.5723

2001, J. Cryst. Growth, 226, 123, 10.1016/S0022-0248(01)01367-7

2003, J. Vac. Sci. Technol. A, 21, 1342, 10.1116/1.1584036

2003, Electrochem. Solid-State Lett., 6, C56, 10.1149/1.1554292

2004, J. Vac. Sci. Technol. B, 22, 94, 10.1116/1.1641057

2004, Appl. Phys. Lett., 84, 5040, 10.1063/1.1763640

2003, J. Cryst. Growth, 259, 279, 10.1016/j.jcrysgro.2003.07.002

2002, Appl. Phys. Lett., 80, 1334, 10.1063/1.1450041

2003, J. Appl. Phys., 94, 519, 10.1063/1.1580193

2003, Mater. Sci. Semicond. Process., 5, 491

2000, J. Cryst. Growth, 209, 526, 10.1016/S0022-0248(99)00613-2

2004, Phys. Status Solidi C, 1, 731, 10.1002/pssc.200304255

2004, J. Cryst. Growth, 260, 1, 10.1016/j.jcrysgro.2003.08.002

2000, J. Cryst. Growth, 214/215, 552, 10.1016/S0022-0248(00)00150-0

1999, Jpn. J. Appl. Phys., Part 2, 38, L166, 10.1143/JJAP.38.L166

2002, Thin Solid Films, 420–421, 100

2002, Appl. Phys. Lett., 81, 235, 10.1063/1.1491294

2001, Appl. Phys. Lett., 79, 4139, 10.1063/1.1424066

2002, J. Cryst. Growth, 237–239, 503

2003, Thin Solid Films, 435, 49, 10.1016/S0040-6090(03)00383-3

2004, Appl. Surf. Sci., 223, 206, 10.1016/S0169-4332(03)00923-1

2004, Solid-State Electron., 48, 2343, 10.1016/j.sse.2004.05.063

2003, Thin Solid Films, 435, 49, 10.1016/S0040-6090(03)00383-3

1999, Jpn. J. Appl. Phys., Part 2, 38, L1205, 10.1143/JJAP.38.L1205

2003, J. Appl. Phys., 93, 396, 10.1063/1.1527210

2004, Appl. Phys. Lett., 84, 541, 10.1063/1.1644331

2004, J. Cryst. Growth, 265, 127, 10.1016/j.jcrysgro.2003.12.059

2000, Appl. Phys. Lett., 76, 3257, 10.1063/1.126599

2003, Appl. Phys. Lett., 83, 63, 10.1063/1.1591064

2000, J. Cryst. Growth, 216, 330, 10.1016/S0022-0248(00)00437-1

2002, J. Appl. Phys., 92, 158

2002, Phys. Status Solidi B, 229, 881, 10.1002/1521-3951(200201)229:2<881::AID-PSSB881>3.0.CO;2-3

2003, Appl. Phys. Lett., 83, 1128, 10.1063/1.1594835

2005, Thin Solid Films, 473, 31, 10.1016/j.tsf.2004.06.194

2004, Appl. Phys. Lett., 84, 3474, 10.1063/1.1737795

2005, Appl. Phys. Lett., 86, 012105, 10.1063/1.1844037

2004, Appl. Phys. Lett., 85, 1169, 10.1063/1.1783015

1991, Quantum Semiconductor Structures

1988, J. Appl. Phys., 64, R29, 10.1063/1.341700

1998, Science, 282, 1660, 10.1126/science.282.5394.1660

Ismail, 1998, Quantum Circuits and Devices, 136

1998, Science, 281, 951, 10.1126/science.281.5379.951

1999, Phys. Rev. Lett., 83, 3073, 10.1103/PhysRevLett.83.3073

2001, Nature (London), 411, 770, 10.1038/35081014

2001, Appl. Phys. Lett., 79, 988, 10.1063/1.1384478

2001, Solid State Commun., 120, 439, 10.1016/S0038-1098(01)00400-8

2003, J. Appl. Phys., 93, 7676, 10.1063/1.1556115

2003, Nat. Mater., 2, 673, 10.1038/nmat984

2004, Appl. Phys. Lett., 84, 5255, 10.1063/1.1764936

2004, Appl. Phys. Lett., 85, 621, 10.1063/1.1775877

2001, Appl. Phys. Lett., 79, 3473, 10.1063/1.1419231

1997, Phys. Rev. B, 55, 6938, 10.1103/PhysRevB.55.6938

2001, J. Appl. Phys., 89, 7284, 10.1063/1.1356035

2001, Appl. Phys. Lett., 78, 3824, 10.1063/1.1377856

1999, Appl. Phys. Lett., 75, 3366, 10.1063/1.125353

2001, Appl. Phys. Lett., 78, 958, 10.1063/1.1348323

2002, Appl. Phys. Lett., 80, 4561, 10.1063/1.1487927

2003, Appl. Phys. Lett., 82, 239, 10.1063/1.1537457

2004, Solid State Commun., 129, 175, 10.1016/j.ssc.2003.09.035

2003, Appl. Phys. Lett., 83, 5488, 10.1063/1.1637719

2001, Physica C, 10, 260, 10.1016/S1386-9477(01)00095-9

2001, Phys. Rev. Lett., 87, 107203, 10.1103/PhysRevLett.87.107203

2001, Phys. Rev. Lett., 88, 247201, 10.1103/PhysRevLett.88.247201

2002, Phys. Rev. B, 66, 033203, 10.1103/PhysRevB.66.033203

2003, Phys. Rev. B, 67, 155201, 10.1103/PhysRevB.67.155201

1985, Phys. Rev. B, 31, 6579, 10.1103/PhysRevB.31.6579

1986, Phys. Rev. Lett., 56, 508, 10.1103/PhysRevLett.56.508

2005, Nat. Mater., 4, 73

1982, Phys. Rev. Lett., 48, 355, 10.1103/PhysRevLett.48.355

1950, Phys. Rev., 81, 440, 10.1103/PhysRev.81.440

1950, Phys. Rev., 83, 299, 10.1103/PhysRev.83.299

2003, Nat. Mater., 2, 646, 10.1038/nmat989

2000, Jpn. J. Appl. Phys., Part 2, 39, L555, 10.1143/JJAP.39.L555

2001, Physica B, 308–310, 904

2002, Semicond. Sci. Technol., 17, 367, 10.1088/0268-1242/17/4/309

2000, Physica B, 281–282, 468

2001, Phys. Rev. B, 64, 165201, 10.1103/PhysRevB.64.165201

2000, Phys. Rev. Lett., 84, 5628, 10.1103/PhysRevLett.84.5628

1999, Phys. Rev. B, 59, 9818, 10.1103/PhysRevB.59.9818

2004, Appl. Phys. Lett., 84, 4170, 10.1063/1.1755834

2003, J. Appl. Phys., 93, 7879, 10.1063/1.1556126

2000, J. Cryst. Growth, 214, 68, 10.1016/S0022-0248(00)00062-2

2002, J. Appl. Phys., 92, 6066, 10.1063/1.1513890

2003, J. Appl. Phys., 93, 1, 10.1063/1.1517164

2000, J. Magn. Magn. Mater., 213, 321, 10.1016/S0304-8853(00)00008-1

2002, Solid State Commun., 121, 371, 10.1016/S0038-1098(01)00464-1

2003, J. Appl. Phys., 93, 7876, 10.1063/1.1556125

1998, Appl. Phys. Lett., 72, 2466, 10.1063/1.121384

1999, Appl. Phys. Lett., 75, 4088, 10.1063/1.125545

2002, Appl. Phys. Lett., 80, 1529, 10.1063/1.1456266

2004, Appl. Phys. Lett., 84, 5359, 10.1063/1.1767273

2003, J. Cryst. Growth, 251, 623, 10.1016/S0022-0248(02)02277-7

2000, Thin Solid Films, 372, 173, 10.1016/S0040-6090(00)01009-9

2002, Solid-State Electron., 46, 1633, 10.1016/S0038-1101(02)00117-X

2004, Physica E (Amsterdam), 21, 671, 10.1016/j.physe.2003.11.110

2004, J. Appl. Phys., 95, 4772, 10.1063/1.1690091

2004, J. Appl. Phys., 96, 459, 10.1063/1.1760239

2000, Appl. Phys. Lett., 77, 2204, 10.1063/1.1315340

1999, Appl. Phys. Lett., 75, 980, 10.1063/1.124573

2002, J. Appl. Phys., 91, 1993, 10.1063/1.1445280

2001, Appl. Phys. Lett., 78, 1237, 10.1063/1.1350632

2000, Appl. Phys. Lett., 77, 1632, 10.1063/1.1308540

2004, Phys. Status Solidi A, 201, 2929

2002, J. Cryst. Growth, 237–239, 514

2003, Appl. Phys. Lett., 83, 3290, 10.1063/1.1620674

2002, J. Cryst. Growth, 237–239, 514

2000, Thin Solid Films, 361–362, 53

1996, Thin Solid Films, 289, 153, 10.1016/S0040-6090(96)08923-7

1970, Phys. Rev. B, 1, 3351, 10.1103/PhysRevB.1.3351

1965, J. Am. Ceram. Soc., 48, 412

1976, Phys. Rev. B, 13, 4470, 10.1103/PhysRevB.13.4470

1994, Appl. Phys. Lett., 64, 1003, 10.1063/1.111961

1994, Phys. Scr., T, T57, 122

2002, Thin Solid Films, 420–421, 478

1996, J. Vac. Sci. Technol. B, 14, 1812, 10.1116/1.588561

2002, J. Electron. Mater., 31, 811, 10.1007/s11664-002-0242-0

2000, Appl. Phys. Lett., 77, 1647, 10.1063/1.1308527

2001, J. Electrochem. Soc., 148, G114, 10.1149/1.1346617

2000, Appl. Phys. Lett., 77, 3986, 10.1063/1.1332827

2003, J. Appl. Phys., 94, 4225, 10.1063/1.1604475

2000, J. Vac. Sci. Technol. B, 18, 1406, 10.1116/1.591479

2001, Appl. Phys. Lett., 78, 3842, 10.1063/1.1379061

1982, Solid-State Electron., 25, 91, 10.1016/0038-1101(82)90036-3

2002, Jpn. J. Appl. Phys., Part 2, 41, L546, 10.1143/JJAP.41.L546

2002, Solid-State Electron., 46, 1665, 10.1016/S0038-1101(02)00176-4

1978, J. Vac. Sci. Technol., 15, 1378, 10.1116/1.569792

2003, J. Vac. Sci. Technol. B, 21, 2378, 10.1116/1.1621651

2004, Appl. Phys. Lett., 84, 544, 10.1063/1.1644318

2004, J. Vac. Sci. Technol. B, 22, 171, 10.1116/1.1641060

2001, J. Cryst. Growth, 225, 110, 10.1016/S0022-0248(01)00830-2

2002, Appl. Phys. Lett., 80, 2132, 10.1063/1.1463700

1988, J. Appl. Phys., 63, 1781, 10.1063/1.339919

2002, Appl. Phys. Lett., 80, 1195, 10.1063/1.1449528

2003, Appl. Phys. Lett., 82, 400, 10.1063/1.1536264

2002, J. Mater. Res., 17, 1529, 10.1557/JMR.2002.0227

2001, Appl. Phys. Lett., 79, 3074, 10.1063/1.1415050

2004, Appl. Phys. Lett., 84, 1904, 10.1063/1.1669082

2005, J. Electrochem. Soc., 152, G179, 10.1149/1.1855832

2003, Appl. Phys. Lett., 83, 1575, 10.1063/1.1604173

1965, Phys. Lett., 18, 218, 10.1016/0031-9163(65)90295-7

1970, J. Appl. Phys., 41, 3795, 10.1063/1.1659509

2001, Semiconductors, 35, 464, 10.1134/1.1365196

2005, Appl. Phys. Lett., 86, 112101, 10.1063/1.1862772

2004, Appl. Phys. Lett., 84, 5133, 10.1063/1.1764940

2004, Appl. Surf. Sci., 236, 387, 10.1016/j.apsusc.2004.05.013

2004, Appl. Phys. Lett., 84, 2835, 10.1063/1.1705726

1981, Physics of Semiconductor Devices

2002, Proc. SPIE, 256, 4644

2003, Appl. Phys. Lett., 83, 2946, 10.1063/1.1616663

2003, Semiconductors, 37, 1329

2003, Appl. Phys. Lett., 83, 2943, 10.1063/1.1615308

2003, Appl. Phys. Lett., 83, 4713, 10.1063/1.1632029

2003, Appl. Phys. Lett., 83, 4719, 10.1063/1.1632537

2000, Appl. Phys. Lett., 77, 475, 10.1063/1.127015

1999, Appl. Phys. Lett., 75, 2851, 10.1063/1.125171

2003, Appl. Phys. Lett., 83, 1029, 10.1063/1.1598624

1975, Semicond. Semimetals, 6, 1183

1968, 624

2004, Phys. Status Solidi C, 1, 1067, 10.1002/pssc.200304245

1980, J. Appl. Phys., 51, 4260, 10.1063/1.328243

2005, Appl. Phys. Lett., 86, 241108, 10.1063/1.1949730

2004, Appl. Phys. Lett., 84, 2427, 10.1063/1.1689397

2003, Appl. Phys. Lett., 82, 823, 10.1063/1.1544436

2004, Semiconductors, 38, 393, 10.1134/1.1734664

1972, Heterojunctions and Metal-Semiconductor Junctions

2004, Appl. Phys. Lett., 85, 4272, 10.1063/1.1815377

1978, Jpn. J. Appl. Phys., 17, 1435, 10.1143/JJAP.17.1435

1974, Jpn. J. Appl. Phys., 13, 1475, 10.1143/JJAP.13.1475

2004, Mater. Lett., 7, 42

2001, Jpn. J. Appl. Phys., Part 1, 40, 297, 10.1143/JJAP.40.297

2003, J. Appl. Phys., 93, 1624, 10.1063/1.1534627

2003, Appl. Phys. Lett., 82, 733, 10.1063/1.1542677

2004, J. Appl. Phys., 95, 5813, 10.1063/1.1712015

2003, J. Appl. Phys., 94, 7768, 10.1063/1.1628834

2003, Appl. Phys. Lett., 82, 1117, 10.1063/1.1553997

2004, Mater. Today, 7, 26, 10.1016/S1369-7021(04)00286-X

2001, Science, 291, 1947, 10.1126/science.1058120

2004, J. Phys.: Condens. Matter, 16, R829, 10.1088/0953-8984/16/25/R01

2004, Mater. Sci. Eng., R., 47, 1, 10.1016/j.mser.2004.09.001

2001, Nature (London), 409, 66, 10.1038/35051047

2001, Science, 292, 1897, 10.1126/science.1060367

2004, Science, 303, 1348, 10.1126/science.1092356

2003, Appl. Phys. Lett., 82, 4806, 10.1063/1.1587878

2003, Appl. Phys. Lett., 83, 141, 10.1063/1.1589184

2004, Appl. Phys. Lett., 84, 3241, 10.1063/1.1734681

2001, Appl. Phys. Lett., 81, 3651, 10.1063/1.1520337

2004, Appl. Phys. Lett., 84, 2739, 10.1063/1.1697633

2004, Appl. Phys. Lett., 84, 3376, 10.1063/1.1728298

2003, Appl. Phys. Lett., 83, 165, 10.1063/1.1591069

2002, Appl. Phys. Lett., 80, 4232, 10.1063/1.1482800

2004, J. Appl. Phys., 96, 3141

2004, Appl. Phys. Lett., 84, 3603, 10.1063/1.1738174

2004, Appl. Phys. Lett., 84, 2883, 10.1063/1.1702137

2004, Appl. Phys. Lett., 84, 2658, 10.1063/1.1695097

2004, Appl. Phys. Lett., 84, 2635, 10.1063/1.1695633

2003, Phys. Rev. Lett., 91, 185502, 10.1103/PhysRevLett.91.185502

2004, Appl. Phys. Lett., 84, 586, 10.1063/1.1642755

2003, J. Appl. Phys., 93, 6252, 10.1063/1.1563845

2003, Physica E (Amsterdam), 17, 489, 10.1016/S1386-9477(02)00850-0

2004, Appl. Phys. Lett., 85, 6004, 10.1063/1.1836873

2001, Science, 291, 1947, 10.1126/science.1058120

2004, J. Phys. Chem. B, 108, 8773, 10.1021/jp048482e

2003, Nano Lett., 3, 1625, 10.1021/nl034463p

2004, Appl. Phys. Lett., 85, 2002, 10.1063/1.1792373

2005, Appl. Phys. A: Mater. Sci. Process., 80, 1029, 10.1007/s00339-004-3098-8

2004, Appl. Phys. Lett., 85, 3107, 10.1063/1.1802372

2003, J. Phys. Chem. B, 107, 659, 10.1021/jp0271054

2004, Appl. Phys. Lett., 85, 5052, 10.1063/1.1821648

2004, Appl. Phys. Lett., 85, 5923, 10.1063/1.1836870

2004, Appl. Phys. Lett., 85, 6128, 10.1063/1.1841453

2004, Appl. Phys. Lett., 85, 2274, 10.1063/1.1794351

2003, Appl. Phys. Lett., 82, 733, 10.1063/1.1542677

2004, Appl. Phys. Lett., 84, 173, 10.1063/1.1640468

1977, J. Appl. Phys., 48, 3566, 10.1063/1.324156

1996, IEE Proc.-G: Circuits, Devices Syst., 143, 307

2001, IEEE Trans. Electron Devices, 48, 2192, 10.1109/16.954453

2004, Nano Lett., 4, 587, 10.1021/nl035198a

2004, Appl. Phys. Lett., 84, 4098, 10.1063/1.1753061

2003, J. Phys. Chem. Solids, 64, 2183, 10.1016/S0022-3697(03)00219-1

2001, Phys. Rev. B, 65, 014111, 10.1103/PhysRevB.65.014111

1995, J. Phys.: Condens. Matter, 7, 9147, 10.1088/0953-8984/7/48/006

1987, Appl. Phys. Lett., 51, 1889, 10.1063/1.98502

2003, J. Appl. Phys., 94, 968, 10.1063/1.1586466

1980, Solid State Commun., 35, 305, 10.1016/0038-1098(80)90503-7

1972, Phys. Rev. B, 5, 1607, 10.1103/PhysRevB.5.1607

2002, Phys. Status Solidi A, 193, 125, 10.1002/1521-396X(200209)193:1<125::AID-PSSA125>3.0.CO;2-X

1995, Phys. Status Solidi B, 188, 823, 10.1002/pssb.2221880226

2005, Semicond. Sci. Technol., 20, S45, 10.1088/0268-1242/20/4/005

2005, Semicond. Sci. Technol., 20, S49, 10.1088/0268-1242/20/4/006

2005, Semicond. Sci. Technol., 20, S13, 10.1088/0268-1242/20/4/002

2005, Semicond. Sci. Technol., 20, S1, 10.1088/0268-1242/20/4/001