Formation of size-controlled silicon nanocrystals in plasma enhanced chemical vapor deposition grown SiOxNy/SiO2 superlattices

Thin Solid Films - Tập 520 - Trang 121-125 - 2011
A.M. Hartel1, D. Hiller1, S. Gutsch1, P. Löper2, S. Estradé3,4, F. Peiró3, B. Garrido3, M. Zacharias1
1IMTEK, Faculty of Engineering, Albert-Ludwigs-University Freiburg, Georges-Köhler-Allee 103, 79110 Freiburg, Germany
2Fraunhofer Institute for Solar Energy Systems, Heidenhofstr. 2, 79110 Freiburg, Germany
3MIND-IN2UB, Departament d'Electrònica, Universitat de Barcelona, Martí i Franquès 1, 08028 Barcelona, Spain
4TEM-MAT, SCT- UB, Solé i Sabarís 1, 08028 Barcelona, Spain

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